Chris Mccarty

Direct etch for thin film resistor using a hard mask

Stress relief technique of removing oxide from surface of trench-patterned semiconductor-on-insulator structure

N Contact compensation technique

Active area bonding compatible high current structures

CMOS integrated circuit architecture incorporating deep implanted emitter region to form auxiliary bipolar transistor

HIGH CURRENT STRUCTURES WITH COMPATIBLE OF ACTIVE AREA BONDING

Mit der Bondierung auf aktiven Gebieten kompatible, für hohe Ströme geeignete Strukturen

Direkte Ätzung von einem Dünnschicht-Widerstand mittels einer harten Maske Direct etching of a thin film resistor by means of a hard mask

CMOS-integrierte Schaltungsarchitektur mit tief implantierter Emitterregion zur Formung von Hilfs-Bipolartransistoren CMOS integrated circuit architecture with deeply implanted emitter region for forming auxiliary bipolar transistors

Direct etching of a thin film resistor by means of a hard mask