Andreas Vetter

High Efficiency On-Chip Single-Photon Detection for Diamond Nanophotonic Circuits

Nanophotonic integrated circuits made from diamond-on-insulator templates are promising candidates for full-scale classical and quantum optical applications on a chip. For operation on a single photon level, both passive devices as well as light sources and single photon detectors co-implemented with a waveguide architecture are essential. Here, we present an in-depth investigation of the efficiency and timing characteristics of superconducting nanowire single-photon detectors (SNSPDs) situated directly atop diamond waveguides. Effects of nanowire length and critical current on the SNSPD performance are elaborated and true single-photon detection capability is confirmed by statistical measures.

Spectrally multiplexed single-photon detection with hybrid superconducting nanophotonic circuits

The detection of individual photons by superconducting nanowire single-photon detectors is an inherently binary mechanism, revealing either their absence or presence while concealing their spectral information. For multicolor imaging techniques, such as single-photon spectroscopy, fluorescence resonance energy transfer microscopy, and fluorescence correlation spectroscopy, wavelength discrimination is essential and mandates spectral separation prior to detection. Here, we adopt an approach borrowed from quantum photonic integration to realize a compact and scalable waveguide-integrated single-photon spectrometer capable of parallel detection on multiple wavelength channels, with temporal resolution below 50 ps and dark count rates below 10 Hz at 80% of the devices’ critical current. We demonstrate multidetector devices for telecommunication and visible wavelengths, and showcase their performance by imaging silicon vacancy color centers in diamond nanoclusters. The fully integrated hybrid superconducting nanophotonic circuits enable simultaneous spectroscopy and lifetime mapping for correlative imaging and provide the ingredients for quantum wavelength-division multiplexing on a chip.

Hot-spot relaxation time current dependence in niobium nitride waveguide-integrated superconducting nanowire single-photon detectors

We investigate how the bias current affects the hot-spot relaxation dynamics in niobium nitride. We use for this purpose a near-infrared pump-probe technique on a waveguide-integrated superconducting nanowire single-photon detector driven in the two-photon regime. We observe a strong increase in the picosecond relaxation time for higher bias currents. A minimum relaxation time of (22 ± 1) ps is obtained when applying a bias current of 50% of the switching current at 1.7 K bath temperature. We also propose a practical approach to accurately estimate the photon detection regimes based on the reconstruction of the measured detector tomography at different bias currents and for different illumination conditions.

Semiconductor-based narrow-line and high-brilliance 193-nm laser system for industrial applications

We present a novel industrial-grade prototype version of a continuous-wave 193 nm laser system entirely based on solid state pump laser technology. Deep-ultraviolet emission is realized by frequency-quadrupling an amplified diode laser and up to 20 mW of optical power were generated using the nonlinear crystal KBBF. We demonstrate the lifetime of the laser system for different output power levels and environmental conditions. The high stability of our setup was proven in > 500 h measurements on a single spot, a crystal shifter multiplies the lifetime to match industrial requirements. This laser improves the relative intensity noise, brilliance, wall-plug efficiency and maintenance cost significantly. We discuss first lithographic experiments making use of this improvement in photon efficiency.

Mask-aligner lithography using a continuous-wave diode laser frequency-quadrupled to 193 nm

We present a mask-aligner lithographic system operated with a frequency-quadrupled continuous-wave diode laser emitting at 193 nm. For this purpose, a 772 nm diode laser is amplified by a tapered amplifier in the master-oscillator power-amplifier configuration. The emission wavelength is upconverted twice, using LBO and KBBF nonlinear crystals in second-harmonic generation enhancement cavities. An optical output power of 10 mW is achieved. As uniform exposure field illumination is crucial in mask-aligner lithography, beam shaping is realized with optical elements made from fused silica and CaF2 featuring a diffractive non-imaging homogenizer. A tandem setup of shaped random diffusers, one static and one rotating, is used to control speckle formation. We demonstrate first experimental soft contact and proximity prints for a field size of 1 cm2 with a standard binary photomask and proximity prints with a two-level phase mask, both printed into 120 nm layers of photoresist on unstructured silicon substrates.

Mask-aligner Talbot lithography using a 193nm CW light source

We present and discuss Talbot mask-aligner lithography, relying on a continuous wave laser emitting at 193nm for the illumination. In this source, a diode laser at 772nm is amplified by a tapered amplifier in master-oscillator power-amplifier configuration and frequency-quadrupled in two subsequent enhancement cavities using lithium triborate and potassium fluoro-beryllo-borate nonlinear crystals to generate the emission at 193 nm. The high coherence and brilliance of such an illumination source is predestined for plane wave mask-aligner illumination, crucial in particular for high-resolution lithographic techniques such as Talbot lithography and phase-shift masks. Talbot lithography takes advantage of the diffraction effect to image periodic mask features via self-replication in multiples of the Talbot distance behind the photomask when exposed by a plane wave. By placing a photoresistcoated wafer in one of the Talbot planes, the mask pattern is replicated in the resist. Periodic patterns with diverse shapes are required for wire grid polarizers, diffraction gratings, and hole arrays in photonic applications as well as for filters and membranes. Using an amplitude mask with periodic structures, we demonstrate here with such a technique sub-micron feature sizes for various designs at a proximity gap of 20 µm.

Enabling proximity mask-aligner lithography with a 193nm CW light source

We introduce a novel industrial grade 193nm continuous-wave laser light source for proximity mask-aligner lithography. A diode seed laser in master-oscillator power-amplification configuration is frequency-quadrupled using lithiumtriborate and potassium-uoro-beryllo-borate non-linear crystals. The large coherence-length of this monomodal laser is controlled by static and rotating shaped random diffusers. Beam shaping with imaging and non-imaging homogenizers realized with diffractive and refractive micro-optical elements is compared in simulation and measurement. We demonstrate resolution patterns offering resolutions <2 µm printed with proximity gaps of 20 µm.

Waveguide integrated superconducting single-photon detectors

Near-field coupling to nanophotonic waveguides enables absorption engineering of superconducting nanowires for efficient single photon detection on chip. The direct compatibility with photonic circuitry allows for using such devices in the framework of integrated optics and thus for exploiting the rich toolbox of nanophotonics for device characterization and optimization. We integrate superconducting single photon detectors with photonic circuitry made from different transparent materials. Both single and multi-photon capability can be achieved through variation of the nanowire width, as well as ultra-fast single photon counting with high detection rates by reducing the nanowire length.

Travelling-wave single-photon detectors integrated with diamond photonic circuits: Operation at visible and telecom wavelengths with a timing jitter down to 23 ps

We report on the design, fabrication and measurement of travelling-wave superconducting nanowire single-photon detectors (SNSPDs) integrated with polycrystalline diamond photonic circuits. We analyze their performance both in the near-infrared wavelength regime around 1600 nm and at 765 nm. Near-IR detection is important for compatibility with the telecommunication infrastructure, while operation in the visible wavelength range is relevant for compatibility with the emission line of silicon vacancy centers in diamond which can be used as efficient single-photon sources. Our detectors feature high critical currents (up to 31 μA) and high performance in terms of efficiency (up to 74% at 765 nm), noise-equivalent power (down to 4.4×10-19 W/Hz1/2 at 765 nm) and timing jitter (down to 23 ps).