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Dive into the research topics where C. Reimann is active.

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Featured researches published by C. Reimann.


Journal of Applied Physics | 2013

Dependence of phosphorus gettering and hydrogen passivation efficacy on grain boundary type in multicrystalline silicon

Philipp Karzel; Mirco Ackermann; Lukas Gröner; C. Reimann; Markus Zschorsch; Sylke Meyer; Frank Kiessling; Stefan Riepe; Giso Hahn

This investigation analyzes the dependency of minority charge carrier lifetime values at grain boundaries in multicrystalline silicon on the grain boundary type after P gettering and/or firing of SiNx:H layers deposited by plasma enhanced chemical vapor deposition. To get a broad statistics, a new method to determine the coincidence site lattice grain boundary types on large scale throughout entire 50 × 50 mm2 samples is combined with spatially resolved lifetime-calibrated photoluminescence measurements and mappings of the interstitial iron concentration. As an evaluation of the lifetime data at grain boundaries in comparison to the recombination activity of the bordering grains, lifetime contrast values are calculated. The correlation of this dependency on the grain boundary type with the impurity concentration is analyzed by the investigation of multicrystalline samples from two different ingots grown by directional solidification with different crucible material qualities. A dependency of the efficacy ...


photovoltaic specialists conference | 2008

The importance of convective heat and mass transfer for controlling material properties in ingot casting of multi-crystalline-silicon for photovoltaic applications

C. Reimann; T. Jung; J. Friedrich; G. Muller

This contribution deals with the development of a species transfer model in the hot zone region of a laboratory scale crystal growth facility for the directional solidification of multi-crystalline silicon ingots with a diameter of 6 cm and a length of 4–5 cm in a Si3N4 coated silica crucible. A coupled local global modeling approach is used to compute the convective heat and mass transfer especially for C, N, O and the precipitate formation of SiC and Si3N4 during crystallization. The experimentally obtained data (C, N and O distributions) are compared with numerical results. It will be shown that the amount of contaminants in the silicon ingot is mainly influenced by the initial feed stock quality, the Si3N4 coating, the incorporation of CO and the evaporation of SiO over the free melt surface. It will be demonstrated that melt convection plays an important role in the transport of the species in the silicon melt and that convection can explain the experimentally observed O, C, and N distributions as well as the formation of the SiC and Si3N4 precipitates.


Journal of Crystal Growth | 2012

Mono-crystalline growth in directional solidification of silicon with different orientation and splitting of seed crystals

Matthias Trempa; C. Reimann; J. Friedrich; G. Müller; Daniel Oriwol


Journal of Crystal Growth | 2010

Modeling of incorporation of O, N, C and formation of related precipitates during directional solidification of silicon under consideration of variable processing parameters

C. Reimann; Matthias Trempa; Thomas Jung; J. Friedrich; G. Müller


Journal of Crystal Growth | 2010

The influence of growth rate on the formation and avoidance of C and N related precipitates during directional solidification of multi crystalline silicon

Matthias Trempa; C. Reimann; J. Friedrich; G. Müller


Journal of Crystal Growth | 2010

About the formation and avoidance of C and N related precipitates during directional solidification of multi-crystalline silicon from contaminated feedstock

C. Reimann; Matthias Trempa; J. Friedrich; G. Müller


Journal of Crystal Growth | 2014

Defect formation induced by seed-joints during directional solidification of quasi-mono-crystalline silicon ingots

Matthias Trempa; C. Reimann; J. Friedrich; G. Müller; Andreas Krause; Lamine Sylla; T. Richter


Acta Materialia | 2014

Laue scanner: A new method for determination of grain orientations and grain boundary types of multicrystalline silicon on a full wafer scale

Toni Lehmann; Matthias Trempa; Elke Meissner; Markus Zschorsch; C. Reimann; Jochen Friedrich


Crystal Research and Technology | 2015

Influence of grain boundaries intentionally induced between seed plates on the defect generation in quasi‐mono‐crystalline silicon ingots

Matthias Trempa; C. Reimann; Jochen Friedrich; G. Müller; Andreas Krause; Lamine Sylla; Thomas Richter


Acta Materialia | 2016

Clarification of the relation between the grain structure of industrial grown mc-Si and the area fraction of electrical active defects by means of statistical grain structure evaluation

Toni Lehmann; C. Reimann; Elke Meissner; Jochen Friedrich

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A. Cröll

University of Freiburg

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Lamine Sylla

Centre national de la recherche scientifique

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Yutao Tao

University of Minnesota

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Arne Croell

University of Freiburg

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Giso Hahn

University of Konstanz

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