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Dive into the research topics where Chun-Kuo Min is active.

Publication


Featured researches published by Chun-Kuo Min.


Archive | 2003

Acidic polishing slurry for the chemical-mechanical polishing of SiO2 isolation layers

Kristina Vogt; Lothar Puppe; Chun-Kuo Min; Li-Mei Chen


Archive | 2001

Polishing slurry for the chemical-mechanical polishing of silica films

Kristina Vogt; Lothar Puppe; Chun-Kuo Min; Li-Mei Chen; Hsin-Hsen Lu


Archive | 2002

Process for the chemical-mechanical polishing of isolation layers produced using the STI technology, at elevated temperatures

Kristina Vogt; Lothar Puppe; Chun-Kuo Min; Li-Mei Chen


Archive | 2001

ACID GRINDING SLURRY FOR CHEMICAL MECHANICAL POLISHING OF SiO2 SEPARATION LAYER

Li-Mei Chen; Chun-Kuo Min; Lothar Puppe; Kristina Vogt; クリスチーナ・フオクト; チユン−クオ・ミン; リ−メイ・チエン; ロター・プツペ


Archive | 2001

Polishing slurry for the chemical mechanical polishing of silicon dioxide films

Li-Mei Dr. Chen; Hsin-Hsen Lu; Chun-Kuo Min; Lothar Puppe; Kristina Vogt


Archive | 2000

Polierslurry für das chemisch-mechanische Polieren von Siliciumdioxid-Filmen Polishing slurry for chemical mechanical polishing of silicon dioxide films

Kristina Vogt; Lothar Puppe; Chun-Kuo Min; Li-Mei Chen; Hsin-Hsen Lu


Archive | 2000

Verfahren zum chemisch-mechanischen polieren von isolationsschichten nach der sti-technik bei erhöhten temperaturen

Kristina Vogt; Lothar Puppe; Chun-Kuo Min; Li-Mei Chen


Archive | 2000

Verfahren zum chemisch-mechanischen Polieren von Isolationsschichten nach der STI-Technik bei erhöhten Temperaturen A method for chemical mechanical polishing of insulating layers after the STI technology at elevated temperatures

Kristina Vogt; Lothar Puppe; Chun-Kuo Min; Li-Mei Chen


Archive | 2000

A method for chemical mechanical polishing of insulating layers after the STI technology at elevated temperatures

Kristina Vogt; Lothar Puppe; Chun-Kuo Min; Li-Mei Chen


Archive | 2000

Saure Polierslurry für das chemisch-mechanische Polieren von SiO¶2¶-Isolationsschichten Acid polishing slurry for chemical mechanical polishing of SiO¶2¶ insulating layers

Kristina Vogt; Lothar Puppe; Chun-Kuo Min; Li-Mei Chen

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