Byung Gil Ryu

Texture and cross-sectional microstructure of MgO films grown on silicon dioxide by electron-beam evaporation

Abstract The MgO films grown on amorphous SiO 2 by electron-beam evaporation were investigated. The films with columnar microstructures were mainly with a 〈111〉 preferred orientation. The MgO crystallites near the MgO/SiO 2 interface were very fine, which means a high nucleation rate at the initial stage of the film growth. The grains formed at the initial growth stage became less 〈111〉 oriented with increasing deposition temperature. Instead, the 〈100〉 texture came to be enhanced. There occurred a somewhat abrupt change in the grain size at the film thickness of 450 to 700 A. The 〈111〉 texture prevailed over other orientations above that film thickness, regardless of the deposition temperature.

36.5: Effect of Aging Discharge on the MgO Protective Layer of AC‐Plasma Display Panel

MgO surface of AC plasma display panel was investigated after aging process. The surface roughness of MgO film was different by regional groups due to different degree of ion bombardments. Though there was no difference in the chemical composition of the MgO surface before and after aging process, cathodoluminescence (CL) spectra increased as the surface roughness of MgO film became smoother. This suggests that ion bombardments created the F and/or F+ centers on the MgO surface, therefore, the CL intensity increased at the smoothed surface.

P‐49: Investigation on Parallel Operating Characteristics of a Closed Microhollow Cathode Discharge for Direct Current Plasma Display Panels

Open microhollow cathode discharge shows a flat (dV/dI=0) or negative behavior in current-voltage characteristics for the entire pressure (70 to 760 Torr). On the contrary, the closed microhollow cathode discharge of 200 μm hole diameter leads to a positive differential resistance, in the range of pressure (70 to 760 Torr), without the individual ballast resistance and the distributed resistor. Also for the closed microhollow cathode discharges, the microdischarge in 200 μm hole diameter results in parallel operation characteristics at pressures higher than in 500 μm opening because of the large resistance of discharge itself as well as the small power requirement for producing the plasma in a hole. Therefore, parallel operating characteristics of microhollow cathode discharge allows us to fabricate the DC plasma display panel with high pressure and low current density.