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Dive into the research topics where Allen Keith Bates is active.

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Featured researches published by Allen Keith Bates.


Proceedings of SPIE, the International Society for Optical Engineering | 2000

Long-term testing of optical components for 157-nm lithography

Vladimir Liberman; Mordechai Rothschild; Jan H. C. Sedlacek; Ray S. Uttaro; Allen Keith Bates; Kevin J. Orvek

Photolithography utilizing 157-nm excimer lasers is a leading candidate technology for the post-193-nm generation. A key element required for successful insertion of this technology is the near-term performance and long-term reliability of the components of the optical train, including transparent bulk materials for lenses, optical coatings, photomask substrates, and pellicles. For instance, after 100 billion pulses at an incident fluence of 0.5 mJ/cm2/pulse optical materials, of which the primary candidate is calcium fluoride, should have an absorption coefficient of less than 0.002 cm-1, and antireflective layers should enable transmission of 98.5 percent for a two-sided coated substrate. Modified fused silica has emerged as a viable option as a transparent photomask substrate, and several approaches are being explored for transmissive membranes to be used as pellicles.


Proceedings of SPIE, the International Society for Optical Engineering | 1999

Long-term 193-nm laser-induced degradation of fused silica and calcium fluoride

Vladimir Liberman; Mordechai Rothschild; Jan H. C. Sedlacek; Ray S. Uttaro; Allen Keith Bates; Chris K. Van Peski

We have completed a comprehensive evaluation of bulk materials designed for 193-nm lithographic applications. These studies are performed at realistic fluences and pulse counts in excess of 6 X 109. The outcome of the study shows that most calcium fluoride materials should meet the industry lifetime targets for use in lens applications. Some fused silica material also appears to meet lifetime expectations of the industry; however, large grade-to-grade variability in both absorption and laser-induced densification has been observed. We also report on the impact of transient absorption in fused silica on lithographic dose control.


23rd Annual International Symposium on Microlithography | 1998

Assessment of optical coatings for 193-nm lithography

Vladimir Liberman; Mordechai Rothschild; Jan H. C. Sedlacek; Ray S. Uttaro; Andrew Grenville; Allen Keith Bates; Chris K. Van Peski

We present an assessment of antireflective coatings for 193-nm lithography. Coatings from nine suppliers were exposed in a nitrogen ambient for up to 1.5 billion pulses at 15 mJ/cm2/pulse at 400 Hz. Sensitive metrology, developed for this study, included reflectance/transmittance measurements, in-situ ratiometric transmission measurements, and interferometric calorimetry for absorption measurements. The coatings from at least two suppliers withstood greater than 1 billion pulses with no observable degradation. Catastrophic damage observed on some samples included blistering and a dramatic transmission drop. Such damage occurred rather early (less than 100 million pulses).


Japanese Journal of Applied Physics | 1997

Interactions between Servo Loops of an Optical Disk Drive

Tetsuo Semba; Allen Keith Bates; Alan August Fennema

In optical disk drives, interactions between the electromechanical actuators and the servo error generation systems can cause instabilities in the operation of individual servo loops. We examine the effects of these interactions on the servo loops of an optical disk drive in which a galvano fine-tracking actuator, a push-pull tracking error detection scheme, and an astigmatic focus error detection method are used. Also, we describe a digital servo controller that effectively cancels the effects of the deleterious interactions, resulting in stable operation.


Archive | 2008

File system with internal deduplication and management of data blocks

Allen Keith Bates; Nils Haustein; Craig Anthony Klein; Frank Krick; Ulf Troppens; Daniel James Winarski


Ibm Journal of Research and Development | 2001

Review of technology for 157-nm lithography

Allen Keith Bates; Mordechai Rothschild; Theodore M. Bloomstein; Theodore H. Fedynyshyn; Roderick R. Kunz; Vladimir Liberman; Michael Switkes


Archive | 2008

ADJUSTING READ HEADS BASED ON MISREGISTRATION CALCULATED FROM SERVO PATTERNS

Allen Keith Bates; Nhan Xuan Bui; Daniel James Winarski


Archive | 2008

Apparatus and method to select a deduplication protocol for a data storage library

Allen Keith Bates; Nils Haustein; Craig Anthony Klein; Ulf Troppens; Daniel James Winarski


Archive | 2006

Apparatus and method to repair an error condition in a device comprising a computer readable medium comprising computer readable code

Allen Keith Bates; Octaviano G. Gomez; Shinobu Wada; Daniel James Winarski


Archive | 2008

ORDERING COMPRESSION AND DEDUPLICATION OF DATA

Allen Keith Bates; Nils Haustein; Craig Anthony Klein; Daniel James Winarski

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