Atsuki Fukazawa

Method of Forming Conformal Dielectric Film Having Si-N Bonds by PECVD

Device isolation technology on semiconductor substrate

Method of Forming Insulation Film Using Plasma Treatment Cycles

Method of Depositing Dielectric Film by ALD Using Precursor Containing Silicon, Hydrocarbon, and Halogen

Method for forming insulation film

Methods for forming doped silicon oxide thin films

METHOD FOR FORMING INTERCONNECT STRUCTURE HAVING AIRGAP

Method for forming low-k hard film

Method for Forming Conformal Nitrided, Oxidized, or Carbonized Dielectric Film by Atomic Layer Deposition

Method for Forming Dielectric Film Containing Si-C bonds by Atomic Layer Deposition Using Precursor Containing Si-C-Si bond