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Dive into the research topics where Arief Udhiarto is active.

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Featured researches published by Arief Udhiarto.


Nanoscale Research Letters | 2011

Atom devices based on single dopants in silicon nanostructures.

Daniel Moraru; Arief Udhiarto; Miftahul Anwar; Roland Nowak; Ryszard Jablonski; Earfan Hamid; Juli Cha Tarido; Takeshi Mizuno; Michiharu Tabe

Silicon field-effect transistors have now reached gate lengths of only a few tens of nanometers, containing a countable number of dopants in the channel. Such technological trend brought us to a research stage on devices working with one or a few dopant atoms. In this work, we review our most recent studies on key atom devices with fundamental structures of silicon-on-insulator MOSFETs, such as single-dopant transistors, preliminary memory devices, single-electron turnstile devices and photonic devices, in which electron tunneling mediated by single dopant atoms is the essential transport mechanism. Furthermore, observation of individual dopant potential in the channel by Kelvin probe force microscopy is also presented. These results may pave the way for the development of a new device technology, i.e., single-dopant atom electronics.


Applied Physics Letters | 2011

Effect of electron injection into phosphorus donors in silicon-on-insulator channel observed by Kelvin probe force microscopy

Miftahul Anwar; Roland Nowak; Daniel Moraru; Arief Udhiarto; Takeshi Mizuno; Ryszard Jablonski; Michiharu Tabe

We have comparatively studied the effects of electron injection in individual phosphorus-donor potential wells at 13 K and 300 K by Kelvin probe force microscopy in silicon-on-insulator metal-oxide-semiconductor field-effect-transistors. As a result, at 13 K, localized single-electron filling into the phosphorus-donor potential well is found, reflecting single-electron tunneling transport through individual donors, whereas at 300 K, spatially extended and continuous electron filling over a number of phosphorus-donors is observed, reflecting drift-diffusion transport.


Applied Physics Express | 2012

Photon-Induced Random Telegraph Signal Due to Potential Fluctuation of a Single Donor--Acceptor Pair in Nanoscale Si p--n Junctions

Arief Udhiarto; Daniel Moraru; Sri Purwiyanti; Youhei Kuzuya; Takeshi Mizuno; Hiroshi Mizuta; Michiharu Tabe

We study the photoresponse of Si nanoscale p–n and p–i–n diodes. As a result, we find a photon-sensitive multilevel random telegraph signal (RTS) in p–n diodes, but not in p–i–n diodes. From this fact and analysis of current jumps in the RTS, the multilevel RTS is ascribed to single photocarrier charging and discharging in a donor–acceptor pair in the depletion region. Thus, it is found that a donor–acceptor pair plays an important role in p–n junctions, while, according to our previous report, a single donor (acceptor) works as an electron (hole) trap in junctionless field-effect transistors.


Applied Physics Letters | 2011

Trapping of a photoexcited electron by a donor in nanometer-scale phosphorus-doped silicon-on-insulator field-effect transistors

Arief Udhiarto; Daniel Moraru; Takeshi Mizuno; Michiharu Tabe

We study interaction of single-electron current and incident photons in nanometer-scale phosphorus-doped silicon-on-insulator field-effect transistors. Trapping events of a photoexcited-electron by a trap donor are observed as random telegraph signals in single-electron-tunneling current flowing through a current-path donor. Trapping causes a potential change at the current-path donor, inducing a current change. An opposite current change is caused by electron detrapping from the trap donor to the current-path donor. This indicates that only a few donors (two donors in this study) work in the interaction between single-electron transport and photoexcited-electron trapping, even in the presence of many donors.


Advanced Materials Research | 2011

Si-Based Single-Dopant Atom Devices

Michiharu Tabe; Daniel Moraru; Arief Udhiarto; Sakito Miki; Miftahul Anwar; Yuya Kawai; Takeshi Mizuno

We have recently proposed and demonstrated a new device concept, “Si-based single-dopant atom device”, consisting of only one or a few dopant atoms in the channel of Si field-effect transistors. The device characteristics are determined by a dopant, which is mediating electron or hole transport between source and drain electrodes. In this paper, our recent results on electronic and photonic applications are introduced. Furthermore, single-dopant images obtained by a scanning probe microscope are also presented.


Journal of Nanomaterials | 2017

CO Gas-Induced Resonance Frequency Shift of ZnO-Functionalized Microcantilever in Humid Air

Lia Aprilia; Ratno Nuryadi; Dwi Gustiono; Nurmahmudi; Arief Udhiarto; Djoko Hartanto; Brian Yuliarto; Makoto Hosoda; Yoichiro Neo; Hidenori Mimura

Resonance frequency shift of a zinc oxide- (ZnO-) functionalized microcantilever as a response to carbon monoxide (CO) gas has been investigated. Here, ZnO microrods were grown on the microcantilever surface by a hydrothermal method. The measurement of resonance frequency of the microcantilever vibrations due to the gas was carried out in two conditions, that is, gas flow with and without air pumping into an experiment chamber. The results show that the resonance frequency of the ZnO-functionalized microcantilever decreases because of CO in air pumping condition, while it increases when CO is introduced without air pumping. Such change in the resonance frequency is influenced by water vapor condition, and a possible model based on water-CO combination was proposed.


2017 15th International Conference on Quality in Research (QiR) : International Symposium on Electrical and Computer Engineering | 2017

Effect of anode and cathode workfunction on the operating voltage and luminance of a single emissive layer organic light emitting diode

Arief Udhiarto; Layina Maula Haryanto; Bobi Khoerun; Djoko Hartanto

Organic light emitting diodes (OLED) are considered to be a promising candidate for light sources as well as for flat panel display because of their numerous advantageous. Two important parameters of an OLED among many other parameters to measure OLED performance are operating voltage and luminance. Those two parameters are believed to be strongly influenced by an anode and cathode workfunction of materials used as electrodes. In this paper, we study the effect of anode and cathode workfunction on the operating voltage and luminance of a single emissive layer organic light emitting diode. Devices with five different cathodes: Aluminum (Al), Calcium (Ca), Magnesium (Mg), Argentum (Ar), and Cuprum (Cu) and three different anodes: Indium Thin Oxide (ITO), Poly-(3,4-Ethylenedioxidythiophene)-Poly (Styrene Sulfonate) (PEDOT:PSS), Zinc Oxide (ZnO) are compared and analyzed. A 2 nm thick of Polyfluorene (PFO) is used as an emissive layer. SimOLED is used to simulate and analyze both electrical and optical characteristics. Current voltage luminance (IVL) characteristics are simulated under forward biased from 0 to 10 V. We found that the use of anode with higher workfunction can reduce operating voltage as well as increases device luminance. On the other hand, the use of lower workfunction of cathode can reduce operating voltage however it is not always increasing device luminance. The decrease of the operating voltage by increasing anode workfunction and decreasing cathode workfunction are ascribed to the barrier lowering of the holes and the electrons respectively.


international conference on neural information processing | 2002

The performance of Si/sub 0.2/Ge/sub 0.8//Si solar cell

Nji Raden Poespawati; Arief Udhiarto; Djoko Hartanto

Solar cell is optimized to convert solar radiation to electrical current with conversion efficiency as high as possible. Due to their superior performance compared to conventional silicon devices we used the Si/sub x/Ge/sub 1-x/ strained layer for increasing the efficiency of solar cell device. By using simulations tools, i.e. pc1d version 5.6, we investigate and analysis the performance of Si/sub 0.2/Ge/sub 0.8//Si solar cell, especially open circuit voltage, short circuit current, fill factor which will affect the efficiency of the device. We also compare it with conventional silicon solar cell in order to examine their performances and the thickness of both device structures. The Si/sub x/Ge/sub 1-x/ strained layer we applied contents 80% germanium. Results show that by inserting Si/sub 0.2/Ge/sub 0.8/ strained layer in device structure open circuit voltage and short circuit current has been optimal and the thickness of the device compared to conventional silicon solar cell is 1/17 times.


Physica Status Solidi (a) | 2011

Single-photon detection by Si single-electron FETs

Michiharu Tabe; Arief Udhiarto; Daniel Moraru; Takeshi Mizuno


international conference and utility exhibition on green energy for sustainable development | 2014

Towards green and sustainable society: A case of engineering faculty, Universitas Indonesia

Gabriel Andari Kristanto; Cindy Rianti Priadi; Mulia Orientilize; Arief Udhiarto; Erly Bahsan

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