Jingyu Lin

Deep Ultraviolet to Near-Infrared Emission and Photoresponse in Layered N-Doped Graphene Quantum Dots

Material that can emit broad spectral wavelengths covering deep ultraviolet, visible, and near-infrared is highly desirable. It can lead to important applications such as broadband modulators, photodetectors, solar cells, bioimaging, and fiber communications. However, there is currently no material that meets such desirable requirement. Here, we report the layered structure of nitrogen-doped graphene quantum dots (N-GQDs) which possess broadband emission ranging from 300 to >1000 nm. The broadband emission is attributed to the layered structure of the N-GQDs that contains a large conjugated system and provides extensive delocalized π electrons. In addition, a broadband photodetector with responsivity as high as 325 V/W is demonstrated by coating N-GQDs onto interdigital gold electrodes. The unusual negative photocurrent is observed which is attributed to the trapping sites induced by the self-passivated surface states in the N-GQDs.

Mg acceptor level in AlN probed by deep ultraviolet photoluminescence

Mg-doped AlN epilayers were grown by metalorganic chemical vapor deposition on sapphire substrates. Deep UV picosecond time-resolved photoluminescence (PL) spectroscopy has been employed to study the optical transitions in Mg-doped AlN epilayers. From PL emission spectra and the temperature dependence of the PL emission intensity, a binding energy of 0.51 eV for Mg acceptor in AlN was determined. Together with previous experimental results, the Mg acceptor activation energy in AlxGa1−xN as a function of the Al content (x) was extrapolated for the entire AlN composition range. The average hole effective mass in AlN was also deduced to be about 2.7 m0 from the experimental value of the Mg binding energy together with the use of the effective mass theory.

Deep ultraviolet picosecond time-resolved photoluminescence studies of AlN epilayers

AlN epilayers with high optical qualities have been obtained by metalorganic chemical vapor deposition on sapphire substrates. Deep UV picosecond time-resolved photoluminescence (PL) spectroscopy has been employed to study the optical transitions in AlN epilayers. Two PL emission lines associated with the donor bound exciton (D0X, or I2) and free exciton (FX) transitions have been observed, from which the binding energy of the donor bound excitons in AlN epilayers was determined to be around 16 meV. Time-resolved PL measurements revealed that the recombination lifetimes of the I2 and free exciton transitions in AlN epilayers were around 80 and 50 ps, respectively. The temperature dependencies of the free exciton radiative decay lifetime and emission intensity were investigated, from which a value of about 80 meV for the free exciton binding energy in AlN epilayer was deduced. This value is believed to be the largest free exciton binding energy ever reported in semiconductors, implying excitons in AlN are ...

Band-edge photoluminescence of AlN epilayers

AlN epilayers with high optical qualities have been grown on sapphire substrates by metalorganic chemical vapor deposition. Deep ultraviolet photoluminescence (PL) spectroscopy has been employed to probe the optical quality as well as optical transitions in the grown epilayers. Band-edge emission lines have been observed both at low and room temperatures and are 6.017 and 6.033 eV at 10 K. It was found that the peak (integrated) emission intensity of the deep impurity related transition is only about 1% (3%) of that of the band-edge transition at room temperature. The PL emission properties of AlN have been compared with those of GaN. It was shown that the optical quality as well as quantum efficiency of AlN epilayers is as good as that of GaN.

Correlation Between Optical and Electrical properties of Mg-doped AlN Epilayers

Deep UV photoluminescence and Hall-effect measurements were employed to characterize Mg-doped AlN grown by metal organic chemical vapor deposition. A strong correlation between the optical and electrical properties was identified and utilized for material and p-type conductivity optimization. An impurity emission peak at 4.7eV, attributed to the transition of electrons bound to triply charged nitrogen vacancies to neutral magnesium impurities, was observed in highly resistive epilayers. Improved conductivity was obtained by suppressing the intensity of the 4.7eV emission line. Mg-doped AlN epilayers with improved conductivities predominantly emit the acceptor-bound exciton transition at 5.94eV. From the Hall-effect measurements performed at elevated temperatures, the activation energy of Mg in AlN was measured to be about 0.5eV, which is consistent with the value obtained from previous optical measurements. Energy levels of nitrogen vacancies and Mg acceptors in Mg-doped AlN have been constructed.Deep UV photoluminescence and Hall-effect measurements were employed to characterize Mg-doped AlN grown by metal organic chemical vapor deposition. A strong correlation between the optical and electrical properties was identified and utilized for material and p-type conductivity optimization. An impurity emission peak at 4.7eV, attributed to the transition of electrons bound to triply charged nitrogen vacancies to neutral magnesium impurities, was observed in highly resistive epilayers. Improved conductivity was obtained by suppressing the intensity of the 4.7eV emission line. Mg-doped AlN epilayers with improved conductivities predominantly emit the acceptor-bound exciton transition at 5.94eV. From the Hall-effect measurements performed at elevated temperatures, the activation energy of Mg in AlN was measured to be about 0.5eV, which is consistent with the value obtained from previous optical measurements. Energy levels of nitrogen vacancies and Mg acceptors in Mg-doped AlN have been constructed.

Electrical and Optical Properties of P-Type InGaN

Mg-doped InxGa1−xN alloys were grown by metal organic chemical vapor deposition on semi-insulating c-GaN/sapphire templates. Hall effect measurements showed that Mg-doped InxGa1−xN epilayers are p-type for x up to 0.35. Mg-acceptor levels (EA) as a function of x, (x up to 0.35), were experimentally evaluated from the temperature dependent hole concentration. The observed EA in Mg-doped In0.35Ga0.65N alloys was about 43 meV, which is roughly four times smaller than that in Mg doped GaN. A room temperature resistivity as low as 0.4 Ω cm (with a hole concentration ∼5×1018 cm−3 and hole mobility ∼3 cm2/V s) was obtained in Mg-doped In0.22Ga0.78N. It was observed that the photoluminescence (PL) intensity associated with the Mg related emission line decreases exponentially with x. The Mg energy levels in InGaN alloys obtained from PL measurements are consistent with those obtained from Hall-effect measurements.

Correlation between biaxial stress and free exciton transition in AlN epilayers

Photoluminescence (PL) spectroscopy and x-ray diffraction measurements were employed to study biaxial strain in AlN epilayers grown on different substrates. X-ray diffraction revealed that AlN epilayers grown on AlN bulk substrates (or homoepilayers) have the same lattice parameters as AlN bulk crystals and are almost strain-free. Compared to the free exciton (FX) transition in an AlN homoepilayer, the FX line was 31meV higher in AlN/sapphire due to a compressive strain and 55 (69)meV lower in AlN∕SiC (AlN∕Si) due to a tensile strain. A linear relationship between the FX transition energy peak position and in-plane stress was obtained, and a value of 45meV∕GPa for the linear coefficient of the stress-induced bandgap shift in AlN epilayers was deduced. The work here establishes PL as another simple and effective method for monitoring the biaxial stress in AlN epilayers.

Photoluminescence studies of Si-doped AlN epilayers

Si-doped AlN epilayers were grown by metalorganic chemical vapor deposition on sapphire substrates. Deep ultraviolet picosecond time-resolved photoluminescence (PL) spectroscopy has been employed to study the optical transitions in the grown epilayers. The donor bound exciton (or I2) transition was found to be the dominant recombination line in Si-doped AlN epilayers at 10 K and its emission intensity decreases with increasing Si dopant concentration. Doping-induced PL emission linewidth broadening and band-gap renormalization effects have also been observed. Time-resolved PL studies revealed a linear decrease of PL decay lifetime with increasing Si dopant concentration, which was believed to be a direct consequence of the doping-enhanced nonradiative recombination rates.

Erbium-Doped AlInGaN Alloys as High-Temperature Thermoelectric Materials

The potential of Er-doped AlxIn0.1Ga0.9-xN quaternary alloys as high-temperature thermoelectric (TE) materials has been explored. It was found that the incorporation of Er significantly decreased the thermal conductivity (κ) of AlxIn0.1Ga0.9-xN alloys. The temperature-dependent TE properties were measured up to 1055 K for an Er and Si co-doped n-type Al0.1In0.1Ga0.8N alloy. The figure of merit (ZT) showed a linear increase with temperature and a value of about 0.3 at 1055 K was estimated. The ability to survive such high temperature with reasonable TE properties suggests that low-In-content Er and Si-doped AlInGaN alloys are potential candidate of high-temperature TE materials.

A Simplified Method of Making Flexible Blue LEDs on a Plastic Substrate

A much-simplified method of making flexible GaN blue light-emitting diode (LED) array on a plastic substrate was demonstrated. A sticky elastomeric stamp was first brought into contact with prefabricated GaN LED array on a sapphire substrate. Laser liftoff was applied by shining laser light through the sapphire substrate. The released LED array sitting on the stamp was transferred to a polyethylene terephthalate substrate that was coated with an adhesive layer to finish the fabrication process. Careful investigation of the built-in stress in the GaN LED layer using Raman spectroscopy revealed that the maximum stress that allows for intact GaN LED layer release and transfer was 0.7 GPa. The method drastically simplifies the cumbersome conventional GaN layer transferring method while preserving the original layout of the GaN LED array. Due to its simple and practical characteristics, the method is expected to greatly facilitate the development of versatile transferrable GaN LED applications on various substrates at a much-reduced cost.