Boris Kobrin

Improved vapor-phase deposition technique for antistiction monolayers

We have developed an improved vapor-phase deposition method and an apparatus for the wafer-scale coating of monolayer films typically used in anti-stiction applications. The method consists of a surface preparation step using an O2 plasma followed by the tunable deposition of a monolayer film in the same reactor. This process has been successfully applied to MEMS test structures and has demonstrated superior anti-stiction performance. The deposition process allows tuning of the film properties by the precise metering of the precursor and a catalyst as part of the process control scheme. The anti-stiction monolayer film deposited from dimethyldichlorosilane (DDMS), tridecafluoro-1,1,2,2-tetrahydrooctyltrichlorosilane (FOTS), and heptadecafluoro-1,1,2,2-tetrahydrodecyltrichlorosilane (FDTS) were characterized using contact angle analysis, atomic force microscopy (AFM), and X-ray photoelectron spectroscopy (XPS). The coefficient of static friction was measured using a sidewall test device and the work of adhesion using a cantilever beam array. The results showed that excellent quality, uniformity, and reproducibility could be achieved across a whole wafer using this method and equipment.

Vapor deposited release layers for nanoimprint lithography

This paper presents the advantages of using a vapor deposited self-assembled monolayer (SAM) as a mold release layer for nano-imprint lithography. The release SAM was formed from a perfluorinated organo-silane precursor at room temperature in the gaseous state by a technique called Molecular Vapor Deposition (MVDTM). In contrast to a conventional coating from a liquid immersion sequence, the vapor deposition process forms a particulate free film resulting in a substantial reduction of surface defects. Another advantage of the vapor process is its excellent conformity onto the nanoscale topography of the mold. The self-assembling and self-limiting characteristics of the MVD process enables excellent CD control of the mold pattern. Pattern replication as small as 38nm features was achieved. Various other quantitative metrics of the MVD release layer are presented in this paper.

Molecular vapor deposition (MVD/spl trade/) - a new method of applying moisture barriers for packaging applications

We propose that a composite hydrophobic SAM film with 100% coverage of all exposed surfaces can be used in many advance packaging applications. For example, a SAM moisture barrier with conventional plastic packaging could be a low cost alternative to hermetic ceramic housed devices and SAMs could be barriers to prevent moisture induced corrosion.

Molecular vapor deposition (MVD) for improved SAM coatings

This paper reports on the results of an improved surface modification method called Molecular Vapor Deposition (MVD). MVD allows for the creation of molecular organic coatings which are denser and more durable than those obtained by current liquid or vapor-phase methods. This improvement has been achieved using a “sequential” or “layered” vapor deposition scheme of two different molecular films. The first molecular coating is a “seed” or adhesion promoter layer which is used to increase the binding sites for the subsequent functional molecular layer. The resulting surface coatings were observed to have improved stability to immersion applications, higher temperature stability and overall improved durability as a result of the increased surface coverage when compared to standard self-assembled monolayers (SAMs). These new film capabilities will have significant importance in improving the functionality and reliability of many micro- and nano-scale devices. The sequential approach with the seed layer has also been used to deposit molecular coatings on a variety of substrate materials (such as polymers, plastics and metals) which normally do not allow high quality surface coatings.

P‐56: Aligning Liquid Crystals Using Self‐Assembled Monolayers

method of liquid crystal (LC) alignment - rubbing of polyimide film with a cloth (1) - changes the topography of the layer and induces anisotropic orientation of polymer chains along the rubbing direction. Unfortunately, it also generates a lot of debris. Moreover, this method is incompatible with localized control over LC alignment. Recently, anchoring of LC was demonstrated using low energy surfaces from self-assembled monolayers (SAMs) deposited from a liquid phase on gold and silica (2,3). We applied Molecular Vapor Deposition (MVD TM ) technology for anchoring of MLC 6610 liquid crystal to ITO surface. Advantage of vapor-phase deposition in superior surface quality has been reported elsewhere (4). Self-assembled monolayers of perfluorinated chlorosilanes and aminosilanes were used to build LC cell with symmetrical boundary condition and cell gap of 10 um. Anchoring energy of 4.2x10 -4 J/m2 was obtained using capacity method for both types of SAMs. MLC 6610 showed 2.45 V threshold voltage. We observed a uniform vertical alignment of the cell without defects.