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Dive into the research topics where Daniel Kraehmer is active.

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Featured researches published by Daniel Kraehmer.


Journal of Micro-nanolithography Mems and Moems | 2005

Polarization influence on imaging

Michael Totzeck; Paul Gräupner; Tilmann Heil; Aksel Göhnermeier; Olaf Dittmann; Daniel Kraehmer; Vladimir Kamenov; Johannes Ruoff; Donis G. Flagello

We give a general introduction into polarized imaging and report on a Jones pupil approach for a complete evaluation of the resulting optical performance. The Jones pupil assigns a Jones matrix to each point of the exit pupil, describing the impact of both the global phase and the polarization on imaging. While we already can learn much about the optical system by taking a close look at the Jones pupil-and starting imaging simulations from it-a quantitative assessment is necessary for a complete evaluation of imaging. To do this, we generalize the concept of scalar Zernike aberrations to Jones-Zernike aberrations by expansion of the Jones pupil into vector polynomials. The resulting method is nonparaxial, i.e., the effect of the polarization-dependent contrast loss for high numerical apertures is included. The aberrations of the Jones matrix pupil are a suitable tool to identify the main drivers determining polarization performance. Furthermore, they enable us to compare the polarized and unpolarized performance of such a characterized lithographic system.


Archive | 2008

Microlithographic exposure method as well as a projection exposure system for carrying out the method

Toralf Gruner; Daniel Kraehmer; Michael Totzeck; Johannes Wangler; Markus Brotsack; Nils Dieckmann; Aksel Goehnermeier; Markus Schwab; Damian Fiolka; Markus Zenzinger


Archive | 2003

Microlithographic projection exposure

Toralf Gruner; Daniel Kraehmer; Michael Totzeck; Johannes Wangler; Markus Brotsack; Nils Dieckmann; Aksel Goehnermeier; Markus Schwab


Archive | 2004

Optical system with birefringent optical elements

Damian Fiolka; Olaf Dittmann; Michael Totzeck; Nils Dieckmann; Jess Koehler; Toralf Gruner; Daniel Kraehmer


Archive | 2014

Microlithography projection objective

Heiko Feldmann; Daniel Kraehmer; Jean-Claude Perrin; Julian Kaller; Aurelian Dodoc; Vladimir Kamenov; Olaf Conradi; Toralf Gruner; Thomas Okon; Alexander Epple


Archive | 2003

Projection exposure system

Karl-Heinz Schuster; Wilhelm Ulrich; Toralf Gruner; Daniel Kraehmer; Wolfgang Singer; Alexander Epple; Helmut Beierl; Reiner Garreis


Archive | 2009

METHODS FOR PRODUCING AN ANTIREFLECTION SURFACE ON AN OPTICAL ELEMENT, OPTICAL ELEMENT AND ASSOCIATED OPTICAL ARRANGEMENT

Christoph Zaczek; Gennady Fedosenko; Wolfgang Henschel; Daniel Kraehmer


Archive | 2003

Objective lens consisting of crystal lenses

Aksel Goehnermeier; Alexandra Pazidis; Birgit Mecking; Christoph Zaczek; Daniel Kraehmer


Archive | 2006

Optical element, in particular for an objective or an illumination system of a microlithographic projection exposure apparatus

Ralf Mueller; Olaf Dittmann; Michael Totzeck; Daniel Kraehmer; Christoph Zaczek; Karl-Heinz Schuster


Archive | 2005

Method of determining lens materials for a projection exposure apparatus

Vladimir Kamenov; Daniel Kraehmer; Michael Totzeck; Toralf Gruner; Aurelian Dodoc

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