Dae-Jin Park

P‐164: Single Cell Gap Transflective Mode for Vertically Aligned Negative Nematic Liquid Crystals

Single cell gap transflective liquid crystal display mode with vertically aligned negative liquid crystal was developed. Reflectance curve as a function of voltage matched exactly with transmittance curve. Threshold voltage in reflectance curve was around 2.0V, as in transmittance curve, and the voltage for maximum reflectance was around 4.5V∼5.0V, which gave also the maximum transmittance. Reflective region was divided into two parts. First reflective part was driven by the voltage supplied by switching transistor directly, while the second reflective part was driven by the voltage lower than that of first part using the voltage-dividing capacitor connected to switching transistor in series. Normal 8 mask-count process was applied to fabrication of real panels. No special optical film or extra driving circuit was required.

Fabrication of an all‐layer‐printed TFT‐LCD device via large‐area UV imprinting lithography

Abstract Nanoimprint lithography (NIL) using ultraviolet (UV) rays is a technique in which unconventional lithographic patterns are formed on a substrate by curing a suitable liquid resist in contact with a transparent patterned mold, then releasing the freshly patterned material. Here, various solutions are introduced to achieve sufficient overlay accuracy and to overcome the technical challenges in resist patterning via UV imprinting. Moreover, resist patterning of all the layers in TFT and of the BM layer in CF was carried out using UV imprinting lithography to come up with a 12.1‐inch TFT‐LCD panel with a resolution of 1280×800 lines (125 ppi).