Svetlen Tonchev

Evidence of surface plasmon resonance in ultrafast laser-induced ripples.

The sensitivity of grating-coupled Surface Plasmon Polaritons (SPPs) on metallic surface has been exploited to investigate the correlation between ripples formation under ultrashort laser exposure and SPPs generation conditions. Systematic examination of coupling of single ultrashort laser pulse on gratings with appropriate periods ranging from 440 nm to 800 nm has been performed. Our approach reveals that a surface plasmon is excited only for an appropriate grating period, the nickel sample exhibits fine ripples pattern, evidencing the plasmonic nature of ripples generation. We propose a systematic investigation supported by a comprehensive study on the obtained modulation of such a coupling efficiency by means of a phenomenological Drude-Lorentz model which captures possible optical properties modification under femtosecond irradiation.

Spatially and polarization resolved plasmon mediated transmission through continuous metal films

The experimental demonstration and characterization is made of the plasmon-mediated resonant transmission through an embedded undulated continuous thin metal film under normal incidence. 1D undulations are shown to enable a spatially resolved polarisation filtering whereas 2D undulations lead to spatially resolved, polarization independent transmission. Whereas the needed submicron microstructure lends itself in principle to CD-like low-cost mass replication by means of injection moulding and embossing, the present paper demonstrates the expected transmission effects on experimental models based on metal-coated photoresist gratings. The spectral and angular dependence in the neighbourhood of resonance are investigated and the question of the excess losses exhibited by surface plasmons is discussed.

Narrow band resonant grating of 100% reflection under normal incidence

A resonant grating mirror comprising a multilayer submirror and a grating slab waveguide submirror exhibiting constructive mutual reflection is shown experimentally to provide zero transmission. Its reflection line width of less than 1 nm, its polarization selectivity and low overall loss make the device usable as a longitudinal mode filter in a disk laser in the 1000-1100 nm wavelength range.

100 nm period grating by high-index phase-mask immersion lithography

The interferogram of a high index phase mask of 200 nm period under normal incidence of a collimated beam at 244 nm wavelength with substantially suppressed zeroth order produces a 100 nm period grating in a resist film under immersion. The paper describes the phase mask design, its fabrication, the effect of electron-beam lithographic stitching errors and optical assessment of the fabricated sub-cutoff grating.

Efficient and tolerant resonant grating coupler for multimode optical interconnections.

More than 60% overall coupling efficiency is achieved in the demonstrator of an optical interconnect comprising an input grating coupler, a multimode slab waveguide section and an output grating coupler. The grating coupling strength is enhanced by means of a leaky mode resonance. The efficiency of the resonant grating coupler compares favourably with the performancs reported on mirror inserts.

Azimuthally polarized laser mode generation by multilayer mirror with wideband grating-induced TM leakage in the TE stopband

A new intracavity laser polarization-mode selection scheme relying upon a TE/TM diffractive dichroism principle in a grating multilayer mirror is proposed and demonstrated. The grating diffracts the first orders between the TE and TM band edges of the angular spectra of the laser mirror inducing a leakage of the TM polarization into the mirror substrate through the multilayer stack whereas TE diffraction into the substrate is forbidden. This mechanism is non-resonant, thus relatively wide-band. Applied with a circular-line grating in the 1.0 µm - 1.1 µm wavelength range, this mirror filters out the radially polarization mode and causes the emission of the azimuthally polarized mode. An original amorphous silicon grating technology was developed and the optical function demonstrated in a Nd:YAG laser.

Subwavelength cylindrical grating by holistic phase-mask coordinate transform

A periodic grating with an integer number of periods is fabricated at the resist-coated wall of a cylinder by exposing a circularly symmetrical planar high index phase mask to a cylindrical wave. This extends the spatial coherence features easily achievable in a planar 2D space to the 3D space of cylindrical waves and elements.

Hydrogenated Amorphous Silicon Microstructuring for 0th-Order Polarization Elements at 1.0–1.1

Dedicated photolithographic and reactive ion etching processes applied to the plasma-enhanced chemical vapor deposition (PECVD) hydrogenated amorphous silicon layers of solar cells have been developed in the objective of the low-cost manufacturing of efficient, depth-limited subwavelength gratings transforming a linearly polarized beam into a radially and azimuthally polarized beam in the 1.0-1.1-μm wavelength range.

\mu\hbox{m}

The device presented in this paper is designed for coupling a free space optical wave under quasi-normal incidence in and out of a highly multimode waveguide with high efficiency. It uses two resonant diffraction gratings at the substrate-waveguide interface that are made of a shallow metal grating, covered with a high refractive index layer. It is shown that the resonant structure can theoretically diffract up to 90% of the incident energy in and out of the waveguiding layer. The geometrical parameters of the structure and the tolerances can easily be achieved by conventional technology means.

Wavelength

A method is demonstrated for writing long grating phase masks, which can be used for patterning large-area (square meter size) submicron-period gratings. The method consist of illuminating a small area transmission grating phase mask by a continous wave transverse-electric-polarized collimated laser beam under the −1st order Littrow mounting to define a high-contrast interferogram composed of fringes. By sliding a long photoresist-coated substrate under this small area phase mask, gratings of arbitrary length may be written, with grating lines oriented in the scan direction. The patterning of uninterrupted gratings with lengths exceeding 300 mm is demonstrated.