C. Veillas

Spatially and polarization resolved plasmon mediated transmission through continuous metal films

The experimental demonstration and characterization is made of the plasmon-mediated resonant transmission through an embedded undulated continuous thin metal film under normal incidence. 1D undulations are shown to enable a spatially resolved polarisation filtering whereas 2D undulations lead to spatially resolved, polarization independent transmission. Whereas the needed submicron microstructure lends itself in principle to CD-like low-cost mass replication by means of injection moulding and embossing, the present paper demonstrates the expected transmission effects on experimental models based on metal-coated photoresist gratings. The spectral and angular dependence in the neighbourhood of resonance are investigated and the question of the excess losses exhibited by surface plasmons is discussed.

100 nm period grating by high-index phase-mask immersion lithography

The interferogram of a high index phase mask of 200 nm period under normal incidence of a collimated beam at 244 nm wavelength with substantially suppressed zeroth order produces a 100 nm period grating in a resist film under immersion. The paper describes the phase mask design, its fabrication, the effect of electron-beam lithographic stitching errors and optical assessment of the fabricated sub-cutoff grating.

Low coherence interferometry for central thickness measurement of rigid and soft contact lenses.

In this paper we propose contact lens central thickness measurement with a low coherence interferometry technique using either a SLED source or a broadband continuum generated in air-silica Microstructured Optical Fiber (MOF) pumped with a picosecond microchip laser. Each of these sources associated with the interferometer provides, at the same time, good measurement resolution and quick signal recording without moving any optical elements and without need of a Fourier Transform operation. Signal improvement is performed afterwards by a numerical treatment for optimal correlation peaks detection leading to central thickness value of several contact lenses.

Fast dynamic interferometric lithography for large submicrometric period diffraction gratings production

Abstract. This paper describes a successful technological transfer, from a state laboratory to an industrial company, for writing long and large submicron period gratings (potentially square-meter sized), implemented in an industrial direct laser beam writing equipment at 355 nm wavelength (Dilase 750 from KLOE SA company). The writing head, which has been inserted in the machine, consists of a phase mask which enables it to project a set of fringes pattern of small area onto a photoresist-coated substrate. As the substrate is continuously moving, one-dimensional or two-dimensional gratings can be fabricated over large areas limited only by the machine’s stage displacement range. The optical scheme is described from the beam shaping to the printing processes and the phase mask optimization. In order to demonstrate the technology, 600 nm period gratings of over 20 cm in length have been fabricated. Such submicron structures can be used in solar cell modules for photon trapping and as antireflection coatings.

Subwavelength cylindrical grating by holistic phase-mask coordinate transform

A periodic grating with an integer number of periods is fabricated at the resist-coated wall of a cylinder by exposing a circularly symmetrical planar high index phase mask to a cylindrical wave. This extends the spatial coherence features easily achievable in a planar 2D space to the 3D space of cylindrical waves and elements.

On-the-fly writing of a long grating phase mask

A method is demonstrated for writing long grating phase masks, which can be used for patterning large-area (square meter size) submicron-period gratings. The method consist of illuminating a small area transmission grating phase mask by a continous wave transverse-electric-polarized collimated laser beam under the −1st order Littrow mounting to define a high-contrast interferogram composed of fringes. By sliding a long photoresist-coated substrate under this small area phase mask, gratings of arbitrary length may be written, with grating lines oriented in the scan direction. The patterning of uninterrupted gratings with lengths exceeding 300 mm is demonstrated.

Interfaces detection after corneal refractive surgery by low coherence optical interferometry

The detection of refractive corneal surgery by LASIK, during the storage of corneas in Eye Banks will become a challenge when the numerous operated patients will arrive at the age of cornea donation. The subtle changes of corneal structure and refraction are highly suspected to negatively influence clinical results in recipients of such corneas. In order to detect LASIK cornea interfaces we developed a low coherence interferometry technique using a broadband continuum source. Real time signal recording, without moving any optical elements and without need of a Fourier Transform operation, combined with good measurement resolution is the main asset of this interferometer. The associated numerical processing is based on a method initially used in astronomy and offers an optimal correlation signal without the necessity to image the whole cornea that is time consuming. The detection of corneal interfaces - both outer and inner surface and the buried interface corresponding to the surgical wound – is then achieved directly by the innovative combination of interferometry and this original numerical process.

Wire-grid polarizer using galvanic growth technology: demonstration of a wide spectral and angular bandwidth component with high extinction ratio

Abstract. Functional demonstration of a wide band, wide angular width wire-grid polarizer has been made in the framework of a user project of the European project ACTMOST (Access To Micro-Optics Expertise, Services and Technologies). The polarization function relies on linear polarizers using the wire-grid polarizer principle by means of a metal grating of unusually large period, exhibiting a large extinction of the transmission of the TE polarization in the 850-nm wavelength range. This grating achieves a broadband and especially high angular aperture reflection with low loss and permits resorting to very low cost incoherent light sources for the transmitted TM polarization. This paper will describe the design, the modeling and optimization, as well as the complete technological process chain, that has been used, starting with the photoresist grating printing using phase-mask UV-based lithography to the uniform galvanic growth of a very shallow gold grating on transparent conductive layer deposited on a glass substrate. Transmission curves for both polarizations performed on the first demonstrators will be presented.