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Dive into the research topics where Agata Lachowicz is active.

Publication


Featured researches published by Agata Lachowicz.


Solar Energy Materials and Solar Cells | 2014

Industrial high performance crystalline silicon solar cells and modules based on rear surface passivation technology

Axel Metz; Dennis Adler; Stefan Bagus; Henry Blanke; Michael Bothar; Eva Brouwer; Stefan Dauwe; Katharina Dressler; Raimund Droessler; Tobias Droste; Markus Fiedler; Yvonne Gassenbauer; Thorsten Grahl; Norman Hermert; Wojtek Kuzminski; Agata Lachowicz; Thomas Lauinger; Norbert Lenck; Mihail Manole; Marcel Martini; Rudi Messmer; Christine Meyer; Jens Moschner; Klaus Ramspeck; Peter Roth; Ruben Schönfelder; Berthold Schum; Jörg Sticksel; Knut Vaas; Michael Volk


Solar Energy Materials and Solar Cells | 2011

Characterization of the PSG/Si interface of H3PO4 doping process for solar cells

A. Armigliato; D. Nobili; S. Solmi; G. Blendin; Berthold Schum; Agata Lachowicz; Jörg Horzel


Archive | 2012

Verfahren zur Herstellung einer Solarzelle

Agata Lachowicz; Yvonne Gassenbauer; Jens Moschner; Gabriele Blendin; Meyer Christine


Archive | 2013

METHOD FOR PRODUCING A SOLAR CELL

Jens Moschner; Henning Nagel; Agata Lachowicz; Markus Fiedler


Archive | 2011

Method for the wet-chemical etching back of a solar cell emitter

Agata Lachowicz; Berthold Schum; Knut Vaas


Archive | 2012

Method for manufacturing a solar cell

Christine Meyer; Agata Lachowicz; Yvonne Gassenbauer; Gabriele Blendin; Jens Moschner


Archive | 2011

METHOD FOR FORMING A DOPANT PROFILE

Gabriele Blendin; Joerg Horzel; Agata Lachowicz; Berthold Schum


Archive | 2012

Verfahren zum nasschemischen Ätzen einer Siliziumschicht

Agata Lachowicz; Berthold Schum; Knut Vaas


Archive | 2011

Method for the wet-chemical etching of a highly doped semiconductor layer

Berthold Schum; Knut Vaas; Agata Lachowicz; Norman Hermert


Archive | 2014

Acid-treatment of silicon-containing substrate used for silicon solar cell, involves contacting silicon substrate with acidic solution containing nitric acid, hexafluorosilicic acid, hydrofluoric acid and water in process vessel

Knut Vaas; Berthold Schum; Agata Lachowicz; Bernd Drapp; Beate Lenkeit

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