Dae-hyuk Chung

Semiconductor device having chamfered silicide layer and method for manufacturing the same

Method for manufacturing cylindrical storage electrode of semiconductor device

Cleaning solution and method of cleaning a semiconductor device using the same

Cleaning solutions for removing contaminants from the surfaces of semiconductor substrates and cleaning methods using the same

Wiring structure of a semiconductor device and method of forming the same

Methods of manufacturing semiconductor devices having chamfered silicide layers therein

Slurry composition for a chemical mechanical polishing process and method of manufacturing a semiconductor device using the slurry composition

Cleaning solution including aqueous ammonia solution, acetic acid and deionized water for integrated circuit devices and methods of cleaning integratedd circuit devices using the same

Apparatus and method of etching a semiconductor substrate

Apparatus and method for removing a photoresist structure from a substrate