B. N. Pantha

InGaN/GaN multiple quantum well solar cells with long operating wavelengths

We report on the fabrication and photovoltaic characteristics of InGaN solar cells by exploiting InGaN/GaN multiple quantum wells (MQWs) with In contents exceeding 0.3, attempting to alleviate to a certain degree the phase separation issue and demonstrate solar cell operation at wavelengths longer than previous attainments (>420 nm). The fabricated solar cells based on In0.3Ga0.7N/GaN MQWs exhibit an open circuit voltage of about 2 V, fill factor of about 60%, and an external efficiency of 40% (10%) at 420 nm (450 nm).

Hydrogen generation by solar water splitting using p-InGaN photoelectrochemical cells

Photoelectrochemical effects in p-InxGa1−xN (0≤x≤0.22) alloys have been investigated. Hydrogen generation was observed in p-InGaN semiconducting electrodes under white light illumination with additional bias. It was found that p-InGaN alloys possess much higher conversion efficiencies than p-GaN. Time dependent photocurrent density characteristics showed that the stability of p-InGaN in aqueous HBr is excellent. The photocurrent density was found to increase almost linearly with hole mobility and excitation light intensity.

Epitaxially grown semiconducting hexagonal boron nitride as a deep ultraviolet photonic material

Hexagonal boron nitride (hBN) has emerged as an important material for various device applications and as a template for graphene electronics. Low-dimensional hBN is expected to possess rich physical properties, similar to graphene. The synthesis of wafer-scale semiconducting hBN epitaxial layers with high crystalline quality and electrical conductivity control has not been achieved but is highly desirable. Large area hBN epitaxial layers (up to 2 in. in diameter) were synthesized by metal organic chemical vapor deposition. P-type conductivity control was attained by in situ Mg doping. Compared to Mg-doped wurtzite AlN, which possesses a comparable energy band gap (∼6 eV), dramatic reductions in Mg acceptor energy level and P-type resistivity (by about six to seven orders of magnitude) have been realized in hBN epilayers. The ability of conductivity control and wafer-scale production of hBN opens up tremendous opportunities for emerging applications, ranging from revolutionizing p-layer approach in III-ni...

Epitaxial growth and demonstration of hexagonal BN/AlGaN p-n junctions for deep ultraviolet photonics

Recent advances in epitaxial growth and demonstration of p-type conductivity in hexagonal boron nitride (hBN) epilayers represent an exceptional opportunity to revolutionize p-layer approach and overcome the intrinsic problem of low p-type conductivity in Al-rich AlGaN for deep ultraviolet (DUV) device applications. Nevertheless, the ability of epitaxial growth of hBN on AlGaN is a prerequisite for the incorporation of p-type hBN in AlGaN DUV device structures. We report on the epi-growth of hBN on Al-rich AlGaN/AlN/Al2O3 templates using metal organic chemical vapor deposition. X-ray diffraction measurement revealed a 2θ peak at 26.5° which indicates that the BN epilayers are hexagonal and consist of a single phase. Mg doped hBN epilayers were also grown on highly insulating AlN and n-type AlGaN templates with an attempt to demonstrate hBN/AlGaN p-n junctions. Mg doped hBN epilayers grown on insulating templates were p-type with an in-plane resistivity of ∼2.3 Ω cm. Diode behavior in the p-n structures of...

Electrical and Optical Properties of P-Type InGaN

Mg-doped InxGa1−xN alloys were grown by metal organic chemical vapor deposition on semi-insulating c-GaN/sapphire templates. Hall effect measurements showed that Mg-doped InxGa1−xN epilayers are p-type for x up to 0.35. Mg-acceptor levels (EA) as a function of x, (x up to 0.35), were experimentally evaluated from the temperature dependent hole concentration. The observed EA in Mg-doped In0.35Ga0.65N alloys was about 43 meV, which is roughly four times smaller than that in Mg doped GaN. A room temperature resistivity as low as 0.4 Ω cm (with a hole concentration ∼5×1018 cm−3 and hole mobility ∼3 cm2/V s) was obtained in Mg-doped In0.22Ga0.78N. It was observed that the photoluminescence (PL) intensity associated with the Mg related emission line decreases exponentially with x. The Mg energy levels in InGaN alloys obtained from PL measurements are consistent with those obtained from Hall-effect measurements.

Erbium-Doped AlInGaN Alloys as High-Temperature Thermoelectric Materials

The potential of Er-doped AlxIn0.1Ga0.9-xN quaternary alloys as high-temperature thermoelectric (TE) materials has been explored. It was found that the incorporation of Er significantly decreased the thermal conductivity (κ) of AlxIn0.1Ga0.9-xN alloys. The temperature-dependent TE properties were measured up to 1055 K for an Er and Si co-doped n-type Al0.1In0.1Ga0.8N alloy. The figure of merit (ZT) showed a linear increase with temperature and a value of about 0.3 at 1055 K was estimated. The ability to survive such high temperature with reasonable TE properties suggests that low-In-content Er and Si-doped AlInGaN alloys are potential candidate of high-temperature TE materials.

Evolution of phase separation in In-rich InGaN alloys

Evolution of phase separation in InxGa1−xN alloys (x∼0.65) grown on AlN/sapphire templates by metal organic chemical vapor deposition has been probed. It was found that growth rate, GR, is a key parameter and must be high enough (>0.5 μm/h) in order to grow homogeneous and single phase InGaN alloys. Our results implied that conditions far from thermodynamic equilibrium are needed to suppress phase separation. Both structural and electrical properties were found to improve significantly with increasing GR. The improvement in material quality is attributed to the suppression of phase separation with higher GR. The maximum thickness of the single phase epilayer tmax (i.e., maximum thickness that can be grown without phase separation) was determined via in situ interference pattern monitoring and found to be a function of GR. As GR increases, tmax also increases. The maximum value of tmax for In0.65Ga0.35N alloy was found to be ∼1.1 μm at GR>1.8 μm/h.

Suppression of thermal conductivity in InxGa1−xN alloys by nanometer-scale disorder

We have systematically measured the room-temperature thermal conductivity of epitaxial layers of InxGa1−xN alloys with 15 different Indium compositions ranging from 0.08 to 0.98 by time-domain thermoreflectance method. The data are compared to the estimates of the strength of phonon scattering by cation disorder. The thermal conductivity is in good agreement with the theoretical modeling results based on the mass difference for In-rich (x > 0.9) and Ga-rich (x < 0.2) compositions. At intermediate compositions (0.2 < x < 0.9), the thermal conductivity is strongly suppressed below the values expected for homogeneous alloys. We attribute this suppression of thermal conductivity to phonon scattering by nanometer-scale compositional inhomogeneities in alloys.

Realizing InGaN monolithic solar-photoelectrochemical cells for artificial photosynthesis

InGaN alloys are very promising for solar water splitting because they have direct bandgaps that cover almost the whole solar spectrum. The demonstration of direct solar-to-fuel conversion without external bias with the sunlight being the only energy input would pave the way for realizing photoelectrochemical (PEC) production of hydrogen by using InGaN. A monolithic solar-PEC cell based on InGaN/GaN multiple quantum wells capable to directly generate hydrogen gas under zero bias via solar water splitting is reported. Under the irradiation by a simulated sunlight (1-sun with 100 mW/cm2), a 1.5% solar-to-fuel conversion efficiency has been achieved under zero bias, setting a fresh benchmark of employing III-nitrides for artificial photosynthesis. Time dependent hydrogen gas production photocurrent measured over a prolonged period (measured for 7 days) revealed an excellent chemical stability of InGaN in aqueous solution of hydrobromic acid. The results provide insights into the architecture design of using ...

Probing the relationship between structural and optical properties of Si-doped AlN

Much efforts have been devoted to achieve conductivity control in the ultrahigh band gap (∼6.1 eV) AlN by Si doping. The effects of Si-doping on the structural and optical properties of AlN epilayers have been investigated. X-ray diffraction studies revealed that accumulation of tensile stress in Si-doped AlN is a reason for the formation of additional edge dislocations. Photoluminescence (PL) studies revealed that the linewidths of both band-edge and impurity related transitions are directly correlated with the density of screw dislocations, Nscrew, which increases with the Si doping concentration (NSi). Furthermore, it was formulated that the band-edge (impurity) PL emission linewidth increases linearly with increasing Nscrew at a rate of ∼3.3±0.7 meV/108 cm−2 (26.5±4 meV/108 cm−2), thereby establishing PL measurement as a simple and effective method to estimate screw dislocation density in AlN epilayers.