Chito Kendrick

Enhanced conversion efficiencies for pillar array solar cells fabricated from crystalline silicon with short minority carrier diffusion lengths

Radial n+–p+ junction solar cells composed of densely packed pillar arrays, 25-μm-tall and 7.5 μm in diameter, fabricated from p-type silicon substrates with extremely short minority carrier diffusion lengths are investigated and compared to planar cells. To understand the two times higher AM 1.5 efficiencies of the pillar array cells, dark and light I-V characteristics as well as spectral responses are presented for the two structures. The higher pillar array cell efficiencies are due to the larger short-circuit currents from the larger photon absorption thickness and the shorter carrier collection length, with a significant additional contribution from multiple reflections in the structure.

Radial junction silicon wire array solar cells fabricated by gold-catalyzed vapor-liquid-solid growth

The fabrication of radial junction silicon (Si) solar cells using Si wire arrays grown by Au-catalyzed vapor-liquid-solid growth on patterned Si substrates was demonstrated. An important step in the fabrication process is the repeated thermal oxidation and oxide etching of the Si wire arrays. The oxidation cleaning process removes residual catalyst material from the wire tips and exposes additional Au embedded in the material. Using this cleaning process and junction formation through POCl3 thermal diffusion, rectifying p-n junctions were obtained that exhibited an efficiency of 2.3% and open circuit voltages up to 0.5 V under Air Mass 1.5G illumination.

Single wire radial junction photovoltaic devices fabricated using aluminum catalyzed silicon nanowires

Single nanowire radial junction solar cell devices were fabricated using Si nanowires synthesized by Al-catalyzed vapor-liquid-solid growth of the p(+) core (Al auto-doping) and thin film deposition of the n(+)-shell at temperatures below 650 °C. Short circuit current densities of 11.7 mA cm(-2) were measured under 1-sun AM1.5G illumination, showing enhanced optical absorption. The power conversion efficiencies were limited to < 1% by the low open circuit voltage and fill factor of the devices, which was attributed to junction shunt leakage promoted by the high p(+)/n(+) doping. This demonstration of a radial junction device represents an important advance in the use of Al-catalyzed Si nanowire growth for low cost photovoltaics.

Sulfur passivation of InN surface electron accumulation

The effects of treatment with ammonium sulfide ((NH4)(2)S-x) solution on the electronic properties of InN surfaces have been investigated with high resolution x-ray photoemission spectroscopy. The valence band, In 3d, and N 1s x-ray photoemission spectra show that the surface Fermi level decreases by approximately 0.15 eV with (NH4)(2)S-x-treatment. This corresponds to a reduction of the downward band bending, with the surface sheet charge density decreasing by 30%

Ultrafast Electrical Measurements of Isolated Silicon Nanowires and Nanocrystals.

We simultaneously determined the charge carrier mobility and picosecond to nanosecond carrier dynamics of isolated silicon nanowires (Si NWs) and nanocrystals (Si NCs) using time-resolved terahertz spectroscopy. We then compared these results to data measured on bulk c-Si as a function of excitation fluence. We find >1 ns carrier lifetimes in Si NWs that are dominated by surface recombination with surface recombination velocities (SRV) between ∼1100-1700 cm s(-1) depending on process conditions. The Si NCs have markedly different decay dynamics. Initially, free-carriers are produced, but relax within ∼1.5 ps to form bound excitons. Subsequently, the excitons decay with lifetimes >7 ns, similar to free carriers produced in bulk Si. The isolated Si NWs exhibit bulk-like mobilities that decrease with increasing excitation density, while the hot-carrier mobilities in the Si NCs are lower than bulk mobilities and could only be measured within the initial 1.5 ps decay. We discuss the implications of our measurements on the utilization of Si NWs and NCs in macroscopic optoelectronic applications.

Vapor-liquid-solid growth of 〈110〉 silicon nanowire arrays

The epitaxial growth of <110> silicon nanowires on (110) Si substrates by the vapor-liquid-solid growth process was investigated using SiCl4 as the source gas. A high percentage of <110> nanowires was obtained at high temperatures and reduced SiCl4 partial pressures. Transmission electron microscopy characterization of the <110> Si nanowires revealed symmetric V-shaped {111} facets at the tip and large {111} facets on the sidewalls of the nanowires. The symmetric {111} tip faceting was explained as arising from low catalyst supersaturation during growth which is expected to occur given the near-equilibrium nature of the SiCl4 process. The predominance of {111} facets obtained under these conditions promotes the growth of <110> SiNWs.

Seeding of Silicon Wire Growth by Out‐Diffused Metal Precipitates

We propose the out-diffused metal precipitates (OMP) method to seed metal catalysts for bottom-up silicon wire growth. We fi rst in-diffuse the silicon substrate with a fastdiffusing metal (e.g., copper), and then anneal with a temperature profi le tuned to out-diffuse the metal to favorable nucleation sites on the surface. Vapor–liquid–solid (VLS) silicon wire growth on seeds from the OMP method is demonstrated. The OMP method has the potential to seed wires of any size at any position on a three-dimensional surface, in a high-throughput manner. Silicon nanowires and microwires have potential for applications in integrated circuits, [ 1 ] solar cells, [ 2–5 ] lithium batteries, [ 6 ] and biological sensors. [ 7 ] For example, Kelzenberg et al. [ 4 ] have demonstrated enhanced light absorption and decreased materials usage in solar cells fabricated from silicon microwire arrays, with distinct performance advantages over nanowire-based solar cells. A common bottom-up approach to synthesizing silicon wires is the VLS method, in which liquid metal droplets are used to catalyze crystalline wire growth. In the VLS method, fi rst proposed by Wagner, [ 8 ]

Epitaxial regrowth of silicon for the fabrication of radial junction nanowire solar cells

Radial p-n silicon nanowire (SiNW) solar cells are of interest as a potential pathway to increase the efficiency of crystalline silicon photovoltaics by reducing the junction length and surface reflectivity. Our studies have focused on the use of vapor-liquid-solid (VLS) growth in combination with chemical vapor deposition (CVD) processing for the fabrication of radial p-n junction SiNW array solar cells. High aspect ratio p-type SiNW arrays were initially grown on gold-coated (111) Si substrates by CVD using SiCl4 as the source gas and B2H6 as the p-type dopant source. The epitaxial re-growth of n-type Si shell layers on the Si nanowires was then investigated using SiH4 as the source gas and PH3 as the dopant. Highly conformal coatings were achieved on nanowires up to 25 μm in length. The microstructure of the Si shell layer changed from polycrystalline to single crystal as the deposition temperature was raised from 650oC to 950oC. Electrical test structures were fabricated by aligning released SiNWs onto pre-patterned substrates via fieldassisted assembly followed by selective removal of the n-type shell layer and contact deposition. Current-voltage measurements of the radial p-n SiNWs diodes fabricated with re-grown Si shell layers at 950°C demonstrate rectifying behavior with an ideality factor of 1.93. Under illumination from an AM1.5g spectrum and efficiency for this single SiNW radial p-n junction was determined to be 1.8%, total wire diameter was 985 nm.

Size dependence of the bandgap of plasma synthesized silicon nanoparticles through direct introduction of sulfur hexafluoride

Developing silicon nanoparticle (SiNP) synthesis techniques that allow for straightforward control of nanoparticle size and associated optical properties is critical to potential applications of these materials. In addition, it is, in general, hard to probe the absorption threshold in these materials due to silicons low absorption coefficient. In this study, size is controlled through direct introduction of sulfur hexafluoride (SF6) into the dilute silane precursor of plasma synthesized SiNPs. Size reduction by nearly a factor of two with high crystallinity independent of size is demonstrated. The optical absorption spectra of the SiNPs in the vicinity of the bandgap are measured using photothermal deflection spectroscopy. Bandgap as a function of size is extracted taking into account the polydispersity of the samples. A systematic blue shift in absorption edge due to quantum confinement in the SiNPs is observed with increasing flow of SF6. Photoluminescence (PL) spectra show a similar blue shift with si...

Effect of c-Si doping density on heterojunction with intrinsic thin layer (HIT) radial junction solar cells

Radial junction Si pillar array solar cells based on the heterojunction with intrinsic thin layer (HIT) structure were fabricated from p-type crystal Si (c-Si) wafers of different doping densities. The HIT structure consisting of intrinsic/n-type hydrogenated amorphous Si (a-Si:H) deposited by plasma-enhanced chemical vapor deposition (PECVD) at low temperature (200°C) was found to effectively passivate the high surface area of the p-type Si pillar arrays resulting in open circuit voltages (Voc>0.5) comparable to that obtained on planar devices. At high c-Si doping densities (>1018 cm-3), the short-circuit current density (Jsc) and energy conversion efficiency of the radial junction devices were higher than those of the planar devices demonstrating improved carrier collection in the radial junction structure.