B. Lamontagne

A Silicon-on-Insulator Photonic Wire Based Evanescent Field Sensor

We demonstrate a new, highly sensitive evanescent field sensor using silicon-on-insulator (SOI) photonic wire waveguides. Theoretical analysis shows that thin SOI waveguides can provide higher sensitivity over devices based in all other common planar waveguide material systems for the probing of both thin adsorbed biomolecular layers and bulk homogeneous solutions. A Si photonic wire waveguide was incorporated into a Mach-Zehnder interferometer based sensor, configured to monitor the index change of a homogeneous solution. High effective index change of 0.31 per refractive index unit (RIU) change of the solution was measured, confirming theoretical predictions

Refractive index engineering with subwavelength gratings for efficient microphotonic couplers and planar waveguide multiplexers

We use subwavelength gratings (SWGs) to engineer the refractive index in microphotonic waveguides, including practical components such as input couplers and multiplexer circuits. This technique allows for direct control of the mode confinement by changing the refractive index of a waveguide core over a range as broad as 1.6-3.5 by lithographic patterning. We demonstrate two experimental examples of refractive index engineering, namely, a microphotonic fiber-chip coupler with a coupling loss as small as -0.9dB and minimal wavelength dependence and a planar waveguide multiplexer with SWG nanostructure, which acts as a slab waveguide for light diffracted by the grating, while at the same time acting as a lateral cladding for the strip waveguide. This yields an operation bandwidth of 170nm for a device size of only approximately 160microm x100microm.

A high-resolution silicon-on-insulator arrayed waveguide grating microspectrometer with sub-micrometer aperture waveguides.

We demonstrate a 50-channel high-resolution arrayed waveguide grating microspectrometer with a 0.2 nm channel spacing on a silicon-on-insulator (SOI) platform. The chip size is 8 mm x 8 mm. High channel density and spectral resolution are achieved using high aspect ratio 0.6 mum x 1.5 mum waveguide apertures to inject the light into the input combiner and to intercept different spectral channels at the output combiner focal region. The measured crosstalk is <-10 dB, the 3 dB channel bandwidth is 0.15 nm, and the insertion loss is -17 dB near the central wavelength of lambda = 1.545 mum.

Planar waveguide echelle gratings in silica-on-silicon

Silica planar waveguide echelle grating demultiplexers with 48 channels and 256 channels are described and demonstrated. Polarization effects due to stress birefringence and polarization-dependent grating efficiency have been eliminated using a modified polarization compensator and grating design. The devices have a polarization-dependent wavelength shift of less than 10 pm, and a polarization-dependent loss below 0.2 dB. The 48-channel device has a measured crosstalk of -35 dB, an insertion loss better than 4 dB, and a uniformity of 1 dB across the C-band.

Spiral-path high-sensitivity silicon photonic wire molecular sensor with temperature-independent response

We demonstrate a new silicon photonic wire waveguide evanescent field (PWEF) sensor that exploits the strong evanescent field of the transverse magnetic mode of this high-index-contrast, submicrometer-dimension waveguide. High sensitivity is achieved by using a 2 mm long double-spiral waveguide structure that fits within a compact circular area of 150 microm diameter, facilitating compatibility with commercial spotting apparatus and the fabrication of densely spaced sensor arrays. By incorporating the PWEF sensor element into a balanced waveguide Mach-Zehnder interferometer circuit, a minimum detectable mass of approximately 10 fg of streptavidin protein is demonstrated with near temperature-independent response.

High bandwidth SOI photonic wire ring resonators using MMI couplers

A ring resonator in SOI photonic wire waveguides is demonstrated using a compact MMI coupler with 3mum x 9 mum footprint as the coupling element. We achieved high bandwidth of 0.25 nm, and a quality factor Q of ~ 6000 for rings with a radius of 50 mum. Unlike directional coupler based rings, these resonators have a wavelength independent Q and extinction ratio over more than 30 nm wavelength range, and there is no loss penalty for increasing the bandwidth. Compared to their directional coupler based counterparts, these resonators also have less demanding fabrication requirements and are compatible with high speed signal processing and optical delay lines.

Birefringence control using stress engineering in silicon-on-insulator (SOI) waveguides

We demonstrate that stress engineering is an effective tool to modify or eliminate polarization dispersion in silicon-on-insulator (SOI) waveguide devices, for a wide range of waveguide cross-section shapes and dimensions. The stress-induced effects on the modal birefringence of SOI waveguides are investigated numerically and experimentally. Finite-element simulations show that while the birefringence of ridge waveguides with both slanted and vertical sidewalls can be effectively modified using cladding stress, the birefringence becomes much less sensitive to dimension fluctuations with decreasing sidewall slope. To efficiently simulate the stress-induced effects we propose a normalized plane-strain model which can achieve comparable accuracy as a fully generalized plane-strain model but requires significantly less computational resources. Excellent agreement is achieved between the calculated and measured birefringence tuning using SiO/sub 2/ cladding induced stress. Finally, both calculations and experiments confirm that cladding induced stress can be used to eliminate the birefringence in SOI waveguides of arbitrary shapes, for typical SiO/sub 2/ film stress values (/spl sigma//sub film//spl ap/-100 to -300 MPa) and cladding thicknesses of the order of 1 /spl mu/m or less.

Integrated polarization compensator for WDM waveguide demultiplexers

An integrated polarization compensator for wavelength-division-multiplexed waveguide demultiplexers is proposed and experimentally demonstrated. It is simple to fabricate, has many advantages over previously reported polarization compensation schemes, and is effective in both etched diffraction grating and arrayed waveguide grating based devices.

Eliminating the birefringence in silicon-on-insulator ridge waveguides by use of cladding stress

We propose and demonstrate the use of the cladding stress-induced photoelastic effect to eliminate modal birefringence in silicon-on-insulator (SOI) ridge waveguides. Birefringence-free operation was achieved for waveguides with otherwise large birefringence by use of properly chosen thickness and stress of the upper cladding layer. With the stress levels typically found in cladding materials such as SiO2, the birefringence modification range can be as large as 10(-3). In arrayed waveguide grating demultiplexers that were fabricated in a SOI platform, we demonstrated the reduction of the birefringence from 1.2 x 10(-3) (without the upper cladding) to 4.5 x 10(-5) when a 0.8-microm oxide upper cladding with a stress of -320 MPa (compressive) was used. Because the index changes induced by the stress are orders of magnitude smaller than the waveguide core-cladding index contrast, the associated mode mismatch loss is negligible.

A broad-band waveguide grating coupler with a subwavelength grating mirror

A new diffractive device for light coupling between a planar optical waveguide and free space is proposed. The device utilizes a second-order waveguide grating to diffract the fundamental waveguide mode into two free propagating beams and a subwavelength grating (SWG) mirror to combine the two free propagating beams into a single beam. The finite-difference time-domain (FDTD) simulations show that the SWG mirror improves the coupling efficiency of the waveguide fundamental mode into the single out-coupled beam from about 30% to 92%. A high efficiency (>90%) is predicted for a broad wavelength range of 1520-1580nm. The proposed device is compact (/spl sim/80 /spl mu/m in length) and it eliminates the need for blazing the waveguide grating.