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Takemura Katsuya

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Publication

Featured researches published by Takemura Katsuya.

Archive | 1992

Positive type resist material

Takemura Katsuya; Tsuchiya Junji; Ishihara Toshinobu; Tanaka Haruyori; Kawai Yoshio; Nakamura Jiro

Archive | 1997

NEW SULFONIUM SALT AND CHEMICAL AMPLIFICATION POSITIVE TYPE RESIST MATERIAL

Osawa Yoichi; Watanabe Satoshi; Shimada Junji; Takemura Katsuya; Ishihara Toshinobu

Archive | 2004

POSITIVE RESIST MATERIAL AND PATTERN FORMING METHOD USING THE SAME

Hamada Yoshitaka; Yagihashi Fujio; Nakajima Mutsuo; Noda Kazumi; Takemura Katsuya

Archive | 2004

PHOTO-ACID INITIATOR FOR CHEMICALLY AMPLIFIED RESIST MATERIAL, AND RESIST MATERIAL USING THE SAME, AND PATTERN FORMING METHOD

Osawa Yoichi; Kobayashi Katsuhiro; Takemura Katsuya; Tsuchiya Junji; Maeda Kazunori

Archive | 1997

POLYSILOXANE COMPOUND AND POSITIVE RESIST MATERIAL

Takemura Katsuya; Tsuchiya Junji; Watanabe Osamu; Ishihara Toshinobu

Archive | 1996

PHOTORESIST OVERCOATING MATERIAL AND RESIST PATTERN FORMING METHOD

Tsuchiya Junji; Oba Kazuhiro; Takemura Katsuya; Ishihara Toshinobu

Archive | 2001

NEW SULFONYLDIAZOMETHANE COMPOUND AND PHOTOOXIDATION- GENERATING AGENT FOR RESIST MATERIAL

Osawa Yoichi; Watanabe Atsushi; Seki Akihiro; Takemura Katsuya

Archive | 1999

CHEMICALLY SENSITIZED POSITIVE RESIST COMPOSITION

Hatakeyama Jun; Takemura Katsuya

Archive | 1996

NEW SULFONIUM SALT

Osawa Yoichi; Watanabe Satoshi; Shimada Junji; Takemura Katsuya; Ishihara Toshinobu

Archive | 1995

SULFONIUM SALT AND RESIST MATERIAL

Watanabe Satoshi; Shimada Junji; Osawa Yoichi; Takemura Katsuya; Ishihara Toshinobu; Maruyama Kazumasa

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Collaboration

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Ishihara Toshinobu

Shin-Etsu Chemical

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Endo Mikio

Shin-Etsu Chemical

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Takeda Yoshifumi

Shin-Etsu Chemical

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Kubota Toru

Shin-Etsu Chemical

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Mino Norihisa

Panasonic

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Ogawa Kazufumi

Panasonic

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Watanabe Osamu

Shin-Etsu Chemical

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Hatakeyama Jun

Shin-Etsu Chemical

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Kubota Tohru

Shin-Etsu Chemical

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Shimada Junji

Shin-Etsu Chemical

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