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Dive into the research topics where Olaf Dittmann is active.

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Featured researches published by Olaf Dittmann.


Journal of Micro-nanolithography Mems and Moems | 2005

Polarization influence on imaging

Michael Totzeck; Paul Gräupner; Tilmann Heil; Aksel Göhnermeier; Olaf Dittmann; Daniel Kraehmer; Vladimir Kamenov; Johannes Ruoff; Donis G. Flagello

We give a general introduction into polarized imaging and report on a Jones pupil approach for a complete evaluation of the resulting optical performance. The Jones pupil assigns a Jones matrix to each point of the exit pupil, describing the impact of both the global phase and the polarization on imaging. While we already can learn much about the optical system by taking a close look at the Jones pupil-and starting imaging simulations from it-a quantitative assessment is necessary for a complete evaluation of imaging. To do this, we generalize the concept of scalar Zernike aberrations to Jones-Zernike aberrations by expansion of the Jones pupil into vector polynomials. The resulting method is nonparaxial, i.e., the effect of the polarization-dependent contrast loss for high numerical apertures is included. The aberrations of the Jones matrix pupil are a suitable tool to identify the main drivers determining polarization performance. Furthermore, they enable us to compare the polarized and unpolarized performance of such a characterized lithographic system.


Optical Microlithography XVIII | 2005

How to describe polarization influence on imaging (Invited Paper)

Michael Totzeck; Paul Gräupner; Tilmann Heil; Aksel Göhnermeier; Olaf Dittmann; Daniel Krähmer; Vladimir Kamenov; Johannes Ruoff; Donis G. Flagello

We give a general introduction into polarized imaging and report on a Jones-pupil approach for a complete evaluation of the resulting optical performance. The Jones pupil assigns a Jones matrix to each point of the exit pupil describing the impact of both the global phase and the polarization on imaging. While we can learn already a lot about the optical system by taking a close look at the Jones pupil - and starting imaging simulations from it - a quantitative assessment is necessary for a complete evaluation of imaging. To do this, we generalize the concept of scalar Zernike aberrations to Jones-Zernike aberrations by expansion of the Jones pupil into vector polynomials. The resulting method is non-paraxial, i.e. the effect of the polarization dependent contrast loss for high numerical apertures is included. The aberrations of the Jones-matrix pupil are a suitable tool to identify the main drivers determining the polarization performance. Furthermore, they enable us to compare the polarized and the unpolarized performance of the such characterized lithographic system.


Archive | 2004

Optical system with birefringent optical elements

Damian Fiolka; Olaf Dittmann; Michael Totzeck; Nils Dieckmann; Jess Koehler; Toralf Gruner; Daniel Kraehmer


Archive | 2005

Arrangement of optical elements in a microlithographic projection exposure apparatus

Michael Totzeck; Gerhart Fuerter; Olaf Dittmann; Karl-Heinz Schuster; David Shafer; Susanne Beder


Archive | 2006

Projection exposure system, method for manufacturing a micro-structured structural member by the aid of such a projection exposure system and polarization-optical element adapted for use in such a system

Hans-Juergen Mann; Wolfgang Singer; Toralf Gruner; Olaf Dittmann; Michael Totzeck


Archive | 2002

DELAY ELEMENT MADE FROM A CUBIC CRYSTAL AND CORRESPONDING OPTICAL SYSTEM

Juergen Hartmaier; Damian Fiolka; Markus Zenzinger; Birgit Mecking; Olaf Dittmann; Toralf Gruner; Vladimir Kamenov; Martin Brunotte


Archive | 2006

Optical element, in particular for an objective or an illumination system of a microlithographic projection exposure apparatus

Ralf Mueller; Olaf Dittmann; Michael Totzeck; Daniel Kraehmer; Christoph Zaczek; Karl-Heinz Schuster


Archive | 2004

Retardation element made from cubic crystal and an optical system therewith

Juergen Hartmaier; Damian Fiolka; Markus Zenzinger; Birgit Mecking; Olaf Dittmann; Toralf Gruner; Vladimir Kamenov; Martin Brunotte


Archive | 2006

Projection exposure apparatus and method for operating the same

Toralf Gruner; Olaf Conradi; Nils Dieckmann; Markus Schwab; Olaf Dittmann; Michael Totzeck; Daniel Kraehmer; Vladimir Kamenov


Archive | 2012

Illumination system for micro-lithographic projection exposure apparatus, has several light deflection elements which generate two respective light spots whose intensity differs from each other by the polarization state of light spots

Damian Fiolka; Olaf Dittmann; Ralf Müller; Gundula Weiss; András G. Major; Martin Vogt; Jörg Zimmermann

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