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Featured researches published by Bipin Parekh.


advanced semiconductor manufacturing conference | 2006

Point-of-Use Ultra-Pure Water for Immersion Lithography

Michael Clarke; Annie Xia; Joseph E. Smith; Bipin Parekh

In this paper we describe the design and development of point-of-use UPW (ultra pure water) components and systems for the immersion application. The paper addresses the water quality needs for the immersion lithography process and presents key contaminant removal techniques and performance results. POU water delivery systems are designed based upon individual customer needs


Archive | 2004

Lithographic projection apparatus, purge gas supply system and gas purging method

Bipin Parekh; Jeffrey J. Spiegelman; Robert S. Zeller; Russell J. Holmes


Archive | 2003

Method and apparatus for treating fluids

Bipin Parekh; Saksatha Ly; Jieh-Hwa Shyu; John E. Pillion


Archive | 2003

Hollow fiber membrane contact apparatus and process

Bipin Parekh; Rajnikant B. Patel; Kwok-Shun Cheng


Archive | 2002

Process for degassing an aqueous plating solution

Bipin Parekh; Saksatha Ly; Quinwel Wu


Archive | 2006

Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system related application

Bipin Parekh; Robert S. Zeller; Russell J. Holmes; Jeffrey J. Spiegelman


Archive | 2007

Apparatus and method for conditioning an immersion fluid

Bipin Parekh; Annie Xia; Michael Clarke; Joseph E. Smith


Ultrapure water | 2007

Advances in seawater desalination technology lower cost and energy barriers

Bipin Parekh; Annie Xia; Michael Clarke; Joseph E. Smith


Ultrapure water | 2008

EMERGING APPLICATIONS OF HIGH-PURITY WATER : MEETING CHALLENGES OF ADVANCED SEMICONDUCTOR MANUFACTURING

Bipin Parekh


Archive | 2010

***WITHDRAWN PATENT AS PER THE LATEST USPTO WITHDRAWN LIST***Lithographic projection apparatus, purge gas supply system and gas purging method

Bipin Parekh; Jeffrey J. Spiegelman; Robert S. Zeller; Russell J. Holmes

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