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Featured researches published by D.C. Tsui.


Solid State Communications | 1980

Far infrared emission from plasma oscillations of Si inversion layers

D.C. Tsui; E. Gornik; R.A. Logan

Abstract We observed narrow-band far infrared emission from Si-MOSFETs with metallic gratings fabricated on the optically semitransparent gate. The gate voltage dependence of the emission frequency, analyzed by a magnetic field tuned detector, shows that it results from radiative decay of the two-dimensional metallic grating.


Solid State Communications | 1983

Observation of oscillatory linewidth in the cyclotron-resonance of GaAs-AlxGa1-xAs heterostructures

Th. Englert; J.C. Maan; Ch. Uihlein; D.C. Tsui; A. C. Gossard

Abstract The linewidth of the far infrared cyclotron resonance in the 2-D electron gas in GaAs-AlxGa1−xAs heterojunctions show oscillations between 0.070 and 0.32 T as a function of the resonance magnetic field at 5 K. With increasing temperature the maximum linewidth decreases, whereas the minimum increases. This oscillatory behavior is shown to be correlated with the filling factor of the Landau levels.


Surface Science | 1978

High frequency conductivity in silicon inversion layers: Drude relaxation, 2D plasmons and minigaps in a surface superlattice

D.C. Tsui; S.J. Allen; R.A. Logan; Avid Kamgar; S.N. Coppersmith

Abstract We review experiments that measure the inversion layer conductivity as a function of frequency in the far infrared. Drude relaxation is considered prototypic. 2D plasmons excited by a spatially modulated infrared field are discussed, and the direct observation of a minigap produced by a surface superlattice is presented.


Solid State Communications | 1977

High field magnetoconductivity of Si inversion layers

D.C. Tsui

Abstract The transverse magnetoconductivity (σχχ) of electron inversion layers on (100) Si is measured in magnetic fields up to 220 kG at temperatures from 4.2 to 1.6 K. The dependence of σχχ on T, H, and the electric field along the inversion layer suggests that immobile electrons between two Landau subbands are to a large extent localized out of the top of the lower subband. Fine structure, which may be indicative of inhomogeneities of electronic origin, is observed in σχχ vs electron density.


Applied Physics Letters | 1981

Transport properties of GaAs‐AlxGa1−x As heterojunction field‐effect transistors

D.C. Tsui; A. C. Gossard; G. Kaminsky; W. Wiegmann

We report low field transport properties of n‐channel GaAs‐AlxGa1−x As heterojunction field‐effect transistors. Studies of the Shubnikov‐de Haas effect confirm that the devices are insulated‐gate field‐effect transistors, with AlxGa1−x As as the gate insulator. The channel mobility increases with density following μ2∼ nγ, with γ varying from 0.45 to 1.4. μ = 1.2×105 cm2/V sec at 78 K and 3.6×105 cm2/V sec at 4.2 K are observed at n∼4×1011/cm2.


Solid State Communications | 1977

Far infrared resonant magnetoabsorption in low density Si inversion layers

T. A. Kennedy; R. J. Wagner; B.D. McCombe; D.C. Tsui

The density and temperature dependences of high frequency/resonant field (61.3 cm-1, 11T) resonant magnetoabsorption data in (100) Si inversion layers at low densities are strikingly different from those observed at lower frequencies/fields. The results, which include a dramatic resonant line narrowing at high fields, are discussed in light of single-electron localization and the possibility of a cooperative electronic transition assisted by the large magnetic field.


Solid State Communications | 1976

Valley degeneracy of electrons in accumulation and inversion layers on Si (111) surface

D.C. Tsui; G. Kaminsky

Abstract We report three experiments exploring the valley degeneracy of electrons in n-channel MOSFETs on the Si (111) surface. The results suggest that the reduction of the valley degeneracy from 6 to 2 can be explained by the existence of highly stressed domains at the Si-SiO2 interface. The stress, being much too large for those known from thermal mismatch between Si-SiO2, is attributed to mismatch between the Si-Si bonds in Si and the Si-O-Si bonds in SiO2.


Surface Science | 1982

Zero resistance state and origin of the quantized Hall effect in two-dimensional electron systems

H. L. Stormer; D.C. Tsui; A. C. Gossard

We investigate 2D electron systems in high magnetic fields in the region where the Permi energy is pinned between Landau levels. In GaAs (AlGaAs heterojunctions we find vanishing resistanceρxx along the current path and determine an upper limit of ρxx⩽5×10−7Ω□at 1.23 K In MOSFETs we observe a correlation between sample mobility and stability of the quantized Hall resistance ρxy. For high mobility specimens the plateau width of ρxyincreases with decreasing mobility. If the Fermi energy is kept between the same Landau levels a linear dependence between magnetic field and plateau width is found. These results are discussed in terms of theoretical considerations based on the existence of magnetic field induced localized states.


Solid State Communications | 1971

Effect of a parallel magnetic field on surface quantization

D.C. Tsui

Abstract Using electron tunneling techniques, we have observed the effect of a parallel magnetic field on surface quantization, as predicted by Stern and Howard. This observation allows for the first time a direct determination of ( 2 > − 2 ) 1 2 , which is a measure of the spread of the quantized state wave function.


Solid State Communications | 1981

Far infrared emission from 2D electrons at the GaAsAlxGa1-xAs interface

E. Gornik; R. Schawarz; D.C. Tsui; A. C. Gossard; W. Wiegmann

Abstract We report the first observation of far infrared emission resulting from radiative decay of intersubband excitations and cyclotron excitations of the two-dimensional electrons in GaAs Al x Ga 1-x As heterostructures.

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R. J. Wagner

United States Naval Research Laboratory

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B.D. McCombe

United States Naval Research Laboratory

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T. A. Kennedy

United States Naval Research Laboratory

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