Akihisa Matsuda

Industrial Plasma Technology: Applications from Environmental to Energy Technologies

PREFACE INTRODUCTION TO PLASMAS Plasmas Discharge Plasmas ENVIRONMENTAL APPLICATION OF NONTHERMAL PLASMA ATMOSPHERIC PLASMA AIR POLLUTION CONTROL, SOLID WASTE, AND WATERTREATMENT TECHNOLOGIES: FUNDAMENTAL AND OVERVIEW Introduction Type of Plasmas Plasma Chemistry Plasma Reactor Determination of Plasma Parameters and the Other Phenomena Engineering and Economics Concluding Remarks References OPTICAL DIAGNOSTICS FOR HIGH-PRESSURE NONTHERMAL PLASMAANALYSIS Introduction Experimental Examples Conclusions References LASER INVESTIGATIONS OF FLOW PATTERNS IN ELECTROSTATICPRECIPITATORS AND NONTHERMAL PLASMA REACTORS Introduction PIV Experimental Setups Conclusions Acknowledgment References WATER PLASMAS FOR ENVIRONMENTAL APPLICATION Introduction Water Plasma Generation and Its Characteristics Decomposition of halogenated Hydrocarbons Conclusion References CHEMISTRY OF ORGANIC POLLUTANTS IN ATMOSPHERIC PLASMAS Introduction Experimental Results and Discussion Conclusions Acknowledgments References GENERATION AND APPLICATION OF WIDE AREA PLASMA Introduction AirFlow Control Aerodynamic Plasma Actuators Particle Destruction Large Sliding Discharge Conclusion References NONTHERMAL PLASMA-BASED SYSTEM FOR EXHAUST TREATMENT UNDER REDUCEDATMOSPHERE OF PYROLYSIS GASES Introduction Experimental Results Conclusions Acknowledgments References PHARMACEUTICAL AND BIOMEDICAL ENGINEERING BY PLASMATECHNIQUES Introduction Nature of Plasma-Induced Polymer Radicals Pharmaceutical Engineering for DDS Preparation by PlasmaTechniques Biomedical Engineering by Plasma Techniques Conclusion Acknowledgments References TARGETING DENDRITIC CELLS WITH CARBON MAGNETIC NANOPARTICLES MADEBY DENSE-MEDIUM PLASMA TECHNOLOGY References APPLICATIONS OF PULSED POWER AND PLASMAS TO BIOSYSTEMS AND LIVINGORGANISMS Introduction Pulsed-Power Source Using Magnetic Pulse Compression System Discharge Plasmas by Pulsed Power Action of Pulsed Power and Discharge Plasma to Biosystem Summary References APPLICATIONS OF PLASMA POLYMERIZATION IN BIOMATERIALS Introduction Example 1: Improving Surfaces for Blood Biocompatibility Example 2: Foreign Body Response Example 3: Extended Wear Contact Lenses Example 4: Platform for Immobilizing a Biomolecule Example 5: An Improved Surface Plasmon Resonance Biosensor Conclusions References PLASMA STERILIZATION AT NORMAL ATMOSPHERIC PRESSURE Introduction Experimental Schemes Experimental Result Conclusion Acknowledgments References ELIMINATION OF PATHOGENIC BIOLOGICAL RESIDUALS BY MEANS OFLOW-PRESSURE INDUCTIVELY COUPLED PLASMA DISCHARGE Introduction Experimental Results Conclusions Acknowledgments References STERILIZATION AND PROTEIN TREATMENT USING OXYGEN RADICALS PRODUCEDBY RF DISCHARGE Introduction Experimental Procedure Generation of Oxygen Radicals Sterilization of Medical Equipments Decomposition of Proteins Structure References HYDROPHILICITY AND BIOACTIVITY OF A POLYETHYLENE TEREPHTHALATESURFACE MODIFIED BY PLASMA-INITIATED GRAFT POLYMERIZATION Introduction Experimental Results and Discussion Conclusions References STRATEGIES AND ISSUES ON THE PLASMA PROCESSING OF THIN-FILM SILICONSOLAR CELLS Introduction Growth Process of a-Si: H and ?c-Si : H by PECVD Growth of High-Quality a-Sie : H Concept of Protocrystal a-Si : H (Stable a-Sie : H) Growth of High-Quality ?c-Si : H Summary Reference CHARACTERISTICS OF VHF PLASMA WITH LARGE AREA Introduction Development of Balanced Power Feeding Method Characteristics of VHF Plasma Summary References DEPOSITION OF A-SI : H FILMS WITH HIGH STABILITY AGAINST LIGHTEXPOSURE BY REDUCING DEPOSITION OF NANOPARTICLES FORMED IN SIH4DISCHARGES Introduction Formation Mechanism of Nanoparticles in Silane Discharges Contribution of Higher Order Silane Molecules and Nanoparticles toSiH2 Bond Formation in Films Effects of Nanoparticles on a-Si : H Qualities High Rate Deposition of a-Si : H Films of High Stability againstLight Exposure Using Multihollow Discharge Plasma CVD Conclusions Acknowledgments References DIAGNOSTICS AND MODELING OF SIH4/H2 PLASMAS FOR THE DEPOSITION OFMICROCRYSTALLINE SILICON: THE CASE OF DUAL-FREQUENCY SOURCES Introduction Experimental Model Description Results and Discussion Conclusions Acknowledgments References INTRODUCTION TO DIAMOND-LIKE CARBONS DIAMOND-LIKE CARBON FOR APPLICATIONS Introduction Growth Rates Basic Properties Stress Applications of DLC MEMs Electronic Applications Bioactive Surfaces Conclusions Acknowledgments References APPLICATIONS OF DLCS TO BIOPROCESSING Introduction High-Tenacity DLC Tin Films for Stents Applications of DLC Films to Coronary Drug-Eltuing Stent DLC Films with Controlled Zeta Potential of Biomaterials Characerization of Biomimetic DLC and In vitro BiocompatibilityEvaluation Conclusion Acknowledgments References PLASMA PROCESSING OF NANOCRYSTALLINE SEMICONDUCTIVE CUBIC BORONNITRIDE THIN FILMS Introduction Fundamental Properties of cBN Growth of cBN Thin Films Doping Processes and Electrical Characterization Conclusion References FUNDAMENTALS ON TRIBOLOGY OF PLASMA-DEPOSITED DIAMOND-LIKE CARBONFILMS Introduction Special Case of DLC Coatings Superlubricity of DLC Coatings Conclusion References DIAMOND-LIKE CARBON THIN FILMS GROWN IN PULSED-DC PLASMAS Introduction Experimental Details Results and Discussion Conclusions Acknowledgments References PLASMA DEPOSITION OF N-TIO2 THIN FILMS Introduction Experimental Setup and Diagnostic Techniques Results and Discussion Acknowledgments References INVESTIGATION OF DLC AND MULTILAYER COATINGS HYDROPHOBIC CHARACTERFOR BIOMEDICAL APPLICATIONS Introduction Experimental Setup Results and Discussions Conclusions Acknowledgments References CREATION OF NOVEL ELECTROMAGNETIC AND REACTIVE MEDIA FROMMICROPLASMAS Introduction Microplasma in Single Use as Plasma Microplasma Integration for Large-Area Material Processing Microplasma Integration for Electromagnetic Media Concluding Remarks and Perspectives Acknowledgments References NANOBLOCK ASSEMBLY USING PULSE RF DISCHARGES WITH AMPLITUDEMODULATION Introduction Formation of Nanoblocks and Their Agglomeration Assembly of Nanoblocks in Gas Phase Using Agglomeration Conlusions Acknowledgments References THOMSON SCATTERING DIAGNOSTICS OF DISCHARGE PLASMAS Introduction Application to Low-Pressure Plasmas Diagnostics of PDP Plasmas Diagnostics of EUV Plasmas CRYSTALLIZED NANODUST PARTICLES GROWTH IN LOW-PRESSURE COLDPLASMAS Introduction Description of the Experimental Setup Detection of Nanocrystallites Formation in the Plasma GasPhase Atomic Structure of the Nanocrystallites Size and Crystalline Volume Fraction Measurements Gas Temperature Effects on Dust Nanoparticle Nucleation andGrowth Conclusions References COLLECTION AND REMOVAL OF FINE PARTICLES IN PLASMA CHAMBERS Introduction NFP-collector Ditch Gudance Plate Cleaning Effects on Particles Produced in Plasmas Conclusions Acknowledgments References INDEX

Fundamental Properties of Titanium-Doped Indium Oxide and Its Application to Thin-Film Silicon Solar Cells

We have investigated the fundamental optoelectronic properties of newly developed transparent conductive oxide (TCO) materials, e.g., titanium-doped indium oxide (InTiO). InTiO films, being deposited at 50 °C by the RF-magnetron-sputtering method followed by thermal annealing at 200 °C, show excellent optoelectronic properties for solar-cell application. We have demonstrated the improved photovoltaic performance of n–i–p microcrystalline-silicon (µc-Si:H) solar cells whose i layer is prepared at a high rate of 2.3 nm/s using a stacked structure of InTiO with aluminum-doped zinc oxide (AZO) as top (front) TCO layers.

Amorphous and Microcrystalline Silicon

Processes used to grow hydrogenated amorphous silicon (a-Si : H) and microcrystalline silicon (μc-Si : H) from SiH4 and H2 ∕ SiH4 glow discharge plasmas are reviewed. Differences and similarities between growth reactions of a-Si : H and μc-Si : H in a plasma and on a film-growing surface are discussed, and the process of nucleus formation followed by epitaxial-like crystal growth is explained as being unique to μc-Si : H. The application of a reaction used to determine the dangling-bond defect density in the resulting a-Si : H and μc-Si : H films is emphasized, since it can provide clues about how to improve the optoelectronic properties of those materials for device applications, especially thin-film silicon-based solar cells. Material issues related to the realization of low-cost and high-efficiency solar cells are described, and finally recent progress in this area is reviewed.

Control of electron temperature in SiH4/H2 plasma for obtaining high photovoltaic performance in microcrystalline silicon solar cells

We have proposed two novel processes for the formation of fine n/i interface to improve the photovoltaic performance in substrate-type (n-i-p type) hydrogenated microcrystalline-silicon (?c-Si:H) solar cells whose i layer is deposited at high growth rate of > 2.0 nm/sec; (1) gradual monosilane-(SiH4)-molecule-introduction method and (2) amorphous silicon (a-Si:H) thin-layer-insertion method. When applying these two methods to the formation process of n/i interface in the solar cells, drastic improvement of the production reproducibility has been achieved in the fabrication process of high efficiency (> 9%) substrate-type ?c-Si:H solar cells.