Alexey Kopyshev

Can polymer brushes induce motion of nano-objects?

In searching for new and efficient mechanisms for moving or propelling nano-sized objects across a flat surface, we discuss the idea of using the periodically switchable topography of a certain class of polymer substrates. In this paper, we exploit the peculiar properties of diblock-copolymer and mixed brushes that can undergo transitions between very distinct topographical patterns and a flat state. We investigate if, during the transition process, the reshaping of the surface structure, accompanied by a microphase transition, could deliver a sufficient amount of mechanical work to move objects adsorbed on the surface. We show this by following the spatial distribution of an ensemble of silica particles adsorbed on several kinds of poly(methyl methacrylate–b-glycidyl methacrylate) diblock-copolymer brushes, when the surface topography undergoes many periods of the switching process.

Self-assembling carbohydrate-functionalized oligothiophenes.

Carbohydrate-functionalized oligothiophenes have been synthesized applying mild Sonogashira cross-coupling conditions. In an aqueous environment the amphiphilic hybrids self-assemble into chiral superstructures as a result of multiple hydrogen bond interactions and the helicity of the aggregates is controllable by the configuration of the carbohydrate unit. By means of atomic force microscopy highly ordered layer arrangements on substrates were characterized.

Photomechanical degrafting of azo-functionalized poly(methacrylic acid) (PMAA) brushes.

We report on the preparation and characterization of photosensitive polymer brushes. The brushes are synthesized through polymer analogous attachment of azo-benzene groups to surface-attached poly(methacrylic acid) (PMAA) chains. The topography of the photosensitive brushes shows a strong reaction upon irradiation with UV light. While homogeneous illumination leaves the polymer topography unchanged, irradiation of the samples with interference patterns with periodically varying light intensity leads to the formation of surface relief gratings (SRG). The height of the stripes of the grating can be controlled by adjusting the irradiation time. The SRG pattern can be erased through solvent treatment when the periodicity of the stripe pattern is less than the length of the fully stretched polymer chains. In the opposite case, photomechanical scission of receding polymer chains is observed during SRG formation, and the inscribed patterns are permanent.

Opto-Mechanical Scission of Polymer Chains in Photosensitive Diblock-Copolymer Brushes

In this paper we report on an opto-mechanical scission of polymer chains within photosensitive diblock-copolymer brushes grafted to flat solid substrates. We employ surface-initiated polymerization of methylmethacrylate (MMA) and t-butyl methacrylate (tBMA) to grow diblock-copolymer brushes of poly(methylmethacrylate-b-t-butyl methacrylate) following the atom transfer polymerization (ATRP) scheme. After the synthesis, deprotection of the PtBMA block yields poly(methacrylic acid) (PMAA). To render PMMA-b-PMAA copolymers photosensitive, cationic azobenzene containing surfactants are attached to the negatively charged outer PMAA block. During irradiation with an ultraviolet (UV) interference pattern, the extent of photoisomerization of the azobenzene groups varies spatially and results in a topography change of the brush, i.e., formation of surface relief gratings (SRG). The SRG formation is accompanied by local rupturing of the polymer chains in areas from which the polymer material recedes. This opto-mechanically induced scission of the polymer chains takes place at the interfaces of the two blocks and depends strongly on the UV irradiation intensity. Our results indicate that this process may be explained by employing classical continuum fracture mechanics, which might be important for tailoring the phenomenon for applying it to poststructuring of polymer brushes.

Soft matter beats hard matter: rupturing of thin metallic films induced by mass transport in photosensitive polymer films.

The interface between thin films of metal and polymer materials play a significant role in modern flexible microelectronics viz., metal contacts on polymer substrates, printed electronics and prosthetic devices. The major emphasis in metal-polymer interface is on studying how the externally applied stress in the polymer substrate leads to the deformation and cracks in metal film and vice versa. Usually, the deformation process involves strains varying over large lateral dimensions because of excessive stress at local imperfections. Here we show that the seemingly random phenomena at macroscopic scales can be rendered rather controllable at submicrometer length scales. Recently, we have created a metal-polymer interface system with strains varying over periods of several hundred nanometers. This was achieved by exploiting the formation of surface relief grating (SRG) within the azobenzene containing photosensitive polymer film upon irradiation with light interference pattern. Up to a thickness of 60 nm, the adsorbed metal film adapts neatly to the forming relief, until it ultimately ruptures into an array of stripes by formation of highly regular and uniform cracks along the maxima and minima of the polymer topography. This surprising phenomenon has far-reaching implications. This is the first time a direct probe is available to estimate the forces emerging in SRG formation in glassy polymers. Furthermore, crack formation in thin metal films can be studied literally in slow motion, which could lead to substantial improvements in the design process of flexible electronics. Finally, cracks are produced uniformly and at high density, contrary to common sense. This could offer new strategies for precise nanofabrication procedures mechanical in character.

A new approach to nucleation of cavitation bubbles at chemically modified surfaces

Cavitation at the solid surface normally begins with nucleation, in which defects or assembled molecules located at a liquid-solid interface act as nucleation centers and are actively involved in the evolution of cavitation bubbles. Here, we propose a simple approach to evaluate the behavior of cavitation bubbles formed under high intensity ultrasound (20 kHz, 51.3 W cm(-2)) at solid surfaces, based on sonication of patterned substrates with a small roughness (less than 3 nm) and controllable surface energy. A mixture of octadecylphosphonic acid (ODTA) and octadecanethiol (ODT) was stamped on the Si wafer coated with different thicknesses of an aluminium layer (20-500 nm). We investigated the growth mechanism of cavitation bubble nuclei and the evolution of individual pits (defects) formed under sonication on the modified surface. A new activation behavior as a function of Al thickness, sonication time, ultrasonic power and temperature is reported. In this process cooperativity is introduced, as initially formed pits further reduce the energy to form bubbles. Furthermore, cavitation on the patterns is a controllable process, where up to 40-50 min of sonication time only the hydrophobic areas are active nucleation sites. This study provides a convincing proof of our theoretical approach on nucleation.

Light-Induced Reversible Change of Roughness and Thickness of Photosensitive Polymer Brushes.

We investigate light-induced changes in thickness and roughness of photosensitive polymer brushes containing azobenzene cationic surfactants by atomic force microscopy (AFM) in real time during light irradiation. Because the cis-state of azobenzene unit requires more free volume than its trans counterpart, the UV light-induced expansion of polymer thin films associated with the trans-to-cis isomerism of azobenzene groups is expected to occur. This phenomenon is well documented in physisorbed polymer films containing azobenzene groups. In contrast, photosensitive polymer brushes show a decrease in thickness under UV irradiation. We have found that the azobenzene surfactants in their trans-state form aggregates within the brush. Under irradiation, the surfactants undergo photoisomerization to the cis-state, which is more hydrophilic. As a consequence, the aggregates within the brush are disrupted, and the polymer brush contracts. When subsequently irradiated with blue light the polymer brush thickness returns back to its initial value. This behavior is related to isomerization of the surfactant to the more hydrophobic trans-state and subsequent formation of surfactant aggregates within the polymer brush. The photomechanical function of the dry polymer brush, i.e., contraction and expansion, was found to be reversible with repeated irradiation cycles and requires only a few seconds for switching. In addition to the thickness change, the roughness of the brush also changes reversibly between a few Angstroms (blue light) and several nanometers (UV light). Photosensitive polymer brushes represent smart films with light responsive thickness and roughness that could be used for generating dynamic fluctuating surfaces, the function of which can be turned on and off in a controllable manner on a nanometer length scale.

Atomic force microscopy nanolithography: fabrication of metallic nano-slits using silicon nitride tips

In this paper, we report on the properties of nano-slits created in metal thin films using atomic force microscope (AFM) nanolithography (AFM-NL). We demonstrate that instead of expensive diamond AFM tips, it is also possible to use low cost silicon nitride tips. It is shown that depending on the direction of scratching, nano-slits of different widths and depths can be fabricated at constant load force. We elucidate the reasons for this behavior and identify an optimal direction and load force for scratching a gold layer.Graphical Abstract

Light Induced Deformation of Azobenzene Containing Colloidal Spheres: Calculation and Measurement of Opto-Mechanical Stresses

We report on light-induced deformation of colloidal spheres consisting of azobenzene-containing polymers. The colloids of the size between 60 nm and 2 μm in diameter were drop casted on a glass surface and irradiated with linearly polarized light. It was found that colloidal particles can be deformed up to ca. 6 times of their initial diameter. The maximum degree of deformation depends on the irradiation wavelength and intensity, as well as on colloidal particles size. On the basis of recently proposed theory by Toshchevikov et al. [ J. Phys. Chem. Lett. 2017 , 8 , 1094 ], we calculated the opto-mechanical stresses (ca. 100 MPa) needed for such giant deformations and compared them with the experimental results.

Mass production of polymer nano-wires filled with metal nano-particles

Despite the ongoing progress in nanotechnology and its applications, the development of strategies for connecting nano-scale systems to micro- or macroscale elements is hampered by the lack of structural components that have both, nano- and macroscale dimensions. The production of nano-scale wires with macroscale length is one of the most interesting challenges here. There are a lot of strategies to fabricate long nanoscopic stripes made of metals, polymers or ceramics but none is suitable for mass production of ordered and dense arrangements of wires at large numbers. In this paper, we report on a technique for producing arrays of ordered, flexible and free-standing polymer nano-wires filled with different types of nano-particles. The process utilizes the strong response of photosensitive polymer brushes to irradiation with UV-interference patterns, resulting in a substantial mass redistribution of the polymer material along with local rupturing of polymer chains. The chains can wind up in wires of nano-scale thickness and a length of up to several centimeters. When dispersing nano-particles within the film, the final arrangement is similar to a core-shell geometry with mainly nano-particles found in the core region and the polymer forming a dielectric jacket.