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Bernhard Hafner

IBM

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Publication

Featured researches published by Bernhard Hafner.

Archive | 1988

Method for forming a photoresist pattern and apparatus applicable therewith

Ulrich Christoph Boettiger; Bernhard Hafner

Archive | 1988

Method for forming a photoresist pattern and apparatus applicable with said method

Ulrich Christoph Böttiger; Bernhard Hafner

Archive | 1983

Reverse process for making chromium masks using silicon dioxide dry etch mask

Gunther Bock; Bernhard Hafner; Reinhold Mühl; Klaus Peter Thiel

1988 Microlithography Conferences | 1988

Optical Pattern Generator Using Excimer Laser

Bernhard Hafner

Archive | 1986

METHOD OF DETERMINING THE LAYER REMOVAL END-POINT DURING LAYERED SUBSTRATE DEVELOPMENT OR ETCHING, AND APPARATUS FOR CARRYING OUT THIS PROCESS

Bernhard Hafner; Klaus Peter Thiel; Guido F. Wenz; Jurgen F. Wustenhagen

Archive | 1982

Reversal process for the production of chromium masks

Günter Bock; Bernhard Hafner; Reinhold Mühl; Klaus Peter Thiel

Archive | 1994

Substrate shifter in stepper

Ulrich Christoph Boettiger; Bernhard Hafner; ウールリッヒ・クリストプ・ベティガー; ベルンハルト・ハフナー

Archive | 1988

Verfahren zur herstellung eines photoresistmusters und apparat dafuer.

Ulrich Christoph Boettiger; Bernhard Hafner

Archive | 1988

Verfahren zur herstellung eines photoresistmusters und apparat dafuer. Process for the preparation of a photoresist pattern and apparatus for it.

Ulrich Christoph Boettiger; Bernhard Hafner

Archive | 1988

A process for producing a photoresist pattern, and apparatus therefor.

Ulrich Christoph Boettiger; Bernhard Hafner

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Ulrich Christoph Boettiger

IBM

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Klaus Peter Thiel

IBM

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Reinhold Mühl

IBM

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Günter Bock

IBM

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Guido F. Wenz

IBM

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Gunther Bock

IBM

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Jurgen F. Wustenhagen

IBM

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Ulrich Christoph Böttiger

IBM

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