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Dive into the research topics where David N. Hutchison is active.

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Featured researches published by David N. Hutchison.


IEEE\/ASME Journal of Microelectromechanical Systems | 2010

Carbon Nanotubes as a Framework for High-Aspect-Ratio MEMS Fabrication

David N. Hutchison; Nicholas B. Morrill; Quentin T. Aten; Brendan Turner; Brian D. Jensen; Larry L. Howell; Richard Vanfleet; Robert C. Davis

A class of carbon-nanotube (CNT) composite materials was developed to take advantage of the precise high-aspect-ratio shape of patterned vertically grown nanotube forests. These patterned forests were rendered mechanically robust by chemical vapor infiltration and released by etching an underlying sacrificial layer. We fabricated a diverse variety of functional MEMS devices, including cantilevers, bistable mechanisms, and thermomechanical actuators, using this technique. A wide range of chemical-vapor-depositable materials could be used as fillers; here, we specifically explored infiltration by silicon and silicon nitride. The CNT framework technique may enable high-aspect-ratio MEMS fabrication from a variety of materials with desired properties such as high-temperature stability or robustness. The elastic modulus of the silicon-nanotube and silicon nitride-nanotube composites is dominated by the filler material, but they remain electrically conductive, even when the filler (over 99% of the composites mass) is insulating.


TRANSDUCERS 2009 - 2009 International Solid-State Sensors, Actuators and Microsystems Conference | 2009

High aspect ratio microelectromechanical systems: A versatile approach using carbon nanotubes as a framework

David N. Hutchison; Quentin T. Aten; Brendan Turner; Nicholas B. Morrill; Larry L. Howell; Brian D. Jensen; Robert C. Davis; Richard Vanfleet

We recently developed a fabrication process for carbon nanotube templated MEMS. The fabrication process involves growing a three dimensional pattern from carbon nanotube forests and filling that forest by chemical vapor infiltration to make a solid structure. This templating process allows us to fabricate extremely high aspect ratio microscale structures from a wide variety of materials. The nanotube structures can be hundreds of microns tall with lateral pattern dimensions down to a few microns. The chemical vapor infiltration has been shown with silicon and silicon nitride but could be extended to many other materials. In this paper, we investigate the microstructure of the filling material and extend the process to the fabrication of comb actuators.


Advanced Functional Materials | 2011

Carbon-Nanotube-Templated Microfabrication of Porous Silicon-Carbon Materials with Application to Chemical Separations

Jun Song; David S. Jensen; David N. Hutchison; Brendan Turner; Taylor Wood; Andrew E. Dadson; Michael A. Vail; Matthew R. Linford; Richard Vanfleet; Robert C. Davis


Archive | 2008

X-ray radiation window with carbon nanotube frame

Robert C. Davis; Richard Vanfleet; David N. Hutchison


Archive | 2008

Carbon nanotube mems assembly

Robert C. Davis; Richard Vanfleet; David N. Hutchison


Archive | 2008

Carbon nanotube assembly

Robert C. Davis; Richard Vanfleet; David N. Hutchison


Archive | 2008

X-ray window with carbon nanotube frame

Robert C. Davis; Richard Vanfleet; David N. Hutchison


Bulletin of the American Physical Society | 2011

Graphene rubber band: suspended graphene sheets with controlled uniaxial strain

Zenghui Wang; David N. Hutchison; Carlos Ruiz-Vargas; Pinshane Y. Huang; Sunil A. Bhave; David A. Muller; Jiwoong Park


Archive | 2008

Ensemble de nanotubes de carbone

Robert C. Davis; Richard Vanfleet; David N. Hutchison


Archive | 2008

Kohlenstoff-nanorohr-baugruppe

Robert C. Davis; David N. Hutchison; Richard Vanfleet

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Brendan Turner

Brigham Young University

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