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Ben Pang

Applied Materials

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Publication

Featured researches published by Ben Pang.

Archive | 1995

Method and apparatus for cleaning a vacuum line in a CVD system

Ben Pang; David Cheung; William N. Taylor; Sebastien Raoux; Mark Fodor

Archive | 1996

Parallel plate apparatus for in-situ vacuum line cleaning for substrate processing equipment

Ben Pang; David Cheung; William N. Taylor; Sebastien Raoux; Mark Fodor

Archive | 2000

Method and apparatus for cleaning an exhaust line in a semiconductor processing system

Ben Pang; David Cheung; William N. Taylor; Sebastion Raoux; Mark Fodor

Archive | 2000

Apparatus for cleaning an exhaust line in a semiconductor processing system

Ben Pang; David Cheung; William N. Taylor; Sebastien Raoux; Mark Fodor

Archive | 1997

Apparatus for vacuum line cleaning in substrate processing equipment

David Cheung; Mark Fodor; Ben Pang; Sebastien Raoux; William N. Taylor

Archive | 1996

Method and equipment for cleaning vacuum line of cvd system

David Cheung; Mark Fodor; Ben Pang; Sebastien Raoux; William N. Taylor; エヌ． テイラー， ジュニア ウィリアム; ラウ セバスチャン; シュン デイヴィッド; パン ベン; フォダー マーク

Archive | 1996

Reinigungsverfahren und Vorrichtung für Vakuumröhre in einem CVD-System

Ben Pang; David Cheung; Taylor; Sebastien Raoux; Mark Fodor

Archive | 1997

Reinigungsvorrichtung für Vakuumleitung in einer Substrat-Bearbeitungsvorrichtung Cleaning device for vacuum line in a substrate processing apparatus

Ben Pang; David Cheung; Taylor; Sebastien Raoux; Mark Fodor

Archive | 1996

Cleaning method and apparatus for vacuum tube in a CVD system

Ben Pang; David Cheung; Taylor; Sebastien Raoux; Mark Fodor

Archive | 1996

Procédé et dispositif de nettoyage d'un tube à vide dans un système de CVD

Ben Pang; David Cheung; William N. Taylor; Sebastien Raoux; Mark Fodor

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Collaboration

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David Cheung

Applied Materials

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Mark Fodor

Applied Materials

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Sebastien Raoux

Applied Materials

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William N. Taylor

Applied Materials

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Taylor

Applied Materials

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Sebastion Raoux

Applied Materials

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