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Craig A. Roderick

Applied Materials

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Publication

Featured researches published by Craig A. Roderick.

Archive | 1993

Silicon scavenger in an inductively coupled RF plasma reactor

Kenneth S. Collins; Craig A. Roderick; John Trow; Chan-Lon Yang; Jerry Y. Wong; Jeffrey Marks; Peter R. Keswick; David W. Groechel; D. Pinson Ii Jay; Tetsuya Ishikawa; Lawrence C. Lei; Masato Toshima; Gerald Zheyao Yin

Archive | 1992

Plasma processing reactor and process for plasma etching.

Kenneth S. Collins; Craig A. Roderick; John Trow; Chan-Lon Yang; Jerry Yuen-Kui Wong; Jeffrey Marks; Peter R. Keswick; David W. Groechel; Ii Jay D Pinson; Tetsuya Ishikawa; Lawrence Chung-Lai Lei; Masato Toshima

Archive | 1998

Plasma reactor with heated source of a polymer-hardening precursor material

Kenneth S. Collins; Michael R. Rice; David W. Groechel; Gerald Zheyao Yin; Jon Mohn; Craig A. Roderick; Douglas A. Buchberger; Chan-Lon Yang; Yuen-Kui Wong; Jeffrey Marks; Peter R. Keswick

Archive | 1992

Electrostatic chuck for high power plasma processing

Kenneth S. Collins; John Trow; Joshua C. W. Tsui; Craig A. Roderick; Nicolas J. Bright; Jeffrey Marks; Tetsuya Ishikawa

Archive | 1993

Electronically tuned matching networks using adjustable inductance elements and resonant tank circuits

Kenneth S. Collins; John Trow; Craig A. Roderick; D. Pinson Ii Jay; A. Buchberger Ii Douglas; Robert P. Hartlage; Viktor Shel

Archive | 1997

Inductively coupled RF Plasma reactor having an overhead solenoidal antenna and modular confinement magnet liners

Kenneth S. Collins; Michael R. Rice; Douglas A. Buchberger; Craig A. Roderick; Eric Askarinam; Gerhard Schneider; John Trow; Joshua Tsui; Dennis S. Grimard; Gerald Zheyao Yin; Robert W. Wu

Archive | 1993

Electrostatic chuck usable in high density plasma.

Kenneth S. Collins; John Trow; Joshua Chiu-Wing Tsui; Craig A. Roderick; Nicolas J. Bright; Jeffrey Marks; Tetsuya Ishikawa; Jian Ding

Archive | 2000

Plasma reactor using inductive RF coupling, and processes

Kenneth S. Collins; Chan-Lon Yang; Jerry Yuen-Kui Wong; Jeffrey Marks; Peter R. Keswick; David W. Groechel; Craig A. Roderick; John Trow; Tetsuya Ishikawa; D. Pinson Ii Jay; Lawrence Chang-Lai Lei; Masato Toshima; Gerald Zheyao Yin

Archive | 1996

RF tuning method for an RF plasma reactor using frequency servoing and power, voltage, current or DI/DT control

Kenneth S. Collins; Craig A. Roderick; Douglas A. Buchberger; John Trow; Viktor Shel

Archive | 1992

Electronically tuned matching network using predictor-corrector control system

Kenneth S. Collins; John Trow; Craig A. Roderick; D. Pinson Ii Jay; A. Buchberger Ii Douglas

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Collaboration

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Kenneth S. Collins

Applied Materials

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John Trow

Applied Materials

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Douglas A. Buchberger

Applied Materials

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Chan-Lon Yang

Applied Materials

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Jeffrey Marks

Applied Materials

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Michael R. Rice

Applied Materials

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David W. Groechel

Applied Materials

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Peter R. Keswick

Applied Materials

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Gerald Zheyao Yin

Applied Materials

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Tetsuya Ishikawa

University of Tokyo

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