In-seak Hwang

Shallow trench isolation type semiconductor device and method of forming the same

Methods of forming trench isolation regions having recess-inhibiting layers therein that protect against overetching

Corrosion-inhibiting cleaning compositions for metal layers and patterns on semiconductor substrates

Trench isolation regions having recess-inhibiting layers therein that protect against overetching

Method of cleaning a semiconductor device and method of manufacturing a semiconductor device using the same

One-cylinder stack capacitor and method for fabricating the same

Method of forming a contact hole of a semiconductor device

Cylindrical capacitors having a stepped sidewall and methods for fabricating the same

Method for drying a wafer and apparatus for performing the same

Methods of forming a silicon oxide layer and methods of forming an isolation layer