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Chang Young Kim

Jeju National University

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Publication

Featured researches published by Chang Young Kim.

Thin Solid Films | 2007

Characteristics of low-k SiOC(–H) films deposited at various substrate temperature by PECVD using DMDMS/O2 precursor

Chang Young Kim; Seung-Hyun Kim; R. Navamathavan; Chi Kyu Choi; Won Young Jeung

Thin Solid Films | 2011

Ultraviolet irradiation effect on the properties of leakage current and dielectric breakdown of low-dielectric-constant SiOC(H) films using comb capacitor structure

Chang Young Kim; R. Navamathavan; Heang Seuk Lee; Jong-Kwan Woo; Myung Taek Hyun; Kwang-Man Lee; Won Young Jeung; Chi Kyu Choi

Journal of the Korean Physical Society | 2009

Interface Properties of Nickel-silicide Films Deposited by Using Plasma-assisted Atomic Layer Deposition

Kwang-Man Lee; Chang Young Kim; Chi Kyu Choi; Sang-Won Yun; Jong-Bong Ha; Jung-Hee Lee; JeongYong Lee

Journal of the Korean Physical Society | 2008

Deposition and Characterization of Porous Low-Dielectric-Constant SiOC(-H) Thin Films Deposited from TES/O2 precursors by Using Plasma-Enhanced Chemical Vapor Deposition

R. Navamathavan; Chang Young Kim; An Soo Jung; Chi Kyu Choi; Heon Lee

Journal of the Korean Physical Society | 2008

Plasma Diagnostics during Plasma-Enhanced Chemical-Vapor Deposition of Low-Dielectric-Constant SiOC(-H) Films from TES/O2 Precursors

R. Navamathavan; An Soo Jung; Chang Young Kim; Chi Kyu Choi; Heon Ju Lee

Surface & Coatings Technology | 2008

Electrical characterization of low-k films with nano-pore structure prepared with DMDMOS/O2 precursors

Chang Young Kim; R. Navamathavan; Heon Lee; Chi Kyu Choi

Current Applied Physics | 2011

UV irradiation effects on the bonding structure and electrical properties of ultra low-k SiOC(–H) thin films for 45 nm technology node

Chi Kyu Choi; Chang Young Kim; R. Navamathavan; Heang Seuk Lee; Jong-Kwan Woo; Myung Taek Hyun; Heon Ju Lee; Won Young Jeung

Journal of the Korean Physical Society | 2007

Formation Mechanism and Structural Characteristics of Low-Dielectric-Constant SiOC(-H) Films Deposited by Using Plasma-Enhanced Chemical-Vapor Deposition with DMDMS and O2 Precursors

Chang Young Kim; Seung-Hyun Kim; Hyub Seung Kim; R. Navamathavan; Chi Kyu Choi

Journal of the Korean Physical Society | 2011

Characteristics of SiOC(-H) Thin Films Prepared by Using Plasma-enhanced Atomic Layer Deposition

Kwang-Man Lee; Chang Young Kim; Chi Kyu Choi; R. Navamathavan

Thin Solid Films | 2010

Study of Cu diffusion behavior in low dielectric constant SiOC(-H) films deposited by plasma-enhanced chemical vapor deposition

Chi Kyu Choi; Heang Seuk Lee; R. Navamathavan; Jong-Kwan Woo; Chang Young Kim

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Chi Kyu Choi

Jeju National University

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R. Navamathavan

Jeju National University

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Heang Seuk Lee

Jeju National University

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Jong-Kwan Woo

Jeju National University

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Kwang-Man Lee

Jeju National University

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Heon Ju Lee

Jeju National University

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Heon Lee

Sunchon National University

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Myung Taek Hyun

Jeju National University

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Seung-Hyun Kim

Yonsei University

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Sang-Won Yun

Kyungpook National University

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