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Knut Vaas

Carl Zeiss AG

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Publication

Featured researches published by Knut Vaas.

Solar Energy Materials and Solar Cells | 2014

Industrial high performance crystalline silicon solar cells and modules based on rear surface passivation technology

Axel Metz; Dennis Adler; Stefan Bagus; Henry Blanke; Michael Bothar; Eva Brouwer; Stefan Dauwe; Katharina Dressler; Raimund Droessler; Tobias Droste; Markus Fiedler; Yvonne Gassenbauer; Thorsten Grahl; Norman Hermert; Wojtek Kuzminski; Agata Lachowicz; Thomas Lauinger; Norbert Lenck; Mihail Manole; Marcel Martini; Rudi Messmer; Christine Meyer; Jens Moschner; Klaus Ramspeck; Peter Roth; Ruben Schönfelder; Berthold Schum; Jörg Sticksel; Knut Vaas; Michael Volk

Archive | 2011

Method for the wet-chemical etching back of a solar cell emitter

Agata Lachowicz; Berthold Schum; Knut Vaas

Archive | 2008

Verfahren zur chemischen Behandlung eines Substrats

Andreas Teppe; Berthold Schum; Dieter Franke; Ingo Schwirtlich; Knut Vaas; Wilfried Schmidt

Archive | 2009

METHOD FOR CHEMICALLY TREATING A SUBSTRATE

Andreas Teppe; Berthold Schum; Dieter Franke; Ingo Schwirtlich; Knut Vaas; Wilfried Schmidt

Archive | 2012

Verfahren zum nasschemischen Ätzen einer Siliziumschicht

Agata Lachowicz; Berthold Schum; Knut Vaas

Archive | 2012

Kristalline solarzelle und verfahren zur herstellung einer solchen

Henning Nagel; Knut Vaas; Wilfried Schmidt

Archive | 2011

Method for the wet-chemical etching of a highly doped semiconductor layer

Berthold Schum; Knut Vaas; Agata Lachowicz; Norman Hermert

Archive | 2014

Acid-treatment of silicon-containing substrate used for silicon solar cell, involves contacting silicon substrate with acidic solution containing nitric acid, hexafluorosilicic acid, hydrofluoric acid and water in process vessel

Knut Vaas; Berthold Schum; Agata Lachowicz; Bernd Drapp; Beate Lenkeit

Archive | 2012

Method for the treatment of silicon wafers, treatment liquid and silicon wafers

Knut Vaas; Berthold Schum; Agata Lachowicz

Archive | 2011

Back-contact solar cell producing method involves forming hydrophobic properties in opposite conductivity type layer by applying liquid dopant source as dopant to substrate front side, while avoiding direct deposition onto back side

Gabriele Blendin; Christine Meyer; Knut Vaas

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Collaboration

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Berthold Schum

Carl Zeiss AG

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Agata Lachowicz

Carl Zeiss AG

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Wilfried Schmidt

Merck

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Norman Hermert

Carl Zeiss AG

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Ingo Schwirtlich

Carl Zeiss AG

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Christine Meyer

Carl Zeiss AG

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Mihail Manole

Carl Zeiss AG

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Axel Metz

Carl Zeiss AG

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Dennis Adler

Carl Zeiss AG

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Eva Brouwer

Carl Zeiss AG

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