Kiyoto Mashima

Development of projection optics set-3 for high-numerical-aperture extreme ultraviolet exposure tool (HiNA)

We have developed a high-numerical-aperture extreme ultraviolet exposure tool (HiNA). HiNA is equipped with an illumination system, projection optics, a mask stage, and a wafer stage in the vacuum chamber. The projection optics consist of two aspherical mirrors (M1 and M2). The numerical aperture of the optics is 0.3. Thus far, we fabricated two sets of projection optics (set-1 and set-2). The wave-front errors of set-1 and set-2 were 7.5 and 1.9nm rms, respectively. We developed a third set of projection optics (set-3), the target wave-front error of which was less than 1nm rms. In set-3, we also attempted to reduce flare. We completed the mirror polishing, coating, and mirror adjustment of set-3. By using a recently developed polishing method, we reduced low-spatial-frequency roughness (LSFR), mid-spatial-frequency roughness (MSFR), and high-spatial-frequency roughness, simultaneously. The predicted wave-front error calculated from the LSFR number was 0.69nm rms. MSFR, which strongly affects the flare o...

A Novel Design of Three-Aspherical-Mirror Imaging Optics for Extreme Ultra-Violet Lithography

The demagnifying optics for extreme ultra-violet lithography (EUVL), which consists of three aspherical mirrors and one plane mirror, is proposed. A resolution of 0.1 µ m can be achieved on a ring field of 26 mm×1 mm in size and the blur size owing to the distortion is small. The assembly tolerance such as decentration tolerance and tilt tolerance is investigated for each of the aspherical mirrors. It is clarified that the assembly accuracy requires 0.0015 degree for the proposed optics.

Development of illumination optics and projection optics for high-NA EUV exposure tool (HiNA)

We have developed a high numerical aperture (NA) small-field exposure system (HiNA) for EUV exposure process development. NA of projection optics of EUV exposure tools for 45-nm node lithography is expected to be around 0.25, which is higher than that previously expected (0.1). HiNA has compatible illumination system, which can be switched to partial coherent illumination and coherent illumination by changing some optical elements. Coherent illumination system was prepared for a high contrast imaging but the uniformity of intensity is less than that of partial coherent illumination. A reflected-type fly*fs-eye element was adopted for partial coherent illumination, which can provide uniformity of both coherency and intensity simultaneously. The coherency of the partial coherent illumination is 0.8. HiNA projection optics consists of two aspheric mirrors, with the NA and the imaging field of 0.3 and 0.3×0.5mm2, respectively. We fabricated two sets of projection-optics. Although the wavefront error of set-1 optics was 7nmRMS, that of set-2 optics was improved to 1.9nmRMS, which was measured with a point diffraction interferometer (PDI) using He-Ne laser. The wavefront error of the set-2 optics was improved by using a new mirror mount mechanism. The mount system consists of several board springs made of super invar in order to minimize the deformation of mirrors by mounting stress. The projection optics of the set-2 has a remote controlled mirror adjustment mechanism which has five degrees of freedom (X,Y,Z,X-Tilt and Y-Tilt). The position of the concave secondary mirror was adjusted precisely with measuring the wavefront error using PDI.

Thermal and deformation analyses of side-cooled monochromator mirrors for the SPring-8/Figure-8 soft X-ray undulator.

The numerical results for a bent parabolic mirror monochromator designed for the SPring-8/Figure-8 soft X-ray undulator are described. A thermal and structural finite-element analysis is presented for side-cooled premirrors of the bent parabolic mirror monochromator. Using a ray-tracing code, the effect of the final induced figure errors on the performance of the premirror are discussed.

Microfocusing of soft X-ray undulator light using an elliptically bent cylinder mirror

Abstract The performance of an elliptically bent cylinder mirror, installed in A-branch of the Soft X-ray photochemistry beamline (BL27SU) at the SPring-8, is described. The aim of this branch beamline is to provide a micro white-beam focusing for a need in photochemistry community. This elastically bent mirror is the key component for the extremely intense micro-beam focusing optics.

Fabrication of aspherical mirrors for HiNA (high numerical aperture EUV exposure tool) set-3 projection optics

Aspherical mirror fabrication of HiNA set-3 projection optics was completed. By using a new polishing method, we successfully reduced low spatial frequency roughness (LSFR), mid spatial frequency roughness (MSFR) and high spatial frequency roughness (HSFR) compared with HiNA set-1 and set-2 projection optics. MSFR, which strongly affects the flare of the optics, was remarkably reduced to less than 0.2nm rms. HiNA projection optical system with the numerical aperture of 0.3 consists of two aspheric mirrors (M1 and M2). We had already fabricated two sets of the HiNA projection optics. The wavefront error (WFE) of the set-1 optics was 7.5nm rms and that of the set-2 optics was 1.9nm rms. We tried to reduce the WFE and flare in the set-3 optics. The target number of WFE of the set-3 optics was less than 1nm rms. The LSFR, MSFR and HSFR of the M1 of the set-3 optics were 0.25nm rms, 0.17nm rms and 0.10nm rms, respectively. The LSFR and MSFR are almost half values compared with those of the M1 for the set-2 optics. The HSFR was also reduced from 0.13nm rms (set-2) to 0.10nm rms (set-3). The LSFR and MSFR of the M2 were 0.25nm rms and 0.20nm rms, respectively. The estimated wavefront error calculated from these LSFR numbers is 0.7nm rms.

Fabrication of aspherical mirrors for EUV projection optics set-3 of HiNA

We developed a high-numerical-aperture EUV exposure tool (HiNA). HiNA is equipped with an illumination system, projection optics, a mask stage and a wafer stage in the vacuum chamber. The projection optics consist of two aspherical mirrors (M1 and M2). The numerical aperture of the optics is 0.3. Thus far, we fabricated two sets of projection optics (set-1 and set-2). The wavefront errors of set-1 and set-2 were 7.5nm rms and 1.9nm rms, respectively. We developed the third set of projection optics (set-3), the target wavefront error of which was less than 1nm rms. In set-3, we also attempted to reduce flare. We completed the mirror polishing, coating and mirror adjustment of set-3. Using a new polishing method, we successfully reduced low-spatial-frequency roughness (LSFR), mid-spatial-frequency roughness (MSFR) and high-spatial-frequency roughness (HSFR) simultaneously. The predicted wavefront error calculated from the LSFR number was 0.69nm rms. MSFR, which strongly affects the flare of the optics, was significantly reduced to less than 0.2nm rms. The estimated flare was 7%, which is significantly reduced to one-fourth that of set-2. The wavefront error of set-3 was measured with the visible-light point diffraction interferometer (PDI) after coating and assembly. The wavefront error measured after adjustment and cramping of the adjustment system was 0.90nm rms, which is less than one-half the wavefront error of set-2.

Design of and metrological results from a bent parabolic mirror

This article describes the successful design and fabrication of, and metrological results from, an elastically bent parabolic mirror. The mirror is equipped with a bending structure that allows the mirror to be bent meridionally to a parabolic shape. This bent parabolic mirror is the key component of the extremely high-quality monochromators designed for the SPring-8 figure-8 soft X-ray undulator and the 2.0 GeV high-brilliance synchrotron radiation source (VSX).

Comparison of monochromators with a bent parabolic mirror and a varied-spacing grating for the 2.0 GeV high-brilliance synchrotron radiation source (VSX)

A design study of monochromators for a 2.0 GeV electron/positron storage ring for high-brilliance synchrotron radiation in the vacuum ultraviolet (VUV) and the soft X-ray regions is described. Two types of VUV/soft X-ray grazing-incidence monochromators, one with a bent parabolic mirror and the other with a varied-spacing grating, are designed. Without any slope error, the expected resolving power of the former is much higher, but the latter is less affected by slope errors of the optical elements.