Chul-joon Choi
Samsung
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Publication
Featured researches published by Chul-joon Choi.
international interconnect technology conference | 1999
Ja-hum Ku; Chul-Sung Kim; Chul-joon Choi; K. Fujihara; Ho-Kyu Kang; Moonyong Lee; Ju-hyuck Chung; Eung-joon Lee; Jang-eun Lee; Dae-Hong Ko
A new effect of the titanium (Ti) capping layer on cobalt (Co) silicide formation, which is promising for salicidation applications in deep sub-quarter micron devices, was investigated. TEM, SIMS, and XRD data suggest that Ti on top of the cobalt layer diffuses into the Co/Si interface and dissociates the thin silicon oxide at the interface during RTA. As a result, with a Co/Ti process, the sensitivity of Co salicide processes to surface conditions could be minimized, which gives a larger process window to fabricate deep sub-quarter micron devices.
Archive | 2001
Mahn-Ho Cho; Ja-hum Ku; Chul-joon Choi; Jun-Kyu Cho; Seong-Jun Heo
Archive | 2002
Dong-ho Ahn; Ja-hum Ku; Chul-Sung Kim; Jae-yoon Yoo; Sug-hun Suwon Hong; Chul-joon Choi
Archive | 2008
Seong-hyun Kim; Sang-Bum Kim; Joong-Chul Yoon; Sang-wook Kang; Jong-Sang Choi; Sung-Hyun Kim; Chul-joon Choi
Archive | 2007
Sang-Bum Kim; Sang-wook Kang; Seong-hyun Kim; Chul-joon Choi; Jong-Sang Choi
Archive | 2001
Ja-hum Ku; Mahn-Ho Cho; Chul-joon Choi; Seong-Jun Heo; Jun-Kyu Cho
Archive | 2010
Sang-Bum Kim; Sang-wook Kang; Seong-hyun Kim; Chul-joon Choi; Jong-Sang Choi
Archive | 2007
Joong-Chul Yoon; Seong-hyun Kim; Sung-Hyun Kim; Sang-Bum Kim; Sang-wook Kang; Chul-joon Choi; Jong-Sang Choi; Keon-Han Sohn; Byung-Yoon Suwon Kang
Archive | 2011
Il-Jong Song; Byeong-Hoon Lee; Seung-Won Lee; Chul-joon Choi
Archive | 2010
Min-soo Kang; Chul-joon Choi
