Akira Fujimura

Method for design and manufacture of a reticle using a two-dimensional dosage map and charged particle beam lithography

Method for Fracturing and Forming a Pattern Using Curvilinear Characters with Charged Particle Beam Lithography

Method for design and manufacture of a reticle using variable shaped beam lithography

METHOD FOR FRACTURING CIRCULAR PATTERNS AND FOR MANUFACTURING A SEMICONDUCTOR DEVICE

METHOD AND SYSTEM FOR FORMING PATTERNS USING CHARGED PARTICLE BEAM LITHOGRAPHY WITH OVERLAPPING SHOTS

METHOD AND SYSTEM FOR FRACTURING A PATTERN USING CHARGED PARTICLE BEAM LITHOGRAPHY WITH MULTIPLE EXPOSURE PASSES WHICH EXPOSE DIFFERENT SURFACE AREA

METHOD FOR FRACTURING AND FORMING A PATTERN USING SHAPED BEAM CHARGED PARTICLE BEAM LITHOGRAPHY

METHOD AND SYSTEM FOR FORMING CIRCULAR PATTERNS ON A SURFACE

Method for Fracturing a Pattern for Writing with a Shaped Charged Particle Beam Writing System Using Dragged Shots

METHOD, DEVICE, AND SYSTEM FOR FORMING CIRCULAR PATTERNS ON A SURFACE