David N. Mueller
Forschungszentrum Jülich
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Publication
Featured researches published by David N. Mueller.
Nature Communications | 2016
Christoph Baeumer; Christoph Schmitz; Astrid Marchewka; David N. Mueller; Richard Valenta; Johanna Hackl; Nicolas Raab; Steven P. Rogers; M. Imtiaz Khan; Slavomír Nemšák; Moonsub Shim; Stephan Menzel; Claus M. Schneider; Rainer Waser; Regina Dittmann
The continuing revolutionary success of mobile computing and smart devices calls for the development of novel, cost- and energy-efficient memories. Resistive switching is attractive because of, inter alia, increased switching speed and device density. On electrical stimulus, complex nanoscale redox processes are suspected to induce a resistance change in memristive devices. Quantitative information about these processes, which has been experimentally inaccessible so far, is essential for further advances. Here we use in operando spectromicroscopy to verify that redox reactions drive the resistance change. A remarkable agreement between experimental quantification of the redox state and device simulation reveals that changes in donor concentration by a factor of 2–3 at electrode-oxide interfaces cause a modulation of the effective Schottky barrier and lead to >2 orders of magnitude change in device resistance. These findings allow realistic device simulations, opening a route to less empirical and more predictive design of future memory cells.
APL Materials | 2017
Michael Andrä; Filip Dvořák; Mykhailo Vorokhta; Slavomír Nemšák; Vladimír Matolín; Claus M. Schneider; Regina Dittmann; Felix Gunkel; David N. Mueller; Rainer Waser
In this study, we investigated the electronic surface structure of donor-doped strontium titanate. Homoepitaxial 0.5 wt. % donor-doped SrTiO3 thin films were analyzed by in situ near ambient pressure X-ray photoelectron spectroscopy at a temperature of 770 K and oxygen pressures up to 5 mbar. Upon exposure to an oxygen atmosphere at elevated temperatures, we observed a rigid binding energy shift of up to 0.6 eV towards lower binding energies with respect to vacuum conditions for all SrTiO3 core level peaks and the valence band maximum with increasing oxygen pressure. The rigid shift is attributed to a relative shift of the Fermi energy towards the valence band concomitant with a negative charge accumulation at the surface, resulting in a compensating electron depletion layer in the near surface region. Charge trapping effects solely based on carbon contaminants are unlikely due to their irreversible desorption under the given experimental conditions. In addition, simple reoxygenation of oxygen vacancies c...
Advanced Materials | 2018
Thomas Heisig; Christoph Baeumer; Ute N. Gries; Michael Mueller; Camilla La Torre; Michael Luebben; Nicolas Raab; Hongchu Du; Stephan Menzel; David N. Mueller; Chun-Lin Jia; Joachim Mayer; Rainer Waser; Ilia Valov; Roger A. De Souza; Regina Dittmann
Resistive switching based on transition metal oxide memristive devices is suspected to be caused by the electric-field-driven motion and internal redistribution of oxygen vacancies. Deriving the detailed mechanistic picture of the switching process is complicated, however, by the frequently observed influence of the surrounding atmosphere. Specifically, the presence or absence of water vapor in the atmosphere has a strong impact on the switching properties, but the redox reactions between water and the active layer have yet to be clarified. To investigate the role of oxygen and water species during resistive switching in greater detail, isotope labeling experiments in a N2 /H218 O tracer gas atmosphere combined with time-of-flight secondary-ion mass spectrometry are used. It is explicitly demonstrated that during the RESET operation in resistive switching SrTiO3 -based memristive devices, oxygen is incorporated directly from water molecules or oxygen molecules into the active layer. In humid atmospheres, the reaction pathway via water molecules predominates. These findings clearly resolve the role of humidity as both oxidizing agent and source of protonic defects during the RESET operation.
Journal of the American Chemical Society | 2017
Slavomír Nemšák; Evgheni Strelcov; Tomáš Duchoň; Hongxuan Guo; Johanna Hackl; Alexander Yulaev; Ivan Vlassiouk; David N. Mueller; Claus M. Schneider; Andrei Kolmakov
Studies of the electrified solid-liquid interfaces are crucial for understanding biological and electrochemical systems. Until recently, use of photoemission electron microscopy (PEEM) for such purposes has been hampered by incompatibility of the liquid samples with ultrahigh vacuum environment of the electron optics and detector. Here we demonstrate that the use of ultrathin electron transparent graphene membranes, which can sustain large pressure differentials and act as a working electrode, makes it possible to probe electrochemical reactions in operando in liquid environments with PEEM.
Journal of Materials Chemistry C | 2016
Timm Gerber; Patrick Lömker; Bernardus Zijlstra; Claire Besson; David N. Mueller; W. Zander; J. Schubert; Mihaela Gorgoi; Martina Müller
As a prototypical all-oxide heterostructure, the ferromagnetic insulator europium monoxide (EuO) is synthesized on transparent and conductive indium tin oxide (ITO) virtual substrates. Non-destructive hard X-ray photoelectron spectroscopy is employed to depth profile the chemical composition of the magnetic layer and the buried oxide–oxide interface. We find that thermally activated oxygen diffusion from ITO affects the EuO growth process. We present how to control the oxygen reactivity at the interface and discuss its origin in a thermodynamic analysis. Our complementary methodical strategy allows for a significant improvement of the EuO chemical quality with sizeable magnetic properties. Generally, our approach derives guidelines for the proper choice of oxide substrates and buffer layer materials for functional all-oxide heterostructures.
ACS Catalysis | 2017
Felix Gunkel; Lei Jin; David N. Mueller; Clemens Hausner; Daniel S. Bick; Chun-Lin Jia; Ilia Valov; Rainer Waser; Regina Dittmann
arXiv: Materials Science | 2018
Slavomír Nemšák; Evgheni Strelcov; Hongxuan Guo; Brian D. Hoskins; Tomáš Duchoň; David N. Mueller; Alexander Yulaev; Ivan Vlassiouk; Alexander Tselev; Claus M. Schneider; Andrei Kolmakov
Thin Solid Films | 2018
Margret Giesen; Matteo Jugovac; Giovanni Zamborlini; Vitaliy Feyer; Felix Gunkel; David N. Mueller
arXiv: Materials Science | 2017
Daniel S. Bick; Andreas Kindsmueller; Deok-Yong Cho; Ahmed Yousef Mohamed; Thomas Bredow; Hendrik Laufen; Felix Gunkel; David N. Mueller; Rainer Waser; Ilia Valov
Bulletin of the American Physical Society | 2017
Slavomír Nemšák; Johanna Hackl; Hongxuan Guo; Evgheni Strelcov; Alexander Yulaev; David N. Mueller; Claus M. Schneider; Andrei Kolmakov