O. Jambois

Resistive switching in silicon suboxide films

We report a study of resistive switching in a silicon-based memristor/resistive RAM (RRAM) device in which the active layer is silicon-rich silica. The resistive switching phenomenon is an intrinsic property of the silicon-rich oxide layer and does not depend on the diffusion of metallic ions to form conductive paths. In contrast to other work in the literature, switching occurs in ambient conditions, and is not limited to the surface of the active material. We propose a switching mechanism driven by competing field-driven formation and current-driven destruction of filamentary conductive pathways. We demonstrate that conduction is dominated by trap assisted tunneling through noncontinuous conduction paths consisting of silicon nanoinclusions in a highly nonstoichiometric suboxide phase. We hypothesize that such nanoinclusions nucleate preferentially at internal grain boundaries in nanostructured films. Switching exhibits the pinched hysteresis I/V loop characteristic of memristive systems, and on/off resistance ratios of 104:1 or higher can be easily achieved. Scanning tunneling microscopy suggests that switchable conductive pathways are 10 nm in diameter or smaller. Programming currents can be as low as 2 μA, and transition times are on the nanosecond scale.

Towards population inversion of electrically pumped Er ions sensitized by Si nanoclusters

This study reports the estimation of the inverted Er fraction in a system of Er doped silicon oxide sensitized by Si nanoclusters, made by magnetron sputtering. Electroluminescence was obtained from the sensitized erbium, with a power efficiency of 10(-2)%. By estimating the density of Er ions that are in the first excited state, we find that up to 20% of the total Er concentration is inverted in the best device, which is one order of magnitude higher than that achieved by optical pumping of similar materials.

Current transport and electroluminescence mechanisms in thin SiO2 films containing Si nanocluster-sensitized erbium ions

We have studied the current transport and electroluminescence properties of metal oxide semiconductor (MOS) devices in which the oxide layer, which is codoped with silicon nanoclusters and erbium ions, is made by magnetron sputtering. Electrical measurements have allowed us to identify a Poole–Frenkel conduction mechanism. We observe an important contribution of the Si nanoclusters to the conduction in silicon oxide films, and no evidence of Fowler–Nordheim tunneling. The results suggest that the electroluminescence of the erbium ions in these layers is generated by energy transfer from the Si nanoparticles. Finally, we report an electroluminescence power efficiency above 10−3%.

Erbium emission in MOS light emitting devices: From energy transfer to direct impact excitation

The electroluminescence (EL) at 1.54 μm of metal–oxide–semiconductor (MOS) devices withEr3C ions embedded in the silicon-rich silicon oxide (SRSO) layer has been investigated under different polarization conditions and compared with that of erbium doped SiO2 layers. EL time-resolved measurements allowed us to distinguish between two different excitation mechanisms responsible for the Er3C emission under an alternate pulsed voltage signal (APV). Energy transfer from silicon nanoclusters (Si-ncs) to Er3C is clearly observed at low-field APV excitation. We demonstrate that sequential electron and hole injection at the edges of the pulses creates excited states in Si-ncs which upon recombination transfer their energy to Er3C ions. On the contrary, direct impact excitation of Er3C by hot injected carriers starts at the Fowler–Nordheim injection threshold (above 5 MV cm(-1)) and dominates for high-field APV excitation.

Photoluminescence properties of size-controlled silicon nanocrystals at low temperatures

This study attempts to clarify the origin of the temperature dependence of the photoluminescence (PL) spectra of silicon nanocrystals (Si-ncs) embedded in SiO2 from 5 to 300 K. For this purpose, size-controlled Si-ncs with a narrow size distribution were fabricated, using the SiO/SiO2 multilayer structure. The PL intensity is strongly temperature dependent and presents a maximum at around 70 K, depending on the Si-nc size and on the excitation power. The origin of this maximum is first discussed thanks to PL dynamics study and power dependence study. The evolution of the PL energy with temperature is also discussed. In bulk semiconductors the temperature dependence of the gap is generally well represented by Varshni’s law. Taking into account the quantum confinement energy, the PL energy of Si-ncs follows very well this law in the range 50–300 K. Below 50 K, a strong discrepancy to this law is observed characterized by a strong increase in the PL energy at low temperature, which is dependent on the Si-nc ...

Nanoscale electrical characterization of Si-nc based memory metal-oxide-semiconductor devices

In this work, standard and nanoscale experiments have been combined to investigate the electrical properties of metal-oxide-semiconductor (MOS) memory devices with silicon nanocrystals (Si-nc) embedded in the gate oxide. The nanometer scale analysis has been performed with a conductive atomic force microscope (C-AFM) which, thanks to its high lateral resolution, allows the study of areas of only few hundreds of nm2. Therefore, with this technique, a very reduced number of Si-nc can be investigated. We have studied the conduction mechanisms, the retention time, and the amount of charge stored in the Si-nc of these structures. The results have demonstrated that Si-nc enhance the gate oxide electrical conduction due to trap assisted tunneling. On the other hand, Si-nc can act as trapping sites. The amount of charge stored in Si-nc has been estimated through the change induced in the barrier height measured from the current-voltage (I-V) curves (at the nanoscale, with C-AFM) and from the flat band voltage shi...

White electroluminescence from C- and Si-rich thin silicon oxides

White electroluminescence from carbon- and silicon-rich silicon oxide layers is reported. The films were fabricated by Si and C ion implantation at low energy in 40nm thick SiO2, followed by annealing at 1100°C. Structural and optical studies allow assigning the electroluminescence to Si nanocrystals for the red part of the spectrum, and to C-related centers for the blue and green components. The external efficiency has been estimated to 10−4%. Electrical characteristics show a Fowler-Nordheim behavior for voltages above 25V, corresponding to the onset of electroluminescence. This suggests that light emission is related to the impact ionization of radiative centers.

Optically active Er3+ ions in SiO2 codoped with Si nanoclusters

Optical properties of directly excited erbium (Er3+) ions have been studied in silicon rich silicon oxide materials codoped with Er3+. The spectral dependence of the direct excitation cross section (σdir) of the Er3+ atomic 4I152→4I112 transition (around 0.98 μm) has been measured by time resolved µ-photoluminescence measurements. We have determined that σdir is 9.0±1.5 x10−21 cm2 at 983 nm, at least twice larger than the value determined on a stoichiometric SiO2 matrix. This result, in combination with a measurement of the population of excited Er3+ as a function of the pumping flux, has allowed quantifying accurately the amount of optically active Er3+. This concentration is, in the best of the cases, 26% of the total Er population measured by secondary ion mass spectrometry, which means that only this percentage could provide optical gain in an eventual optical amplifier based on this material.

Correlation between charge transport and electroluminescence properties of Si-rich oxide/nitride/oxide-based light emitting capacitors

The electrical and electroluminescence (EL) properties at room and high temperatures of oxide/ nitride/oxide (ONO)-based light emitting capacitors are studied. The ONO multidielectric layer is enriched with silicon by means of ion implantation. The exceeding silicon distribution follows a Gaussian profile with a maximum of 19%, centered close to the lower oxide/nitride interface. The electrical measurements performed at room and high temperatures allowed to unambiguously identify variable range hopping (VRH) as the dominant electrical conduction mechanism at low voltages, whereas at moderate and high voltages, a hybrid conduction formed by means of variable range hopping and space charge-limited current enhanced by Poole-Frenkel effect predominates. The EL spectra at different temperatures are also recorded, and the correlation between charge transport mechanisms and EL properties is discussed. V C 2012 American Institute of Physics .[ http://dx.doi.org/10.1063/1.4742054]

Metal-nitride-oxide-semiconductor light-emitting devices for general lighting

The potential for application of silicon nitride-based light sources to general lighting is reported. The mechanism of current injection and transport in silicon nitride layers and silicon oxide tunnel layers is determined by electro-optical characterization of both bi- and tri-layers. It is shown that red luminescence is due to bipolar injection by direct tunneling, whereas Poole-Frenkel ionization is responsible for blue-green emission. The emission appears warm white to the eye, and the technology has potential for large-area lighting devices. A photometric study, including color rendering, color quality and luminous efficacy of radiation, measured under various AC excitation conditions, is given for a spectrum deemed promising for lighting. A correlated color temperature of 4800K was obtained using a 35% duty cycle of the AC excitation signal. Under these conditions, values for general color rendering index of 93 and luminous efficacy of radiation of 112 lm/W are demonstrated. This proof of concept demonstrates that mature silicon technology, which is extendable to low-cost, large-area lamps, can be used for general lighting purposes. Once the external quantum efficiency is improved to exceed 10%, this technique could be competitive with other energy-efficient solid-state lighting options.