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Alfred Lell

Osram

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Publication

Featured researches published by Alfred Lell.

Archive | 2000

Optical semiconductor device comprising a multiple quantum well structure

Volker Härle; Berthold Hahn; Hans-Jürgen Lugauer; Helmut Bolay; Stefan Bader; Dominik Eisert; Uwe Strauss; Johannes Völkl; Ulrich Zehnder; Alfred Lell; Andreas Weimer

Archive | 2002

Radiation-emitting semiconductor component and method for making same

Stefan Bader; Viorel Dumitru; Volker Härle; B. Kuhn; Alfred Lell; J. Off; Ferdinand Scholz; H. Schweizer

Archive | 2001

Semiconductor component for the emission of electromagnetic radiation and method for production thereof

Alfred Lell; Volker Härle; Berthold Hahn; Johann Luft

Archive | 2003

Process for preparation of a mesa- or bridge structure in a layer or layer series with application and structuring of a mask layer onto a sacrificial layer useful in semiconductor technology

Helmut Fischer; Volker Härle; Christine Höß; Andreas Leber; Alfred Lell; Andreas Weimar

Archive | 2002

Method for surface treating a semiconductor

Johannes Baur; Georg Brüderl; Alfred Lell; Walter Neu; Raimund Oberschmid

Archive | 2006

LASERS, OPTICS, AND OPTOELECTRONICS 021101 Improved laser triggering and guiding of meqavolt discharges with dual fs-ns pulses (3 pages)

Guillaume Méjean; Roland Ackermann; Jérôme Kasparian; Estelle Salmon; Yu Jin; Jean-Pierre Wolf; Kay Rethmeier; Wilfried Kalkner; Philipp Rohwetter; K. Stelmaszczyk; L. Wöste; Ann C. Lehman; James J. Raftery; Aaron J. Danner; Paul O. Leisher; Kent D. Choquette; Abul K. Azad; Jiaguang Han; Bernd Witzigmann; Valerio Laino; Mathieu Luisier; Ulrich T. Schwarz; Gunther Feicht; Werner Wegscheider; Kurt Engl; Andreas Leber; Alfred Lell; Volker Härle; Li Fan; Mahmoud Fallahi

Archive | 2004

Strain, wing tilt and Photoluminescence in ELOG GaN on SiC substrates

Nikolaus Gmeinwieser; Karl Engl; Uli Schwarz; Josef Zweck; Werner Wegscheider; Stephan Miller; Andreas Leber; Alfred Lell; Volker Härle

Archive | 2003

Verfahren zum Herstellen von mindestens einer Mesa- oder Stegstruktur oder von mindestens einem elektrisch gepumpten Bereich in einer Schicht oder Schichtenfolge

Helmut Fischer; Volker Härle; Christine Höß; Andreas Leber; Alfred Lell; Andreas Weimar

Archive | 2003

Verfahren zum Herstellen von mindestens einer Mesa- oder Stegstruktur oder von mindestens einem elektrisch gepumpten Bereich in einer Schicht oder Schichtenfolge A method for producing at least one mesa or ridge structure or of at least one electrically pumped region in a layer or layer sequence

Helmut Fischer; Volker Härle; Christine Höß; Andreas Leber; Alfred Lell; Andreas Weimar

Archive | 2002

A process for producing a semiconductor layer and electronic component

Stefan Bader; Volker Härle; Alfred Lell; Stephan Miller; Andreas Weimar

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Volker Härle

Osram

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Andreas Weimar

Osram Opto Semiconductors GmbH

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Berthold Hahn

Osram Opto Semiconductors GmbH

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Stefan Bader

Osram Opto Semiconductors GmbH

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Uwe Strauss

Osram Opto Semiconductors GmbH

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Andreas Leber

Osram Opto Semiconductors GmbH

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Dominik Eisert

Osram Opto Semiconductors GmbH

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Hans-Jürgen Lugauer

Osram Opto Semiconductors GmbH

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Johann Luft

Osram Opto Semiconductors GmbH

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Helmut Bolay

Osram Opto Semiconductors GmbH

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