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Dive into the research topics where Daniel D. Koleske is active.

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Featured researches published by Daniel D. Koleske.


Nature | 2004

Energy-transfer pumping of semiconductor nanocrystals using an epitaxial quantum well

Marc Achermann; Melissa A. Petruska; Simon Kos; D. L. Smith; Daniel D. Koleske; Victor I. Klimov

As a result of quantum-confinement effects, the emission colour of semiconductor nanocrystals can be modified dramatically by simply changing their size. Such spectral tunability, together with large photoluminescence quantum yields and high photostability, make nanocrystals attractive for use in a variety of light-emitting technologies—for example, displays, fluorescence tagging, solid-state lighting and lasers. An important limitation for such applications, however, is the difficulty of achieving electrical pumping, largely due to the presence of an insulating organic capping layer on the nanocrystals. Here, we describe an approach for indirect injection of electron–hole pairs (the electron–hole radiative recombination gives rise to light emission) into nanocrystals by non-contact, non-radiative energy transfer from a proximal quantum well that can in principle be pumped either electrically or optically. Our theoretical and experimental results indicate that this transfer is fast enough to compete with electron–hole recombination in the quantum well, and results in greater than 50 per cent energy-transfer efficiencies in the tested structures. Furthermore, the measured energy-transfer rates are sufficiently large to provide pumping in the stimulated emission regime, indicating the feasibility of nanocrystal-based optical amplifiers and lasers based on this approach.


Applied Physics Letters | 2007

Effect of dislocation density on efficiency droop in GaInN/GaN light-emitting diodes

Martin F. Schubert; Sameer Chhajed; Jong Kyu Kim; E. Fred Schubert; Daniel D. Koleske; Mary H. Crawford; Stephen R. Lee; Arthur J. Fischer; Gerald Thaler; M. Banas

Measurements of light-output power versus current are performed for GaInN∕GaN light-emitting diodes grown on GaN-on-sapphire templates with different threading dislocation densities. Low-defect-density devices exhibit a pronounced efficiency peak followed by droop as current increases, whereas high-defect-density devices show low peak efficiencies and little droop. The experimental data are analyzed with a rate equation model to explain this effect. Analysis reveals that dislocations do not strongly impact high-current performance; instead they contribute to increased nonradiative recombination at lower currents and a suppression of peak efficiency. The characteristics of the dominant recombination mechanism at high currents are consistent with processes involving carrier leakage.


Applied Physics Letters | 2009

Internal quantum efficiency and nonradiative recombination coefficient of GaInN/GaN multiple quantum wells with different dislocation densities

Qi Dai; Martin F. Schubert; Min-Ho Kim; Jong Kyu Kim; E. F. Schubert; Daniel D. Koleske; Mary H. Crawford; Stephen R. Lee; Arthur J. Fischer; Gerald Thaler; M. Banas

Room-temperature photoluminescence measurements are performed on GaInN/GaN multiple quantum wells grown on GaN-on-sapphire templates with different threading-dislocation densities. The internal quantum efficiencies as a function of carrier concentration and the non-radiative coefficients are obtained.


Applied Physics Letters | 2005

Effect of threading dislocations on the Bragg peakwidths of GaN, AlGaN, and AlN heterolayers

Stephen R. Lee; A. M. West; A. A. Allerman; K. E. Waldrip; D. M. Follstaedt; Paula Polyak Provencio; Daniel D. Koleske; C. R. Abernathy

We develop a reciprocal-space model that describes the (hkl) dependence of the broadened Bragg peakwidths produced by x-ray diffraction from a dislocated epilayer. We compare the model to experiments and find that it accurately describes the peakwidths of 16 different Bragg reflections in the [010] zone of both GaN and AlN heterolayers. Using lattice-distortion parameters determined by fitting the model to selected reflections, we estimate threading-dislocation densities for seven different GaN and AlGaN samples and find improved agreement with transmission electron microscopy measurements.


Applied Physics Letters | 2002

Improved brightness of 380 nm GaN light emitting diodes through intentional delay of the nucleation island coalescence

Daniel D. Koleske; Arthur J. Fischer; A. A. Allerman; Christine C. Mitchell; Karen Charlene Cross; S. R. Kurtz; Jeffrey J. Figiel; Kristine Wanta Fullmer; William G. Breiland

Ultraviolet light emitting diodes (LEDs) have been grown using metalorganic vapor phase epitaxy, while monitoring the 550 nm reflected light intensity. During nucleation of GaN on sapphire, the transition from three-dimensional (3D) grain growth to two-dimensional (2D) coalesced growth was intentionally delayed in time by lowering the NH3 flow during the initial high temperature growth. Initially, when the reflectance signal is near zero, the GaN film is rough and composed of partly coalesced 3D grains. Eventually, the reflected light intensity recovers as the 2D morphology evolves. For 380 nm LEDs grown on 3D nucleation layers, we observe increased light output. For LEDs fabricated on GaN films with a longer recovery time an output power of 1.3 mW at 20 mA current was achieved.


Applied Physics Letters | 2010

Carrier recombination mechanisms and efficiency droop in GaInN/GaN light-emitting diodes

Qi Dai; Qifeng Shan; Jing Wang; Sameer Chhajed; Jaehee Cho; E. Fred Schubert; Mary H. Crawford; Daniel D. Koleske; Min-Ho Kim; Yongjo Park

We model the carrier recombination mechanisms in GaInN/GaN light-emitting diodes as R=An+Bn2+Cn3+f(n), where f(n) represents carrier leakage out of the active region. The term f(n) is expanded into a power series and shown to have higher-than-third-order contributions to the recombination. The total third-order nonradiative coefficient (which may include an f(n) leakage contribution and an Auger contribution) is found to be 8×10−29 cm6 s−1. Comparison of the theoretical ABC+f(n) model with experimental data shows that a good fit requires the inclusion of the f(n) term.


Optics Express | 2011

Optical performance of top-down fabricated InGaN/GaN nanorod light emitting diode arrays.

Qiming Li; Karl R. Westlake; Mary H. Crawford; Stephen R. Lee; Daniel D. Koleske; Jeffery J. Figiel; Karen Charlene Cross; Saeed Fathololoumi; Zetian Mi; George T. Wang

Vertically aligned InGaN/GaN nanorod light emitting diode (LED) arrays were created from planar LED structures using a new top-down fabrication technique consisting of a plasma etch followed by an anisotropic wet etch. The wet etch results in straight, smooth, well-faceted nanorods with controllable diameters and removes the plasma etch damage. 94% of the nanorod LEDs are dislocation-free and a reduced quantum confined Stark effect is observed due to reduced piezoelectric fields. Despite these advantages, the IQE of the nanorod LEDs measured by photoluminescence is comparable to the planar LED, perhaps due to inefficient thermal transport and enhanced nonradiative surface recombination.


Applied Physics Letters | 2009

The origin of the high diode-ideality factors in GaInN/GaN multiple quantum well light-emitting diodes

Di Zhu; Jiuru Xu; Ahmed N. Noemaun; Jong Kyu Kim; E. Fred Schubert; Mary H. Crawford; Daniel D. Koleske

We report on a significant decrease in the diode-ideality factor of GaInN/GaN multiple quantum well light-emitting diodes (LEDs), from 5.5 to 2.4, as Si-doping is applied to an increasing number of quantum barriers (QBs). The minimum ideality factor of 2.4 is obtained when all QBs are doped. It is shown that polarization-induced triangular band profiles of the undoped QBs are the major cause of the high ideality factors in GaInN/GaN LEDs. Numerical simulations show excellent agreement with the measured ideality factor value and its dependence on QB doping.


Applied Physics Letters | 2004

In situ measurements of the critical thickness for strain relaxation in AlGaN∕GaN heterostructures

Stephen R. Lee; Daniel D. Koleske; Karen Charlene Cross; Jerrold A. Floro; K. E. Waldrip; A. Wise; S. Mahajan

Using in situ wafer-curvature measurements of thin-film stress, we determine the critical thickness for strain relaxation in AlxGa1−xN∕GaN heterostructures with 0.14⩽x⩽1. The surface morphology of selected films is examined by atomic force microscopy. Comparison of these measurements with critical-thickness models for brittle fracture and dislocation glide suggests that the onset of strain relaxation occurs by surface fracture for all compositions. Misfit-dislocations follow initial fracture, with slip-system selection occurring under the influence of composition-dependent changes in surface morphology.


Applied Physics Letters | 2010

Plasmonic nanoparticle enhanced photocurrent in GaN/InGaN/GaN quantum well solar cells

Imogen M. Pryce; Daniel D. Koleske; Arthur J. Fischer; Harry A. Atwater

We demonstrate enhanced external quantum efficiency and current-voltage characteristics due to scattering by 100 nm silver nanoparticles in a single 2.5 nm thick InGaN quantum well photovoltaic device. Nanoparticle arrays were fabricated on the surface of the device using an anodic alumina template masking process. The Ag nanoparticles increase light scattering, light trapping, and carrier collection in the III-N semiconductor layers leading to enhancement of the external quantum efficiency by up to 54%. Additionally, the short-circuit current in cells with 200 nm p-GaN emitter regions is increased by 6% under AM 1.5 illumination. AFORS-Het simulation software results were used to predict cell performance and optimize emitter layer thickness.

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Mary H. Crawford

Sandia National Laboratories

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Arthur J. Fischer

Sandia National Laboratories

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Stephen R. Lee

Sandia National Laboratories

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George T. Wang

Sandia National Laboratories

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Jonathan J. Wierer

Sandia National Laboratories

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Michael E. Coltrin

Sandia National Laboratories

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Ping Lu

Sandia National Laboratories

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Qiming Li

University of New Mexico

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E. Fred Schubert

Rensselaer Polytechnic Institute

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