Anne-Marie Valente-Feliciano

Plasma processing of large curved surfaces for superconducting rf cavity modification

In this study, plasma based surface modification of niobium is a promising alternative to wet etching of superconducting radio frequency (SRF) cavities. The development of the technology based on Cl2/Ar plasma etching has to address several crucial parameters which influence the etching rate and surface roughness, and eventually, determine cavity performance. This includes dependence of the process on the frequency of the RF generator, gas pressure, power level, the driven (inner) electrode configuration, and the chlorine concentration in the gas mixture during plasma processing. To demonstrate surface layer removal in the asymmetric non-planar geometry, we are using a simple cylindrical cavity with 8 ports symmetrically distributed over the cylinder. The ports are used for diagnosing the plasma parameters and as holders for the samples to be etched. The etching rate is highly correlated with the shape of the inner electrode, radio-frequency (RF) circuit elements, chlorine concentration in the Cl2/Ar gas mixtures, residence time of reactive species and temperature of the cavity. Using cylindrical electrodes with variable radius, large-surface ring-shaped samples and d.c. bias implementation in the external circuit we have demonstrated substantial average etching rates and outlined the possibility to optimize plasma properties with respect to maximum surface processing effect.

Equilibrium properties of superconducting niobium at high magnetic fields:A possible existence of a filamentary state in type-II superconductors

The standard interpretation of the phase diagram of type-II superconductors was developed in the 1960s and has since been considered a well-established part of classical superconductivity. However, upon closer examination a number of fundamental issues arises that leads one to question this standard picture. To address these issues we studied equilibrium properties of niobium samples near and above the upper critical field Hc2 in parallel and perpendicular magnetic fields. The samples investigated were very high quality films and single-crystal disks with the Ginzburg-Landau parameters 0.8 and 1.3, respectively. A range of complementary measurements has been performed, which include dc magnetometry, electrical transport, muon spin rotation spectroscopy, and scanning Hall-probe microscopy. Contrary to the standard scenario, we observed that a superconducting phase is present in the sample bulk above Hc2 and the field Hc3 is the same in both parallel and perpendicular fields. Our findings suggest that above Hc2 the superconducting phase forms filaments parallel to the field regardless of the field orientation. Near Hc2 the filaments preserve the hexagonal structure of the preceding vortex lattice of the mixed state, and the filament density continuously falls to zero at Hc3. Our paper has important implications for the correct interpretation of the properties of type-II superconductors and can be essential for practical applications of these materials.

Equilibrium Properties of the Mixed State in Superconducting Niobium in a Transverse Magnetic Field: Experiment and Theoretical Model

Equilibrium magnetic properties of the mixed state in type II superconductors were studied on high-purity film and single-crystal niobium samples with different Ginzburg-Landau parameters in perpendicular and parallel magnetic fields using dc magnetometry and scanning Hall-probe microscopy. The magnetization curve for samples with unity demagnetizing factor (slabs in perpendicular field) was obtained for the first time. It was found that none of the existing theories is consistent with these new data. To address this problem, a theoretical model is developed and comprehensively validated. The new model describes the mixed state in an averaged limit, i.e., without detailing the samples’ magnetic structure and therefore ignoring the surface current and interactions between the structural units (vortices). At low values of the Ginzburg-Landau parameter, it converts to the model of Peierls and London for the intermediate state in type I superconductors. The model quantitatively describes the magnetization curve for the perpendicular field and provides new insights into the properties of the mixed state, including properties of individual vortices. In particular, it suggests that description of the vortex matter in superconductors of the transverse geometry as a “gas-like” system of non-interacting vortices is more appropriate than the frequently used solid-like scenarios.

Cryogenic rf test of the first SRF cavity etched in an rf Ar/Cl2 plasma

An apparatus and a method for etching of the inner surfaces of superconducting radio frequency (SRF) accelerator cavities are described. The apparatus is based on the reactive ion etching performed in an Ar/Cl2 cylindrical capacitive discharge with reversed asymmetry. To test the effect of the plasma etching on the cavity rf performance, a 1497 MHz single cell SRF cavity was used. The single cell cavity was mechanically polished and buffer chemically etched and then rf tested at cryogenic temperatures to provide a baseline characterization. The cavity’s inner wall was then exposed to the capacitive discharge in a mixture of Argon and Chlorine. The inner wall acted as the grounded electrode, while kept at elevated temperature. The processing was accomplished by axially moving the dc-biased, corrugated inner electrode and the gas flow inlet in a step-wise manner to establish a sequence of longitudinally segmented discharges. The cavity was then tested in a standard vertical test stand at cryogenic temperatu...

Apparatus and method for plasma processing of SRF cavities

Abstract An apparatus and a method are described for plasma etching of the inner surface of superconducting radio frequency (SRF) cavities. Accelerator SRF cavities are formed into a variable-diameter cylindrical structure made of bulk niobium, for resonant generation of the particle accelerating field. The etch rate non-uniformity due to depletion of the radicals has been overcome by the simultaneous movement of the gas flow inlet and the inner electrode. An effective shape of the inner electrode to reduce the plasma asymmetry for the coaxial cylindrical rf plasma reactor is determined and implemented in the cavity processing method. The processing was accomplished by moving axially the inner electrode and the gas flow inlet in a step-wise way to establish segmented plasma columns. The test structure was a pillbox cavity made of steel of similar dimension to the standard SRF cavity. This was adopted to experimentally verify the plasma surface reaction on cylindrical structures with variable diameter using the segmented plasma generation approach. The pill box cavity is filled with niobium ring- and disk-type samples and the etch rate of these samples was measured.

High etching rates of bulk Nb in Ar/Cl2 microwave discharge

Plasma-based Nb surface treatment provides an excellent opportunity to eliminate surface imperfections and increase the cavity quality factor in important applications such as particle accelerators and cavity quantum electrodynamics, as well as Josephson junctions. In this study, plasma etching of bulk Nb is performed on the surface of disk-shaped samples with the goal of eliminating nonsuperconductive pollutants in the penetration depth region and the mechanically damaged surface layer. The authors have demonstrated that in the microwave glow discharge, an etching rate of 1.5 μm/min can be achieved using Cl2 as a reactive gas. The influence of plasma parameters such as input power, pressure, and concentration of the reactive gas on the etching rate is determined. Simultaneously, plasma emission spectroscopy was used to estimate the densities of Cl, Cl+, and Cl2 under various plasma conditions.

Effect of self-bias on cylindrical capacitive discharge for processing of inner walls of tubular structures—Case of SRF cavities

Cylindrical capacitive discharge is a convenient medium for generating reactive ions to process inner walls superconductive radio-frequency (SRF) cavities. These cavities, used in particle accelerators, presents a three-dimensional structure made of bulk Niobium, with axial cylindrical symmetry. Manufactured cavity walls are covered with Niobium oxides and scattered particulates, which must be removed for desired SRF performance. Cylindrical capacitive discharge in a mixture of Ar and Cl2 is a sole and natural non-wet acid choice to purify the inner surfaces of SRF cavities by reactive ion etching. Coaxial cylindrical discharge is generated between a powered inner electrode and the grounded outer electrode, which is the cavity wall to be etched. Plasma sheath voltages were tailored to process the outer wall by providing an additional dc current to the inner electrode with the help of an external compensating dc power supply and corrugated design of the inner electrode. The dc bias potential difference is established between two electrodes to make the set-up favorable for SRF wall processing. To establish guidelines for reversing the asymmetry and establishing the optimal sheath voltage at the cavity wall, the dc self-bias potential and dc current dependence on process parameters, such as gas pressure, rf power and chlorine content in the Ar/Cl2 gas mixture was measured. The process is potentially applicable to all concave metallic surfaces.Cylindrical capacitive discharge is a convenient medium for generating reactive ions to process inner walls superconductive radio-frequency (SRF) cavities. These cavities, used in particle accelerators, presents a three-dimensional structure made of bulk Niobium, with axial cylindrical symmetry. Manufactured cavity walls are covered with Niobium oxides and scattered particulates, which must be removed for desired SRF performance. Cylindrical capacitive discharge in a mixture of Ar and Cl2 is a sole and natural non-wet acid choice to purify the inner surfaces of SRF cavities by reactive ion etching. Coaxial cylindrical discharge is generated between a powered inner electrode and the grounded outer electrode, which is the cavity wall to be etched. Plasma sheath voltages were tailored to process the outer wall by providing an additional dc current to the inner electrode with the help of an external compensating dc power supply and corrugated design of the inner electrode. The dc bias potential difference is ...

Plasma modification of bulk niobium surface for SRF cavities

Summary form only given. Particle accelerator performance, in particular the average accelerating field and the cavity quality factor, depends on the physical and chemical characteristics of the superconducting radio-frequency (SRF) cavity surface. Plasma based surface modification provides an excellent opportunity to eliminate non-superconductive pollutants in the penetration depth region and to remove the mechanically damaged surface layer, which improves the surface roughness. Here we show that the non-equilibrium plasma treatment of bulk polycrystalline Nb presents a viable surface preparation method due to possibility to use plasma-generated radicals and due to the inherent anisotropy of the etching action. We have optimized the experimental conditions in the microwave glow discharge system and their influence on the Nb removal rate on the flat samples and achieved etching rate of 1.7 μm/min using up to 3% Cl2 in the reactive Ar/Cl2 mixture. Combining a fast etching step with a moderate one, we have improved the surface roughness without exposing the fresh sample surface to the environment.The geometry of SRF cavities made of bulk polycrystalline Nb requires the use of asymmetric RF discharge configuration for plasma etching. The asymmetry in the surface area of a driven and grounded electrode creates a difference in the voltage drop over the plasma sheath attached to the driven electrode and the sheath attached to the cavity surface. The driven electrode geometry is optimized to achieve homogeneous sheath conditions at the surface. Specially designed single cell cavity is used to study these asymmetric discharges which contain 20 sample holder holes symmetrically placed over the cell. These sample holder holes can be used for both diagnostics and sample etching purposes. The approach is to combine radially and spectrally resolved profiles of optical intensity of the discharge with direct etched surface diagnostics to obtain an optimum combination of etching rates, roughness and homogeneity in a variety of discharge types, conditions and sequences.