B. Garrido

Ultrafast All-Optical Switching in a Silicon-Nanocrystal-Based Silicon Slot Waveguide at Telecom Wavelengths

We demonstrate experimentally all-optical switching on a silicon chip at telecom wavelengths. The switching device comprises a compact ring resonator formed by horizontal silicon slot waveguides filled with highly nonlinear silicon nanocrystals in silica. When pumping at power levels about 100 mW using 10 ps pulses, more than 50% modulation depth is observed at the switch output. The switch performs about 1 order of magnitude faster than previous approaches on silicon and is fully fabricated using complementary metal oxide semiconductor technologies.

Size dependence of lifetime and absorption cross section of Si nanocrystals embedded in SiO2

Photoluminescence lifetimes and optical absorption cross sections of Si nanocrystals embedded in SiO 2 have been studied as a function of their average size and emission energy. The lifetimes span from 20 μs for the smallest sizes (2.5 nm) to more than 200 μs for the largest ones (7 nm). The passivation of nonradiative interface states by hydrogenation increases the lifetime for a given size. In contrast with porous Si, the cross section per nanocrystal shows a nonmonotonic behavior with emission energy. In fact, although the density of states above the gap increases for larger nanocrystals, this trend is compensated by a stronger reduction of the oscillator strength, providing an overall reduction of the absorption cross section per nanocrystal for increasing size.

Resistive switching in silicon suboxide films

We report a study of resistive switching in a silicon-based memristor/resistive RAM (RRAM) device in which the active layer is silicon-rich silica. The resistive switching phenomenon is an intrinsic property of the silicon-rich oxide layer and does not depend on the diffusion of metallic ions to form conductive paths. In contrast to other work in the literature, switching occurs in ambient conditions, and is not limited to the surface of the active material. We propose a switching mechanism driven by competing field-driven formation and current-driven destruction of filamentary conductive pathways. We demonstrate that conduction is dominated by trap assisted tunneling through noncontinuous conduction paths consisting of silicon nanoinclusions in a highly nonstoichiometric suboxide phase. We hypothesize that such nanoinclusions nucleate preferentially at internal grain boundaries in nanostructured films. Switching exhibits the pinched hysteresis I/V loop characteristic of memristive systems, and on/off resistance ratios of 104:1 or higher can be easily achieved. Scanning tunneling microscopy suggests that switchable conductive pathways are 10 nm in diameter or smaller. Programming currents can be as low as 2 μA, and transition times are on the nanosecond scale.

Elucidation of the surface passivation role on the photoluminescence emission yield of silicon nanocrystals embedded in SiO2

The ability of surface passivation to enhance the photoluminescence (PL) emission of Si nanocrystals in SiO2 has been investigated. No significant increase of the average nanocrystal size has been detected for annealings at 1100 °C between 1 min and 16 h. In contrast, the PL intensity steadily increases and reaches saturation after 3–4 h of annealing time. Such behavior shows an inverse correlation with the amount of Si dangling bonds (Pb centers) at the interface between Si nanocrystals and the SiO2 matrix. A postannealing at 450 °C in forming gas enhances the PL intensity and lifetime, due to a reduction in Pb concentration, without modifying the spectral shape of the PL emission.

Absorption cross section and signal enhancement in Er-doped Si nanocluster rib-loaded waveguides

Pump and probe experiments on Er3+ ions coupled to Si nanoclusters have been performed in rib-loaded waveguides to investigate optical amplification at 1.5μm. Rib-loaded waveguides were obtained by photolithographic and reactive ion etching of Er-doped silica layers containing Si nanoclusters grown by reactive sputtering. Insertion losses measurements in the infrared erbium absorption region allowed to gauge an Er3+ absorption cross section of about 5×10−21cm2 at 1534nm. Signal transmission under optical pumping at 1310nm shows confined carrier absorption of the Si nanoclusters. Amplification experiments at 1535nm evidence two pump power regimes: Losses due to confined carrier absorption in the Si nanoclusters at low pump powers and signal enhancement at high pump powers. For strong optical pumping, signal enhancement of about 1.2dB∕cm was obtained.

Correlation between structural and optical properties of Si nanocrystals embedded in SiO2: The mechanism of visible light emission

The size distribution, band gap energy, and photoluminescence of silicon nanocrystals embedded in SiO2 have been measured by direct and independent methods. The size distribution is measured by coupling high-resolution and conventional electron microscopy in special imaging conditions. The band gap is calculated from photoluminescence excitation measurements and agrees with theoretical predictions. Their correlation allows us to report the experimental Stokes shift between absorption and emission, which is 0.26±0.03 eV, independent of average size. This is almost exactly twice the energy of the Si–O vibration (0.134 eV). These results suggest that the dominant emission is a fundamental transition spatially located at the Si–SiO2 interface with the assistance of a local Si–O vibration.

Linear and nonlinear optical properties of Si nanocrystals in SiO2 deposited by plasma-enhanced chemical-vapor deposition

Linear and nonlinear optical properties of silicon suboxide SiOx films deposited by plasma-enhanced chemical-vapor deposition have been studied for different Si excesses up to 24at.%. The layers have been fully characterized with respect to their atomic composition and the structure of the Si precipitates. Linear refractive index and extinction coefficient have been determined in the whole visible range, enabling to estimate the optical bandgap as a function of the Si nanocrystal size. Nonlinear optical properties have been evaluated by the z-scan technique for two different excitations: at 0.80eV in the nanosecond regime and at 1.50eV in the femtosecond regime. Under nanosecond excitation conditions, the nonlinear process is ruled by thermal effects, showing large values of both nonlinear refractive index (n2∼−10−8cm2∕W) and nonlinear absorption coefficient (β∼10−6cm∕W). Under femtosecond excitation conditions, a smaller nonlinear refractive index is found (n2∼10−12cm2∕W), typical of nonlinearities arisi...

Optical properties of silicon nanocrystal LEDs

Abstract In this work, we describe how to fabricate good quality 3 nm nc-Si with low size distribution in thermal SiO2 oxides. Photoluminescence, excited photoluminescence, and photocurrent measurements are discussed on the basis of theoretical calculations of the quantified levels in nc-Si. The impact of shape and size in quantum dots on transition energies has been highlighted, thanks to 2D symmetrical self-consistent Poisson–Schrodinger simulations. Both direct and indirect gaps in silicon have been considered in order to carry out a better comparison between simulations and optical measurements. A good agreement is found between simulations and experimental data for the indirect gap of 3 nm dots which show a threshold energy around 2 eV . However, the optical recombinations seems to be related to lower energy states probably due to interfacial radiative defects around 1.58 eV . On the basis of highly luminescent nc-Si, we have fabricated an optimized light emitting device (LED) with a calculated design in order to favour both electron and hole injection. Stable red electroluminescence has been obtained at room temperature and the I–V measurements confirm that the current is related to a pure tunnelling process. A modelling of I–V curves confirms a Hopping mechanism with an average trap distance between 1.4 and 1.9 nm . The Fowler–Nordheim process is not observed during light emission for electric fields below 5 MV / cm . Finally, we have not hot carrier injection and thus it seems possible to develop Si-based LEDs with a good reliability.

White luminescence from Si+ and C+ ion-implanted SiO2 films

The microstructural and optical analysis of SiO2 layers emitting white luminescence is reported. These structures have been synthesized by sequential Si+ and C+ ion implantation and high-temperature annealing. Their white emission results from the presence of up to three bands in the photoluminescence (PL) spectra, covering the whole visible spectral range. The microstructural characterization reveals the presence of a complex multilayer structure: Si nanocrystals are only observed outside the main C-implanted peak region, with a lower density closer to the surface, being also smaller in size. This lack of uniformity in their density has been related to the inhibiting role of C in their growth dynamics. These nanocrystals are responsible for the band appearing in the red region of the PL spectrum. The analysis of the thermal evolution of the red PL band and its behavior after hydrogenation shows that carbon implantation also prevents the formation of well passivated Si/SiO2 interfaces. On the other hand, ...

Silicon nanocluster crystallization in SiOx films studied by Raman scattering

Precipitation and crystallization of Si nanocrystals have been monitored by means of Raman spectroscopy. SiOx films with different compositions have been deposited by low-pressure chemical-vapor deposition technique onto silica substrates and treated to temperatures exceeding 800 °C. The evolution of the Raman signal with the thermal budget reveals that the silicon transition from amorphous to crystalline state shifts to higher temperatures as the Si content in the layers is lowered. A rather complete crystallization of the nanoparticles is achieved after annealing at 1250 °C for a Si excess lower than 20%, while for higher excesses the crystalline fraction reaches only 40%, suggesting the formation of a crystalline core surrounded by an amorphous shell. The Raman spectra have been analyzed by a phonon confinement model that takes into account stress effects. An increasing nanocrystal size, from 2.5 to 3.4 nm, has been estimated when the Si excess varies from 16 to 29 at. %. For small Si nanocrystals a strong hydrostatic stress has been observed, induced by a very abrupt transition with the surrounding SiO2. Its magnitude correlates with the increase in thermal budget required for the crystallization of the amorphous clusters. This study underlines the fundamental role of hydrostatic stress in retarding the crystallization of Si nanoclusters.Precipitation and crystallization of Si nanocrystals have been monitored by means of Raman spectroscopy. SiOx films with different compositions have been deposited by low-pressure chemical-vapor deposition technique onto silica substrates and treated to temperatures exceeding 800 °C. The evolution of the Raman signal with the thermal budget reveals that the silicon transition from amorphous to crystalline state shifts to higher temperatures as the Si content in the layers is lowered. A rather complete crystallization of the nanoparticles is achieved after annealing at 1250 °C for a Si excess lower than 20%, while for higher excesses the crystalline fraction reaches only 40%, suggesting the formation of a crystalline core surrounded by an amorphous shell. The Raman spectra have been analyzed by a phonon confinement model that takes into account stress effects. An increasing nanocrystal size, from 2.5 to 3.4 nm, has been estimated when the Si excess varies from 16 to 29 at. %. For small Si nanocrystals a st...