Allan R. Knoll
IBM
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Publication
Featured researches published by Allan R. Knoll.
Journal of Adhesion Science and Technology | 1994
Frank D. Egitto; Kim J. Blackwell; Allan R. Knoll
Webs of Kapton 200-H and Upilex-S polyimide films were treated using oxygen plasma prior to sequential sputter deposition of chromium and copper in a roll metallization system. Two plasma system configurations were employed for treatment. In one configuration, the sample traveled downstream from a microwave plasma; in the other, the web moved through a DC-generated glow discharge. For the DC-glow treatment, the potential difference between the plasma and the web, Φf, and relative ion densities, n+, were measured at various values of chamber pressure and DC power using a Langmuir probe. Although samples treated downstream from the microwave plasma were not subjected to bombardment by energetic ions, Φf for the DC-glow operating conditions was between 5 and 13 eV. For both films, advancing DI water contact angles of less than 20° were achieved using both modes of treatment. Contact angles for untreated films were greater than 60°. However, 90° peel tests yielded values of 15 to 20 g/mm for microwave plasma ...
Archive | 1992
Kim J. Blackwell; Allan R. Knoll
Archive | 1991
Kim J. Blackwell; Pei C. Chen; Stephen E. Deliman; Allan R. Knoll; George J. Matarese; Richard D. Weale
Archive | 1997
Kim J. Blackwell; Frank D. Egitto; Allan R. Knoll
Archive | 1995
Kim J. Blackwell; Pei Cheh Chen; Frank D. Egitto; Allan R. Knoll; George J. Matarese
Archive | 1991
Kim J. Blackwell; Pei C. Chen; Frank D. Egitto; Allan R. Knoll; George J. Matarese
Archive | 1994
Kim J. Blackwell; Pei Cheh Chen; Allan R. Knoll; Richard D. Weale
Archive | 1989
Suryadevara V. Babu; Joseph Gerard Hoffarth; Allan R. Knoll; Walter E. Mlynko; John F. Rembetski; Kenneth D. Mack
Surface and Interface Analysis | 1990
D. D. Coolbaugh; Frank D. Egitto; Allan R. Knoll
Archive | 1990
Suryadevara V. Babu; Joseph Gerard Hoffarth; Allan R. Knoll; Walter E. Mlynko; John F. Rembetski