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C. Bucher

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Publication

Featured researches published by C. Bucher.

Thin Solid Films | 2004

Potential of amorphous and microcrystalline silicon solar cells

J. Meier; J. Spitznagel; U. Kroll; C. Bucher; S. Faÿ; T. Moriarty; A. Shah

ieee world conference on photovoltaic energy conference | 2006

High-Efficiency P-I-N Microcrystalline and Micromorph Thin Film Silicon Solar Cells Deposited on LPCVD Zno Coated Glass Substrates

Julien Bailat; Didier Dominé; R. Schlüchter; J. Steinhauser; S. Faÿ; F. Freitas; C. Bucher; L. Feitknecht; X. Niquille; T. Tscharner; A. Shah; Christophe Ballif

Thin Solid Films | 2004

High-efficiency p-i-n a-Si : H solar cells with low boron cross-contamination prepared in a large-area single-chamber PECVD reactor

U. Kroll; C. Bucher; S. Benagli; I. Schönbächler; J. Meier; A. Shah; J. Ballutaud; A.A. Howling; Ch. Hollenstein; A. Büchel; M. Poppeller

Thin Solid Films | 2004

Reduction of the boron cross-contamination for plasma deposition of p–i–n devices in a single-chamber large area radio-frequency reactor

J. Ballutaud; C. Bucher; Christoph Hollenstein; A.A. Howling; U. Kroll; S. Benagli; A. Shah; A. Buechel

Archive | 2003

Method for producing semi-conducting devices and devices obtained with this method

Ulrich Kroll; C. Bucher; Jacques Schmitt; Markus Poppeller; Christoph Hollenstein; Juliette Ballutaud; A.A. Howling

Proc. 29th EPS Conference on Controlled Fusion and Plasma Physics | 2002

Plasma Deposition of p-i-n Devices using a Single PECVD Chamber: Study of the Boron Contamination

J. Ballutaud; A.A. Howling; L. Sansonnens; Ch. Hollenstein; U. Kroll; I. Schönbächler; C. Bucher; M. Poppeller; J. Weichart; A. Buechel; F. Jomard

Thin Solid Films | 2004

Role of i layer deposition parameters on the Voc and FF of an a-Si:H solar cell deposited by PECVD at 27.13 MHz

Isabelle Schönbächler; S. Benagli; C. Bucher; A. Shah; J. Ballutaud; A. Büchel

EPSEC Conference | 2006

Fast growth of microcrystalline silicon solar cells on LP-CVD ZnO in industrial KAI PECVD reactors

L. Feitknecht; F. Freitas; C. Bucher; Julien Bailat; A. Shah; Christophe Ballif; J. Meier; Joel Spitznagel; U. Kroll; B. Strahm; A.A. Howling; L. Sansonnens; Ch. Hollenstein

Archive | 2003

Method for producing semiconducting devices

Ulrich Kroll; C. Bucher; Jacques Schmitt; Markus Poppeller; Christoph Hollenstein; Juliette Ballutaud; A.A. Howling

Archive | 2003

Plasma deposition of p-i-n devices in a single-chamber larger area PECVC reactor: Reduction of the Boron cross-contamination

J. Ballutaud; C. Bucher; Ch. Hollenstein; A.A. Howling; U. Kroll; S. Benagli; A. Shah; A. Buechel

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Collaboration

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A.A. Howling

École Polytechnique Fédérale de Lausanne

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A. Shah

École Polytechnique Fédérale de Lausanne

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U. Kroll

University of Neuchâtel

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J. Ballutaud

École Polytechnique Fédérale de Lausanne

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Christoph Hollenstein

École Polytechnique Fédérale de Lausanne

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A. Buechel

École Polytechnique Fédérale de Lausanne

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Ch. Hollenstein

École Polytechnique Fédérale de Lausanne

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J. Meier

University of Neuchâtel

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Christophe Ballif

École Polytechnique Fédérale de Lausanne

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Julien Bailat

University of Neuchâtel

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