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Featured researches published by Akira Miyaji.


Journal of Synchrotron Radiation | 1998

Thermal and deformation analyses of side-cooled monochromator mirrors for the SPring-8/Figure-8 soft X-ray undulator.

Naoto Kihara; Kiyoto Mashima; Shinnji Miura; Akira Miyaji; Kouichi Wakamiya; Satoshi Takahashi; Motofusa Kageyama; Susumu Ichikawa

The numerical results for a bent parabolic mirror monochromator designed for the SPring-8/Figure-8 soft X-ray undulator are described. A thermal and structural finite-element analysis is presented for side-cooled premirrors of the bent parabolic mirror monochromator. Using a ray-tracing code, the effect of the final induced figure errors on the performance of the premirror are discussed.


1989 Microlithography Conferences | 1989

Excimer Laser Stepper for Sub-half Micron Lithography

Akikazu Tanimoto; Akira Miyaji; Yutaka Ichihara; Tsunesaburoh Uemura; Issey Tanaka

An excimer laser stepper having a flat image field was developed. Using a frequency stabilized, narrow band KrF 248nm laser (FWHM≈3μm), this stepper can print uniform patterns under 0.5 μm over a 15 mm square field. When the excimer laser output power is 2W, illumination intensity is more than 40 mW/cm2. Illumination uniformity is within ±2.5% over the field and exposure energy density is controlled within the precision of ±1.596, using an integrator sensor and a pulse number controller. A chromatic projection lens is adjusted so finely that aberrations are removed. In order to get imaging stability, a lens controller is used. An alignment system is off-axis, using He-Ne laser light spots and diffraction light detectors. By employing the EGA (Enhanced Global Alignment) method, overlay accuracy better than 0.18μm was obtained. Because the alignment detection light is insensitive to the resist, any types of resist may be used. The developed system has all the basic functions of a stepper. It can be used to improve DUV process and to fabricate sub-half micron devices in a laboratory.


Nuclear Instruments & Methods in Physics Research Section A-accelerators Spectrometers Detectors and Associated Equipment | 2001

Microfocusing of soft X-ray undulator light using an elliptically bent cylinder mirror

Shinji Miura; Naoto Kihara; Kiyoto Mashima; Akira Miyaji; E. Ishiguro; H. Ohashi; Y. Tamenori; H. Okumura; T. Kanashima; Takuya Ishikawa

Abstract The performance of an elliptically bent cylinder mirror, installed in A-branch of the Soft X-ray photochemistry beamline (BL27SU) at the SPring-8, is described. The aim of this branch beamline is to provide a micro white-beam focusing for a need in photochemistry community. This elastically bent mirror is the key component for the extremely intense micro-beam focusing optics.


Journal of Synchrotron Radiation | 1998

Design of and metrological results from a bent parabolic mirror

Shinji Miura; Naoto Kihara; Kiyoto Mashima; Akira Miyaji; Kouichi Wakamiya; Hisashi Shiozawa; Yusuke Fukuda; Hajime Ichikawa

This article describes the successful design and fabrication of, and metrological results from, an elastically bent parabolic mirror. The mirror is equipped with a bending structure that allows the mirror to be bent meridionally to a parabolic shape. This bent parabolic mirror is the key component of the extremely high-quality monochromators designed for the SPring-8 figure-8 soft X-ray undulator and the 2.0 GeV high-brilliance synchrotron radiation source (VSX).


Archive | 1981

Electronic photographic camera

Kenji Toyoda; Takao Watanabe; Hideya Inoue; Atsumi Kasuya; Yutaka Ichihara; Akira Miyaji


Archive | 2001

Polishing body, polishing apparatus, polishing apparatus adjustment method, polished film thickness or polishing endpoint measurement method, and semiconductor device manufacturing method

Akira Ihsikawa; Tatsuya Senga; Akira Miyaji; Yoshijiro Ushio


Archive | 1997

Semiconductor wafer polishing apparatus

Akira Miyaji; Takashi Arai; Takeshi Yagi


Archive | 1988

Laser beam working system

Ikuo Hikima; Akira Miyaji; Saburo Kamiya; Akikazu Tanimoto


Archive | 1981

Data recording device for electronic camera

Kenji Toyoda; Takao Watanabe; Hideya Inoue; Atsumi Kasuya; Yutaka Ichihara; Akira Miyaji


Archive | 1997

Proximity-type microlithography apparatus and method

Masato Shibuya; Keiichiro Sakato; Akira Miyaji; Toshiyuki Namikawa; Takashi Mori

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