B. H. Lin

Photoluminescence associated with basal stacking faults in c-plane ZnO epitaxial film grown by atomic layer deposition

Basal plane stacking faults (BSFs) with density of ∼1 × 106 cm−1 are identified as the dominant defect in the annealed ZnO thin films grown on c-plane sapphire by atomic layer deposition. The dominant peak centered at 3.321 eV in low-temperature photoluminescence measurements is attributed to the emission from the BSFs. The emission mechanism is considered to be the confined indirect excitons in the region of quantum-well-like structure formed by the BSFs. The observed energy shift of 19 meV with respect to the BSF-bounded exciton at low temperature may be caused by the localization effect associated with the coupling between BSF quantum wells.

Structural and compositional investigation of yttrium-doped HfO2 films epitaxially grown on Si (111)

Cubic phase yttrium-doped HfO2 (YDH) ultrathin films were grown on Si (111) substrates by molecular beam epitaxy. Thorough structural and morphological investigations by x-ray scattering and transmission electron microscopy reveal that the YDH thin films are epitaxially grown on the Si substrates with (111)YDH‖(111)Si and [101¯]YDH‖[11¯0]Si. The interface between YDH and Si is atomistic sharp and free of interfacial layer. We have also determined the yttrium content of YDH films to be 19% by using anomalous x-ray diffraction (AXD) across Y k edge and angle resolved x-ray photoelectron spectroscopy (AR-XPS). The agreement between the AXD and AR-XPS results manifests that the incorporated Y atoms homogeneously substitute Hf atoms in the crystalline lattice and form a substitutional solid solution.

The influence of dislocations on optical and electrical properties of epitaxial ZnO on Si (111) using a gamma-Al2O3 buffer layer

The structural, optical and electrical properties of the c-plane ZnO epitaxial films grown by pulsed laser deposition on a Si(111) substrate buffered with a thin layer of γ-Al2O3 were investigated by X-ray diffraction, transmission electron microscopy, photoluminescence (PL) and Hall measurements. Detailed structural investigation showed that the dominant structural defects in the ZnO films are threading dislocations (TDs). Experimental results manifest the edge- and screw-type of TDs influence the optical and electric properties differently; the intensity ratio between the PL yellow-green band to near band edge emission and the carrier concentration are affected mainly by the edge TD, and the FWHM of the near band edge emission is dominantly influenced by the screw TD.

Single domain m-plane ZnO grown on m-plane sapphire by radio frequency magnetron sputtering.

High-quality m-plane orientated ZnO films have been successfully grown on m-plane sapphire by using radio frequency magnetron sputtering deposition. The introduction of a nanometer-thick, low-temperature-grown ZnO buffer layer effectively eliminates inclusions of other undesirable orientations. The structure characteristics of the ZnO epi-layers were thoroughly studied by synchrotron X-ray scattering and transmission electron microscopy (TEM). The in-plane epitaxial relationship between ZnO and sapphire follows (0002)(ZnO) [parallel] (112[overline]0)(sapphire) and (112[overline]0)(ZnO) [parallel] (0006)(sapphire) and the ZnO/sapphire interface structure can be described by the domain matching epitaxy along the [112[overline]0](ZnO) direction. The vibrational properties of the films were investigated by polarization dependent micro-Raman spectroscopy. Both XRD and micro-Raman results reveal that the obtained m-ZnO layers are under an anisotropic biaxial strain but still retains a hexagonal lattice.

Recombination dynamics of a localized exciton bound at basal stacking faults within the m-plane ZnO film

We investigated the carrier dynamics near basal stacking faults (BSFs) in m-plane ZnO epitaxial film. The behaviors of the type-II quantum wells related to the BSFs are verified through time-resolved and time-integrated photoluminescence. The decay time of the emission of BSFs is observed to have a higher power law value and longer decay time than the emission of the donor-bound excitons. The spectral-dependent decay times reveal a phenomenon of carriers migrating among band tail states, which are related to the spatial distribution of the type-II quantum wells formed by the BSFs. A high density of excited carriers leads to a band bending effect, which in turn causes a blue-shift of the emission peak of BSFs with a broadened distribution of band tail states.

Surface-bound-exciton emission associated with domain interfaces in m-plane ZnO films

Small amount of (101¯3)ZnO domains were found in the m-plane ZnO films grown on m-sapphire by pulsed laser deposition, which provide strain relaxation of the m-ZnO matrix behaving as a low strain layer. Through carefully correlating low-temperature polarized photoluminescence spectra with the x-ray diffraction peak intensity ratio of (101¯3)ZnO/(101¯0)ZnO of the samples grown at different temperature and after thermal treatment, we found that the broad-band emission around 3.17 eV may result from the interface defects trapped excitons at the boundaries between the (101¯3)ZnO domains and the m-ZnO matrix. The more (101¯3)ZnO domains in the m-ZnO layer cause the more surface boundary that makes the stronger surface-bound-exciton emission. And the a-axes of both the (101¯3)ZnO domains and the m-ZnO matrix are aligned with the c-axis of the sapphire (α-Al2O3) substrate. The c-axis of the (101¯3)ZnO domains rotates by about ±59° against the common a-axis of the m-ZnO.

Thickness-dependent lattice relaxation and the associated optical properties of ZnO epitaxial films grown on Si (111)

The evolution of the strain state as a function of layer thickness of (0001) oriented ZnO epitaxial films grown by pulsed-laser deposition on Si (111) substrates with a thin oxide Y2O3 buffer layer was investigated by high resolution X-ray diffraction (XRD). The ZnO layers experience a tensile strain, which gradually diminishes with increasing layer thickness. Regions with a nearly strain-free lattice develop as the layer thickness exceeds a critical value and are correlated with the emergence of the oriented crack channels. The influence of the biaxial strain to the vibrational and optical properties of the ZnO layers were also studied by micro-Raman, optical reflectance, and photoluminescence. The deformation-potential parameters, aλ and bλ, of the E2(high) phonon mode are determined to be −740.8 ± 8.4 and −818.5 ± 14.8 cm−1, respectively. The excitonic transitions associated with the FXA, FXB, and D°XA emissions and the A-exciton binding energy all show linear dependence on the in-plane strain with a negative slope.

Vertical-cavity and randomly scattered lasing from different thicknesses of epitaxial ZnO films grown on Y 2 O 3 -buffered Si (111)

Two different types of lasing modes, vertical Fabry-Perot cavity and random lasing, were observed in ZnO epi-films of different thicknesses grown on Si (111) substrates. Under optical excitation at room temperature by a frequency tripled Nd:YVO₄ laser with wavelength of 355 nm, the lasing thresholds are low due to high crystalline quality of the ZnO epitaxial films, which act as microresonators. For the thick ZnO layer (1,200 nm), its lasing action is originated from the random scattering due to the high density of crack networks developed in the thick ZnO film. However, the low crack density of the thin film (555 nm) fails to provide feedback loops essential for random scattering. Nevertheless, even the lower threshold lasing is achieved by the Fabry-Perot cavity formed by two interfaces of the thin ZnO film. The associated lasing modes of the thin ZnO film can be characterized as the transverse Gaussian modes attributed to the smooth curved surfaces.