D. Sanfilippo

Electroluminescence at 1.54 μm in Er-doped Si nanocluster-based devices

The electroluminescence (EL) properties of Er-doped Si nanoclusters (NC) embedded in metal–oxide–semiconductor devices are investigated. Due to the presence of Si NC dispersed in the SiO2 matrix, an efficient carrier injection occurs and Er is excited, producing an intense 1.54 μm room temperature EL. The EL properties as a function of the current density, temperature, and time have been studied in detail. We have also estimated the excitation cross section for Er under electrical pumping, finding a value of ∼1×10−14 cm2. This value is two orders of magnitude higher than the effective excitation cross section of Er ions through Si NC under optical pumping. In fact, quantum efficiencies of ∼1% are obtained at room temperature in these devices.

Excitation and de-excitation properties of silicon quantum dots under electrical pumping

In this work, the stationary and time-resolved electroluminescence (EL) properties of Si quantum dots embedded within a metal–oxide–semiconductor device are investigated. In particular, we measured the excitation cross section of Si nanocrystals under electrical pumping, finding a value of 4.7×10−14 cm2 which is two orders of magnitude higher with respect to the excitation cross section under 488 nm optical pumping. We also studied the radiative and nonradiative decay processes occurring in these devices by measuring the time evolution of the EL signal. We demonstrate that the mechanism responsible for the emission is the same under both electrical and optical pumping. The overall quantum efficiency of the electrical pumping is estimated to be two orders of magnitude higher than the quantum efficiency for optical pumping in all the studied temperature ranges.

Electroluminescence and transport properties in amorphous silicon nanostructures

We report the results of a detailed study on the structural, electrical and optical properties of light emitting devices based on amorphous Si nanostructures. Amorphous nanostructures may constitute an interesting system for the monolithic integration of optical and electrical functions in Si ULSI technology. In fact, they exhibit an intense room temperature electroluminescence (EL), with the advantage of being formed at a temperature of 900 °C, while at least 1100 °C is needed for the formation of Si nanocrystals. Optical and electrical properties of amorphous Si nanocluster devices have been studied in the temperature range between 30 and 300 K. The EL is seen to have a bell-shaped trend as a function of temperature with a maximum at around 60 K. The efficiency of these devices is comparable to that found in devices based on Si nanocrystals, although amorphous nanostructures exhibit peculiar working conditions (very high current densities and low applied voltages). Time resolved EL measurements demonstrate the presence of a short lifetime, only partially due to the occurrence of non-radiative phenomena, since the very small amorphous clusters formed at 900 °C are characterized by a short radiative lifetime. By forcing a current through the device a phenomenon of charge trapping in the Si nanostructures has been observed. Trapped charges affect luminescence through an Auger-type non-radiative recombination of excitons. Indeed, it is shown that unbalanced injection of carriers (electrons versus holes) is one of the main processes limiting luminescence efficiency. These data will be reported and the advantages and limitations of this approach will be discussed.

Silicon Photomultiplier Technology at STMicroelectronics

In this paper we present the results of the first electrical and optical characterization performed on 1 mm2 total area Silicon Photomultipliers (SiPM) fabricated in standard silicon planar technology at the STMicroelectronics Catania R&D clean room facility. The device consists of 289 microcells and has a geometrical fill factor of 48%. Breakdown voltage, gain, dark noise rate, crosstalk, photon detection efficiency and linearity have been measured in our laboratories. The optical characterization has been performed by varying the temperature applied to the device. The results shown in the manuscript demonstrate that the device already exhibits relevant features in terms of low dark noise rate and inter-pixel crosstalk probability, high photon detection efficiency, good linearity and single photoelectron resolution. These characteristics can be considered really promising in view of the final application of the photodetector in the Positron Emission Tomography (PET).

Electroluminescence properties of light emitting devices based on silicon nanocrystals

Abstract We have fabricated MOS devices where the dielectric layer consists of a substoichiometric SiO x (x thin film, annealed at 1100°C for 1 h to induce the separation of the Si and SiO 2 phases, with the formation of silicon nanocrystals (nc) embedded in the insulating matrix. We have studied the electroluminescence (EL) properties of such devices as a function of the current density and of the temperature. We have evaluated the excitation cross section of Si nc under electrical pumping at room temperature and at low temperature (12 K ) . Moreover, we have used the experimental EL intensities and decay times to evaluate the radiative rate as a function of the temperature.

Timing Performances of Large Area Silicon Photomultipliers Fabricated at STMicroelectronics

In this paper the results of charge and timing resolution characterization realized at Fermi National Accelerator Laboratory (Fermilab) on 3.5 × 3.5 mm2 Silicon PhotoMultipliers fabricated at STMicroelectronics Catania R&D clean room facilities are presented. The device consists of 4900 microcells and has a geometrical fill factor of 36%. Timing measurements were realized at different wavelengths by varying the overvoltage and the temperature applied to the photodetector. The results shown in this manuscript demonstrate that the device, in spite of its large area, exhibits relevant features in terms of low dark current density, fast timing and very good single photoelectron resolution. All these characteristics can be considered very appealing in view of the utilization of this technology in applications requiring detectors with high timing and energy resolution performances.

Characterization of a Novel 100-Channel Silicon Photomultiplier—Part I: Noise

In this paper, we present the results of the first noise characterization performed on our novel 100-channel silicon photomultiplier. We have improved our previous single-photon avalanche photodiode technology in order to set up a working device with outstanding features in terms of single-photon resolving power up to R = 45, timing resolution down to 100 ps, and photon-detection efficiency of 14% at 420 nm. Tests were performed, and features were measured, as a function of the bias voltage and of the incident photon flux. A dedicated data-analysis procedure was developed that allows one to extract at once the relevant parameters and quantify the noise.

Characterization of a Novel 100-Channel Silicon Photomultiplier—Part II: Charge and Time

In this paper, we present the results of the charge and time characterization performed on our novel 100-channel silicon photomultiplier. We have improved our previous single-photon-avalanche-diode technology in order to set up a working device with outstanding features in terms of single-photon resolving power up to R = 45, a timing resolution down to 100 ps, and photon-detection efficiency of 14% at 420 nm. Tests were performed, and features were measured as a function of the bias voltage and of the incident photon flux. A dedicated data analysis procedure was developed that allows to extract at once the relevant parameters from the amplitude spectra and to determine the timing features.

Photonic-crystal silicon-nanocluster light-emitting device

We report on enhanced light extraction from a light-emitting device based on amorphous silicon nanoclusters, suitable for very-large-scale integration, and operating at room temperature. Standard low-cost optical lithography is employed to fabricate a two-dimensional photonic crystal onto the device. We measured a vertical emission with the extracted radiation enhanced by over a factor of 4, without the aid of any buried reflector. These achievements demonstrate that a cost-effective exploitation of photonic crystals is indeed within the reach of semiconductor industry and open the way to a new generation of nanostructured silicon devices in which photonic and electronic functions are integrated together.

Dark Current in Silicon Photomultiplier Pixels: Data and Model

The dark current behavior of the pixels forming the Si photomultiplier as a function of the applied overvoltage and operation temperature is studied. The data are modeled by assuming that dark current is caused by current pulses triggered by events of diffusion of single minority carriers injected from the peripheral boundaries of the active area depletion layer and by thermal emission of carriers from Shockley–Read–Hall defects in the active area depletion layer.