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Asai Satoshi

Shin-Etsu Chemical

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Publication

Featured researches published by Asai Satoshi.

Archive | 2007

Silphenylene skeleton-bearing polymer compound, photo-curable resin composition and patterning process, and substrate circuit protective film

Kato Hideto; Asai Satoshi

Archive | 2003

Photosetting resin composition, method for forming pattern, and film for protection of substrate

Kato Hideto; Noda Kazumi; Fujii Toshihiko; Arai Kazuhiro; Asai Satoshi

Archive | 2014

DIALLYL GROUP-CONTAINING HYDROXYPHENYL DERIVATIVE, SILICONE SKELETON-CONTAINING POLYMER COMPOUND, NEGATIVE RESIST MATERIAL, PHOTOCURABLE DRY FILM, PATTERN FORMATION METHOD AND COATING FOR PROTECTION OF ELECTRIC/ELECTRONIC COMPONENT

Takemura Katsuya; Urano Hiroyuki; Miyazaki Takashi; Asai Satoshi; Nakajima Naotsugu

Archive | 2014

SILICONE SKELETON-CONTAINING POLYMER COMPOUND, NEGATIVE RESIST MATERIAL, PHOTOCURABLE DRY FILM, PATTERN FORMATION METHOD AND COATING FOR PROTECTION OF ELECTRIC/ELECTRONIC COMPONENT

Takemura Katsuya; Urano Hiroyuki; Miyazaki Takashi; Asai Satoshi; Nakajima Naotsugu

Archive | 2004

HYDROPHILIC GROUP-CONTAINING ORGANOSILOXANE-BASED POLYMER COMPOUND, PHOTOCURABLE RESIN COMPOSITION, METHOD FOR PATTERN FORMATION AND COATING FILM FOR SUBSTRATE PROTECTION

Kato Hideto; Asai Satoshi; Soga Kyoko

Archive | 2016

SEMICONDUCTOR DEVICE, LAYERED SEMICONDUCTOR DEVICE, SEALED-THEN-LAYERED SEMICONDUCTOR DEVICE, AND MANUFACTURING METHODS THEREFOR

Takemura Katsuya; Soga Kyoko; Asai Satoshi; Kondo Kazunori; Sugo Michihiro; Kato Hideto

Archive | 2015

SILICONE SKELETON-CONTAINING POLYMERIC COMPOUND, CHEMICALLY AMPLIFIED NEGATIVE RESIST MATERIAL, PHOTOCURABLE DRY FILM, PATTERN FORMING METHOD, AND ELECTRIC-ELECTRONIC COMPONENT PROTECTIVE COATING

Asai Satoshi; Urano Hiroyuki; Takemura Katsuya

Archive | 2014

ADAMANTANE SKELETON-CONTAINING COMPOUND, SILICONE SKELETON-CONTAINING POLYMER COMPOUND, NEGATIVE RESIST MATERIAL, PHOTOCURABLE DRY FILM, PATTERN FORMATION METHOD AND COATING FOR PROTECTION OF ELECTRIC/ELECTRONIC COMPONENT

Takemura Katsuya; Urano Hiroyuki; Miyazaki Takashi; Asai Satoshi; Nakajima Naotsugu

Archive | 2004

ORGANOSILOXANE POLYMER SUITABLE FOR USE AS A BASE POLYMER IN PHOTO-CURABLE RESIN COMPOSITIONS, PHOTO-CURABLE RESIN COMPOSITION COMPRISING THE SAME, PATTERNING PROCESS USING THE COMPOSITION, AND SUBSTRATE PROTECTIVE FILM MADE FROM THE COMPOSITION

Arai Kazuhiro; Kato Hideto; Asai Satoshi

Archive | 2017

Semiconductor apparatus, flip-chip type semiconductor apparatus, and manufacture method thereof

Soga Kyoko; Asai Satoshi

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Soga Kyoko

Shin-Etsu Chemical

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Kato Hideto

Shin-Etsu Chemical

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Takemura Katsuya

Shin-Etsu Chemical

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Urano Hiroyuki

Shin-Etsu Chemical

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Miyazaki Takashi

Shin-Etsu Chemical

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Kondo Kazunori

Shin-Etsu Chemical

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Sugo Michihiro

Shin-Etsu Chemical

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