Ansgar W. Schmid

Near-ultraviolet absorption and nanosecond-pulse-laser damage in HfO2 monolayers studied by submicrometer-resolution photothermal heterodyne imaging and atomic force microscopy

Localized absorption in hafnium dioxide used as a high-index component in multilayer coatings for near-ultraviolet, nanosecond-pulse-laser applications is directly linked to laser-induced damage. The nature of the absorbing species and their physical properties remains unknown because of their extremely small sizes. Previous experimental evidence provided by the atomic force microscopy mapping of damage morphology points to a few-nanometer scale of these absorbers. This work demonstrates the submicrometer-resolution mapping of 355-nm absorption in HfO2 monolayers using a recently developed photothermal heterodyne imaging technique. The comparison of absorption maps with the atomic force microscopy investigation of pulsed-laser-induced damage morphology allows one to better estimate the spatial distribution of nanoscale absorbing defects in hafnia thin films. Possible defect-formation mechanisms are discussed.

OMEGA EP high-energy petawatt laser: progress and prospects

OMEGA EP (extended performance) is a petawatt-class addition to the existing 30-kJ, 60-beam OMEGA Laser Facility at the University of Rochester. It will enable high-energy picosecond backlighting of high-energy-density experiments and inertial confinement fusion implosions, the investigation of advanced-ignition experiments such as fast ignition, and the exploration of high-energy-density phenomena. The OMEGA EP short-pulse beams have the flexibility to be directed to either the existing OMEGA target chamber, or the new, auxiliary OMEGA EP target chamber for independent experiments. This paper will detail progress made towards activation, which is on schedule for completion in April 2008.

Room temperature single-photon Source:Single-dye molecule fluorescence in Liquid Crystal host

We report on new approaches toward an implementation of an efficient, room temperature, deterministically polarized, single-photon source (SPS) on demand-a key hardware element for quantum information and quantum communication. Operation of a room temperature SPS is demonstrated via photon antibunching in the fluorescence from single terrylene-dye molecules embedded in a cholesteric liquid crystal host. Using oxygen-depleted liquid crystal hosts, dye-bleaching was avoided over the course of more than 1 h of continuous 532-nm excitation. Liquid crystal hosts (including liquid crystal oligomers/polymers) permit further increase of the efficiency of the source: 1) by aligning the dye molecules along a direction preferable for maximum excitation efficiency; 2) by tuning a one-dimensional (1-D) photonic-band-gap microcavity of planar-aligned cholesteric (chiral nematic) liquid crystal layer to the dye fluorescence band.

TEM 00 -mode and single-longitudinal-mode laser operation with a cholesteric liquid-crystal laser end mirror

We describe the unique properties of a cholesteric liquid crystal as a laser end mirror. We show how it gives rise to TEM(00)-mode operation as well as single-longitudinal-mode operation of a solid-state laser resonator.

Stress compensation in hafnia/silica optical coatings by inclusion of alumina layers

Hafnium dioxide films deposited using electron-beam evaporation tend to exhibit high tensile stresses, particularly when deposited on low-thermal-expansion substrates for use in a low-relative-humidity environment. Hafnia has been shown to be a critical material, however, for use in high-peak-power laser coatings, providing exceptional deposition control and laser-damage resistance. To correct for tensile thin-film stresses in hafnia/silica multilayer coatings, alumina compensation layers were incorporated in the multilayer design. Determination of the stresses resulting from alumina layers in different coating designs has led to the realization of the influence of water diffusion and the diffusion-barrier properties of alumina that must be considered. The inclusion of alumina layers in a hafnia/silica multilayer provides the ability to produce low-compressive-stress, high-laser-damage-threshold coatings.

Laser-induced damage of photo-thermo-refractive glasses for optical holographic element writing

Bulk and surface-damage thresholds of photo-thermo- refractive glasses used for hologram writing were measured after different stages of development. Values obtained are compared with threshold from widely used glasses, such as BK7 or fused silica. Polished glass samples were exposed to 325-nm He-Cd laser radiation and thermodeveloped at 520 degrees C. Nd-glass, nanosecond laser pulses were used to irradiate the bulk and surfaces of glasses. It was found that laser-induced damage thresholds of photo-thermo- refractive glasses are within a factor of 2-4 of those for fused silica or BK7 glass. This indicates that phase element made from these glasses are promising candidates for use in high-power laser systems. Possible mechanisms of laser- induced damage are discussed.

Dye-doped cholesteric-liquid-crystal room-temperature single-photon source*

Fluorescence antibunching from single terrylene molecules embedded in a cholesteric-liquid-crystal host is used to demonstrate operation of a room-temperature single-photon source. One-dimensional (1-D) photonicband-gap microcavities in planar-aligned cholesteric liquid crystals with band gaps from visible to near-infrared spectral regions are fabricated. Liquid-crystal hosts (including liquid crystal oligomers and polymers) increase the source efficiency, firstly, by aligning the dye molecules along the direction preferable for maximum excitation efficiency (deterministic molecular alignment provides deterministically polarized output photons), secondly, by tuning the 1-D photonic-band-gap microcavity to the dye fluorescence band and thirdly, by protecting the dye molecules from quenchers, such as oxygen. In our present experiments, using oxygen-depleted liquid-crystal hosts, dye bleaching is avoided for periods exceeding one hour of continuous 532 nm excitation.

Room temperature source of single photons of definite polarization

A definite polarization in fluorescence from single emitters (dye molecules) at room temperature is demonstrated. A planar-aligned, nematic liquid-crystal host provides definite alignment of single dye molecules in a preferred direction. Well-defined polarized fluorescence from single emitters (single photon source) is important for applications in photonic quantum information. Polarized single-photon sources based on single emitters, for example, are key hardware elements both for absolutely secure quantum communication and quantum computation systems.

DEPENDENCE OF BIREFRINGENCE AND RESIDUAL STRESS NEAR LASER-INDUCED CRACKS IN FUSED SILICA ON LASER FLUENCE AND ON LASER-PULSE NUMBER

Measurements of birefringence induced in fused-silica specimens by a crack produced by a 351-nm/500-ps Nd:glass laser as a function of laser fluence F(L) and of number of laser shots N are presented. The varying dimensional parameter is found to be the crack depth a and can be put in the form a(mm) = (0.0096 ? 0.0021)N[(F(L)/F(exit/th)) - 1](2/3) with F(L) >/= F(exit/th)(F(exit/th) is the exit-surface damage threshold). The retardance data are converted into units of stress, thus permitting the estimation of residual stress near the crack. The results of the measured residual stress can be cast in the form varsigma(r)(MPa) approximately (. ? .)[(F(L)/F(exit/th)) - 1](1/2) N(2/3) with F(L)>/= F(exit/th). A theoretical model giving the stress field around a crack is developed for comparison and shows reasonable agreement with the experiment. Good agreement with experimental data of others is also obtained. The effect of residual stresses on fracture strength is pointed out. The results obtained show that the presence of birefringence/residual stress in a fused-silica specimen with a crack on its surface has a strong effect on fracture and should be taken into account in any formulation that involves the failure strength of optical components used in inertial-confinement-fusion experiments.

Improving the performance of high-laser-damage-threshold, multilayer dielectric pulse-compression gratings through low-temperature chemical cleaning

A low-temperature chemical cleaning approach has been developed to improve the performance of multilayer dielectric pulse-compressor gratings for use in the OMEGA EP laser system. X-ray photoelectron spectroscopy results guided the selection of targeted cleaning steps to strip specific families of manufacturing residues without damaging the gratings fragile 3D profile. Grating coupons that were cleaned using the optimized method consistently met OMEGA EP requirements on diffraction efficiency and 1054 nm laser-damage resistance at 10 ps. The disappearance of laser-conditioning effects for the highest-damage-threshold samples suggests a transition from a contamination-driven laser-damage mechanism to defect-driven damage for well-cleaned components.