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Featured researches published by Akiyoshi Tsuda.


Photomask and Next-Generation Lithography Mask Technology XX | 2013

Next generation electron beam lithography system F7000 for wide range applications

Hirofumi Hayakawa; Masahiro Takizawa; Masaki Kurokawa; Akiyoshi Tsuda; Masami Takigawa; Shinichi Hamaguchi; Akio Yamada; Kiichi Sakamoto; Takayuki Nakamura

For multi-purpose applications such as advanced LSIs, photonics, MEMS, and other nano- fabrications, it is important for electron beam (EB) writers that handle the various substrates with their own single mechanical platform. We have been developing the adjusting pallet function both 200mm and 300mm bases to satisfy this requirement. By analyzing actual examples of adjusting pallets we proved their effectiveness to their applications. The combination of adjusting pallet function, 1Xnm resolution column and character projection technologies will enable the next generation EB writer “F7000” to fit from Fab to Lab applications.


Archive | 1998

Method for charged particle beam exposure with fixed barycenter through balancing stage scan

Nobuyuki Yasutake; Yoshihisa Ooae; Kazushi Ishida; Hiroshi Yasuda; Akiyoshi Tsuda; Hitoshi Tanaka


Archive | 1998

Charged particle beam exposure method and system therefor

Yoshihisa Daikyo; Kazuji Ishida; Hitoshi Tanaka; Akiyoshi Tsuda; Hiroshi Yasuda; 義久 大饗; 洋 安田; 章義 津田; 仁志 田中; 和司 石田


Archive | 1997

Charged particle beam exposure apparatus

Kenichi Kawakami; Tatsuro Ohkawa; Kazushi Ishida; Akiyoshi Tsuda


Archive | 1997

Charged Particle beam exposure apparatus having a stage position measurement device

Kazushi Ishida; Kenichi Kawakami; Tatsuro Ohkawa; Akiyoshi Tsuda


Archive | 2014

SAMPLE HOLDER OF ELECTRON BEAM EXPOSURE APPARATUS AND ELECTRON BEAM EXPOSURE METHOD USING THE SAME

Hirofumi Hayakawa; Akiyoshi Tsuda


Archive | 2014

Probenhalter eines Elektronenstrahlbestrahlungsgeräts und diesen verwendendes Elektronenstrahlbestrahlungsverfahren

Hirofumi Hayakawa; Akiyoshi Tsuda


Archive | 2013

ELECTRON BEAM DETECTOR, ELECTRON BEAM PROCESSING APPARATUS, AND METHOD OF MANUFACTURING ELECTRON BEAM DETECTOR

Kenji Abe; Masaki Kurokawa; Akiyoshi Tsuda; Hideki Nasuno


Archive | 2013

Probenhalter eines Elektronenstrahlbestrahlungsgeräts und diesen verwendendes Elektronenstrahlbestrahlungsverfahren Sample holder of an electron beam irradiation apparatus and these-use electron beam irradiation method

Hirofumi Hayakawa; Akiyoshi Tsuda


Archive | 2013

Sample holder of an electron beam irradiation device and this-use electron beam irradiation method

Hirofumi Hayakawa; Akiyoshi Tsuda

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