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Dive into the research topics where Atsushi Moriya is active.

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Featured researches published by Atsushi Moriya.


Meeting Abstracts | 2006

Development of High-Throughput Batch-Type Epitaxial Reactor

Yasuo Kunii; Yasuhiro Inokuchi; Jie Wang; Katsuhiko Yamamoto; Atsushi Moriya; Yoshiaki Hashiba; Harushige Kurokawa; Junichi Murota

Si/SiGe selective epitaxial growth is becoming a critical process step for ULSI fabrication on 65nm and beyond technologies with need for elevated source-drain or strained silicon channel to enhance device performance. This paper reviews the efforts to improve batch-type epitaxial reactors for high-volume device fabrication and shows recent progress in low-temperature Si/SiGe selective epitaxial process.


Archive | 2014

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM

Atsushi Moriya; Naoharu Nakaiso; Yugo Orihashi; Kotaro Murakami


Archive | 2008

METHOD FOR FABRICATING SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESSING APPARATUS

Yasuhiro Inokuchi; Atsushi Moriya


Archive | 2005

Semiconductor device manufacturing method and substrate treating apparatus

Takashi Ozaki; Osamu Kasahara; Takaaki Noda; Kiyohiko Maeda; Atsushi Moriya; Minoru Sakamoto


Archive | 2011

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESSING APPARATUS

Kiyohisa Ishibashi; Atsushi Moriya; Takaaki Noda; Kiyohiko Maeda


Archive | 2006

Semiconductor device producing method with selective epitaxial growth

Yasuhiro Inokuchi; Atsushi Moriya; Katsuhiko Yamamoto; Yoshiaki Hashiba; Takashi Yokogawa


Archive | 2003

Method of manufacturing a semiconductor device and a semiconductor manufacture system

Atsushi Moriya; Yasuhiro Inokuchi; Yasuo Kunii; Junichi Murota


international sige technology and device meeting | 2004

In situ B doping of SiGe(C) using BCl3 in ultraclean hot-wall LPCVD

Yasuo Kunii; Yasuhiro Inokuchi; Atsushi Moriya; Harushige Kurokawa; Junichi Murota


Solid-state Electronics | 2015

Low-temperature reduction of Ge oxide by Si and SiH4 in low-pressure H2 and Ar environment

Kaichiro Minami; Atsushi Moriya; Kazuhiro Yuasa; Kiyohiko Maeda; Masayuki Yamada; Yasuo Kunii; Michio Niwano; Junichi Murota


Archive | 2015

Method of manufacturing semiconductor device, substrate processing apparatus, gas supply system, and recording medium

Atsushi Moriya; Naoharu Nakaiso; Yugo Orihashi; Kotaro Murakami

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